US4612270A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Two-layer negative resist
Assignee: Intersil Corp
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Filing: 1985-03-14
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Granted: 1986-09-16
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Expires: 2005-03-14
Abstract
Abstract The erosion rate of a layer of negative-working resist is markedly reduced by forming thereon a thin layer of polyfunctional acrylate or methylacrylate monomer. Upon irradiation, the monomer insolubilizes at a faster rate than the resist thereby forming a crust thereon. The result is reduced erosion, improved edge acuity and fewer pinholes in the developed resist pattern.
Inventors
- 👤 Thomas R. Pampalone
- 👤 Paula M. Holder
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 23:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; G03F7/0955
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
33 words
A medium for lithographic recording comprising a substrate having on a surface thereof a first layer comprising a negative-working resist and a second layer consisting essentially of a polyfunctional acrylate or methacrylate monomer.
Claim 2
Independent Claim
33 words
A medium for lithographic recording comprising a substrate having on a surface thereof a first layer comprising a negative-working resist and a second layer consisting essentially of a polyfunctional acrylate or methacrylate monomer.
Claim 3
Dependent Claim
27 words
A medium in accordance with claim 1, wherein the polyfunctional monomer is selected from the group consisting of trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, hexamethylenediol diacrylate and pentaerythritol triacrylate.
Claim 4
Dependent Claim
13 words
A medium in accordance with claim 2, wherein the monomer is trimethylolpropane triacrylate.
Claim 5
Dependent Claim
13 words
A medium in accordance with claim 2, wherein the monomer is pentaerythritol triacrylate.
Claim 6
Dependent Claim
19 words
A medium in accordance with claim 1, wherein the negative-working resist is a homopolymer or copolymer of glycidyl methacrylate.
Claim 7
Dependent Claim
20 words
A medium in accordance with claim 5, wherein the negative-working resist is a copolymer of glycidyl methacrylate and ethyl acrylate.
Claim 8
Dependent Claim
23 words
A medium in accordance with claim 1, wherein the negative-working resist is a homopolymer or copolymer of a halogenated styrene or chloromethylated styrene.
Claim 9
Dependent Claim
44 words
A medium in accordance with claim 1, wherein the negative-working resist comprises a phenolic resin selected from the group consisting of an ortho-cresol novolac resin, a meta-cresol novolac resin, a para-cresol novolac resin, poly(hydroxystyrene) and mixtures thereof and a polyfunctional acrylate or methacrylate monomer.
Claim 10
Dependent Claim
22 words
A medium in accordance with claim 1, wherein the negative-working resist comprises poly(hydroxystyrene) and trimethylolpropane triacrylate and the monomer is trimethylolpropane triacrylate.
Claim 11
Dependent Claim
26 words
A medium in accordance with claim 1, wherein the negative-working resist is a copolymer of glycidyl methacrylate and ethyl acrylate and the monomer is trimethylolpropane triacrylate.
Claim 12
Dependent Claim
98 words
A process of forming a relief pattern on a substrate consisting essentially of: (a) forming a layer of a negative-working resist on the substrate; (b) coating the resist layer with a composition consisting essentially of a solution of a polyfunctional acrylate or methacrylate monomer in a suitable solvent which is a nonsolvent for the resist layer; (c) drying the coating to form a film; (d) irradiating a selected portion of the resulting two-layer structure with a source of irradiation; and (e) developing the structure to remove that portion not irradiated, thus exposing a corresponding portion of the substrate.
Claim 13
Dependent Claim
98 words
A process of forming a relief pattern on a substrate consisting essentially of: (a) forming a layer of a negative-working resist on the substrate; (b) coating the resist layer with a composition consisting essentially of a solution of a polyfunctional acrylate or methacrylate monomer in a suitable solvent which is a nonsolvent for the resist layer; (c) drying the coating to form a film; (d) irradiating a selected portion of the resulting two-layer structure with a source of irradiation; and (e) developing the structure to remove that portion not irradiated, thus exposing a corresponding portion of the substrate.
Claim 14
Dependent Claim
17 words
A process in accordance with claim 11, wherein the solvent for said monomer comprises cyclohexane or methylcyclohexane.
Claim 15
Dependent Claim
16 words
A process in accordance with claim 11, wherein the source of irradiation is an electron beam.
Claim 16
Dependent Claim
27 words
A process in accordance with claim 11, wherein the polyfunctional monomer is selected from the group consisting of trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, hexamethylenediol diacrylate, and pentaerythritol triacrylate.
Claim 17
Dependent Claim
13 words
A process in accordance with claim 14, wherein the monomer is trimethylolpropane triacrylate.
Claim 18
Dependent Claim
13 words
A process in accordance with claim 14, wherein the monomer is pentaerythritol triacrylate.
Claim 19
Dependent Claim
19 words
A process in accordance with claim 11, wherein the negative-working resist is a homopolymer or copolymer of glycidyl methacrylate.
Claim 20
Dependent Claim
23 words
A process in a accordance with claim 11 additionally including the step of removing residual scum from the exposed portion of the substrate.
Claim 21
Dependent Claim
20 words
A process in accordance with claim 18, wherein the scum is removed by treating the substrate with an oxygen plasma.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-09-15 | 1990-03-17 | 1990-09-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-09-15 | 1994-03-17 | 1994-09-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-09-15 | 1998-03-17 | 1998-09-16 | $7700.00 | Window Closed / Lapsed |