Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
380 words
A method for producing an electronic thin-film circuit, having an insulating substrate plate (1) and a first pattern (M 1 ) of connection tracks, a second pattern (M 2 ) of circuit elements both deposited on said substrate plate (1) and blank spaces between said first and second patterns, comprising the steps of: (A) applying a continuous resistance film (2) to the substrate plate; (B) applying atop said continuous resistance film (2) a continuous metal film (3) capable of being soldered and of being reinforced by electroplating; (C) applying atop said continuous metal film (3) a photo-sensitive resist film (4); (D) introducing into the photo-sensitive resist film (4), by means of a first photographic exposure and development process, openings (41) corresponding to the desired first pattern (M 1 ) in order to delineate said connection tracks and facilitate their reinforcement with gold; (E) electro-depositing into each of said openings (41), and thus onto exposed portions of said metal film (3), a gold film (6,61); (F) removing, by means of a second photographic exposure and developing process, portions of the photo-sensitive resist film (4) from all areas of the metal film (3) which corresponds to said intended blank spaces (G) etching away, using as masks remaining portions of the photo-sensitive resist film (4) and the gold films (6,61), those portions of the metal (3) exposed by step (F); (H) removing, by means of a third photographic exposure and development process, portions of the photo-sensitive resist film (4) from areas (32) of the metal film (3) which are a part of said second pattern (M 2 ); (I) selectively etching away the metal film (3) at locations corresponding to the desired second pattern (M 2 ); (J) screen-printing anti-solder film (7,71) onto all areas of the first pattern (M 1 ) covered with the gold films (6,61), with the exception of a narrow end area (64) of said gold films (6,61) which is adjoined by an area of the first pattern (M 1 ) intended to be covered with soft solder; (K) immersing said circuit in liquid soft solder, in order to apply a soft-solder film (8) to the areas of the first pattern (M 1 ) not covered with the anti-solder film (7,71); and (L) dissolving away said anti-solder film (7,71).
Claim 2
Independent Claim
380 words
A method for producing an electronic thin-film circuit, having an insulating substrate plate (1) and a first pattern (M 1 ) of connection tracks, a second pattern (M 2 ) of circuit elements both deposited on said substrate plate (1) and blank spaces between said first and second patterns, comprising the steps of: (A) applying a continuous resistance film (2) to the substrate plate; (B) applying atop said continuous resistance film (2) a continuous metal film (3) capable of being soldered and of being reinforced by electroplating; (C) applying atop said continuous metal film (3) a photo-sensitive resist film (4); (D) introducing into the photo-sensitive resist film (4), by means of a first photographic exposure and development process, openings (41) corresponding to the desired first pattern (M 1 ) in order to delineate said connection tracks and facilitate their reinforcement with gold; (E) electro-depositing into each of said openings (41), and thus onto exposed portions of said metal film (3), a gold film (6,61); (F) removing, by means of a second photographic exposure and developing process, portions of the photo-sensitive resist film (4) from all areas of the metal film (3) which corresponds to said intended blank spaces (G) etching away, using as masks remaining portions of the photo-sensitive resist film (4) and the gold films (6,61), those portions of the metal (3) exposed by step (F); (H) removing, by means of a third photographic exposure and development process, portions of the photo-sensitive resist film (4) from areas (32) of the metal film (3) which are a part of said second pattern (M 2 ); (I) selectively etching away the metal film (3) at locations corresponding to the desired second pattern (M 2 ); (J) screen-printing anti-solder film (7,71) onto all areas of the first pattern (M 1 ) covered with the gold films (6,61), with the exception of a narrow end area (64) of said gold films (6,61) which is adjoined by an area of the first pattern (M 1 ) intended to be covered with soft solder; (K) immersing said circuit in liquid soft solder, in order to apply a soft-solder film (8) to the areas of the first pattern (M 1 ) not covered with the anti-solder film (7,71); and (L) dissolving away said anti-solder film (7,71).
Claim 3
Dependent Claim
53 words
A method as defined by claim 1, characterized in that the photographic exposure mask (51) used for the second photographic exposure process is formed such that at all the edges of the gold films (6, 61), a photosensitive resist path (43) remains thus overlapping these films (6, 61) and the metal film (3).
Claim 4
Dependent Claim
35 words
A method as defined by claim 1, characterized in that the electrodeposited gold films (6, 61) are covered, prior to the second photographic exposure process, with an additionally applied thin film (44) of photosensitive resist.
Claim 5
Dependent Claim
34 words
A method as defined by claim 2 characterized in that the electrodeposited gold films (6,61) are covered, prior to the second photographic exposure process, with an additonally applied thin film (44) of photosensitive resist.
Claim 6
Dependent Claim
37 words
A method as defined by claim 1 wherein said step of applying said continuous metal film includes forming between said resistance film (2) and said continuous metal film (3) an intermediate film acting as a diffusion block.