EP0025088A2
Expired / Lapsed
EP
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Photoresist films, processes for their production and process for modifying substrate surfaces
Assignee: EIDP Inc
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Filing: 1980-06-12
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Granted: —
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Expires: 2000-06-12
Abstract
Abstract A multi-layer photosensitive film resist (is provided) in which the photosensitive layers (consists of) a plurality of layers having different properties, e.g., greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provided by the other layer.
Inventors
- 👤 Clifford Robert Cyr
- 👤 Nancy Casler Hagan
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 00:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; G03F7/0955; G03F7/26; G03F7/34; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0079; H05K2203/00; H05K2203/05; H05K2203/0562; H05K2203/0577
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
160 words
In the process of making a photoresist film by applying a thermoplastic photosensitive composition to a temporary support film to form a laminate of a thermoplastic photosensitive layer on said support film, with the exposed surface of said layer having greater adhesion to a copper surface than to said support so that said layer is transferrable to said copper surface, the improvement comprising prior to applying said photosensitive composition to said support, applying a second thermoplastic photosensitive composition to said support film to form a laminate of a thermoplastic photosensitive layer on said support film and then applying the first-mentioned photosensitive composition to the bare surface of the layer of said second photosensitive composition, said layer of said.second photosensitive composition having a lesser adhesion to said support film than the adhesion of said layer of said first-mentioned photosensitive composition to said copper surface, and a greater adhesion to the layer of said first-mentioned photosensitive composition than to said support film.
Claim 2
Dependent Claim
160 words
In the process of making a photoresist film by applying a thermoplastic photosensitive composition to a temporary support film to form a laminate of a thermoplastic photosensitive layer on said support film, with the exposed surface of said layer having greater adhesion to a copper surface than to said support so that said layer is transferrable to said copper surface, the improvement comprising prior to applying said photosensitive composition to said support, applying a second thermoplastic photosensitive composition to said support film to form a laminate of a thermoplastic photosensitive layer on said support film and then applying the first-mentioned photosensitive composition to the bare surface of the layer of said second photosensitive composition, said layer of said.second photosensitive composition having a lesser adhesion to said support film than the adhesion of said layer of said first-mentioned photosensitive composition to said copper surface, and a greater adhesion to the layer of said first-mentioned photosensitive composition than to said support film.
Claim 3
Dependent Claim
31 words
In the process of claim 1 wherein the layer of said second photosensitive composition also has a lesser adhesion to said support film than the layer of said first-mentioned photosensitive composition.
Claim 4
Dependent Claim
22 words
In the process of claim 1 wherein each said layer has a similar photospeed and is solvent developable by the same solvent.
Claim 5
Dependent Claim
27 words
In the process of claims 1, 2, or 3 wherein said layer of said second photosensitive composition is tougher than said layer of said first-mentioned photosensitive composition.
Claim 6
Dependent Claim
12 words
The process of claim 1 wherein each said photosensitive composition is photopolymerizable.
Claim 7
Dependent Claim
41 words
In the process of claim 5 wherein each of said layers contains polymer binders and the molecular weight of the binder in the layer of said second photopolymerizable composition is substantially higher than in the layer of said first-mentioned photopolymerizable composition.
Claim 8
Dependent Claim
17 words
In the process of claim 6 wherein the binder in each of said layers is acrylic polymer.
Claim 9
Dependent Claim
31 words
The process of claim 6 wherein each said layer contains substantially the same monomer and photoinitiator, the amounts in one.said layer being substantially the same as in the other said layer.
Claim 10
Dependent Claim
18 words
In the process of claim 1 wherein the total thickness of said layers is no greater than 0.06mm.
Claim 11
Dependent Claim
27 words
In the process of claims 1 or 9 wherein the layer of said second photosensitive composition is 20 to 60% of the total thickness of said layers.
Claim 12
Dependent Claim
77 words
Dry photosensitive resist film consisting of a temporary support film, thermoplastic photosensitive layer, and cover film, characterized by the photosensitive layer consisting of at least two partial layers, said cover film being strippable from its respective partial layer without removal of said temporary support film from its respective partial layer and the resultant bared surface of said partial layer having greater adhesion to copper than the adhesion of said temporary support film to its respective partial layer.
Claim 13
Dependent Claim
77 words
Dry photosensitive resist film consisting of a temporary support film, thermoplastic photosensitive layer, and cover film, characterized by the photosensitive layer consisting of at least two partial layers, said cover film being strippable from its respective partial layer without removal of said temporary support film from its respective partial layer and the resultant bared surface of said partial layer having greater adhesion to copper than the adhesion of said temporary support film to its respective partial layer.
Claim 14
Dependent Claim
16 words
The film according to claim 11 wherein said photosensitive layer is photopolymerizable and thereby negative working.
Claim 15
Dependent Claim
18 words
The film according to claim 12 characterized in that the photopolymerizable layer adjoining the cover film contains binder.
Claim 16
Dependent Claim
22 words
Film according to claims 12 or 13 characterized in that the photopolymerizable layers contain at least in one partial layer a dyestuff.
Claim 17
Dependent Claim
57 words
Process for producing the negative-dry resist film according to claim 12, by applying the photopolymerizable layer onto the temporary support film from a solution and drying and coating the layer with a cover f.ilm, characterized in that the photopolymerizable layer is applied in a continuous operation in at least two partial layers from solution and is dried.
Claim 18
Dependent Claim
20 words
Process according to claim 15, characterized in that the photopolymerizable layer is produced by applying and drying different solutions.. '
Claim 19
Dependent Claim
57 words
Process for modifying substrate surfaces of random substances, onto which is laminated a negative-dry resist film under heat, is exposed imagewise, the nonimage areas are removed by washing and the bare surface is modified and optionally, the image areas are subsequently removed, the improvement comprising, using the negative-dry resist film of claim 12 in the laminating step.
Claim 20
Dependent Claim
29 words
Photoresist film of the support film and photosensitive layers of claim 1 and a cover film laminated to the bare surface of the layer of said first photosensitive composition.
References Cited (Backward Citations)
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