US4622283A
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US
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Deep ultra-violet lithographic resist composition and process of using
Assignee: Avantor Performance Materials LLC
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Filing: 1985-09-12
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Granted: 1986-11-11
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Expires: 2005-09-12
Abstract
Abstract Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula <IMAGE> wherein R1 and R2 can each individually be alkyl, aryl, alkoxy alkyl, aralkyl or haloalkyl radicals or R1 and R2 taken together can be an alkylene radical.
Inventors
- 👤 Gary M. Gray
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 17:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
56 words
A lithographic resist composition for use with deep UV light of less than 300 nm wavelength, said composition comprising a base soluble film-forming polymer and in admixture therewith as a deep UV sensitizer a sufficient quantity of 2-diazo-5,5-dimethyl-1,3-cyclohexanedione solubilizing agent, whereby upon exposure to deep UV radiation the exposed composition becomes more soluble in alkaline developer.
Claim 2
Dependent Claim
56 words
A lithographic resist composition for use with deep UV light of less than 300 nm wavelength, said composition comprising a base soluble film-forming polymer and in admixture therewith as a deep UV sensitizer a sufficient quantity of 2-diazo-5,5-dimethyl-1,3-cyclohexanedione solubilizing agent, whereby upon exposure to deep UV radiation the exposed composition becomes more soluble in alkaline developer.
Claim 3
Dependent Claim
26 words
A composition of claim 1 wherein the base-soluble film-forming polymer is a resin selected from the group consisting of phenol-formaldehyde, cresolformaldehyde and poly(methyl methacrylate-methacrylic acid) resins.
Claim 4
Dependent Claim
32 words
A composition of claim 1 wherein the solubilizing agent is present in an amount of from about 15 to about 50% by weight based on the combined weight of polymer and agent.
Claim 5
Dependent Claim
32 words
A composition of claim 2 wherein the solubilizing agent is present in an amount of from about 15 to about 50% by weight based on the combined weight of polymer and agent.
Claim 6
Dependent Claim
13 words
A composition of claim 2 wherein the polymer is a poly(methyl methacrylate-methacrylic acid).
Claim 7
Dependent Claim
29 words
A composition of claim 5 wherein the poly (methyl methacrylate-methacrylic acid) has a molecular weight of about 80,000 and the ratio of methyl methacrylate to methacrylic acid is 75/25.
Claim 8
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 1 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 9
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 4 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 10
Dependent Claim
23 words
A castable resist composition of claim 8 wherein the solvent comprises from about 50 to about 95% by weight of the castable composition.
Claim 11
Dependent Claim
27 words
A castable resist composition of claim 9 wherein the solvent is selected from the group consisting of diglyme, methyl isobutyl ketone and 2-ethoxyethanol, 2-methoxyethyl acetate and γ-butyrolactone.
Claim 12
Dependent Claim
27 words
A castable resist composition comprising the lithographic resist composition of claim 6 in a film-forming solvent having a boiling point of from about 120° to 210° C.
Claim 13
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 7.
Claim 14
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 8.
Claim 15
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 9.
Claim 16
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 10.
Claim 17
Dependent Claim
57 words
A process for forming a lithographic resist image comprising image-wise exposing to deep UV light of less than about 300 nm a film cast on a substrate and dissolving the exposed portion of said film with a basic solution, wherein the film cast on the substrate comprises a film cast from the castable composition of claim 11.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-11-10 | 1990-05-12 | 1990-11-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-11-10 | 1994-05-12 | 1994-11-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-11-10 | 1998-05-12 | 1998-11-11 | $7700.00 | Window Closed / Lapsed |