← Back to Patent Explorer
US4592791A Expired / Lapsed US ⏱️ 0.0 years remaining

Liquid phase epitaxial growth method for producing a III-V group compound semiconductor

Assignee: Fujitsu Ltd
•
Filing: 1983-11-21
•
Granted: 1986-06-03
•
Expires: 2003-11-21
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A liquid phase epitaxial growth method is disclosed wherein (111)A InP substrate is used for growing an epitaxial layer of AlxIn1-xAs or AlxGayIn1-x-yAs compound semiconductor by liquid phase epitaxy.

Inventors

  • 👤 Kazuo Nakajima
  • 👤 Toshiyuki Tanahashi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 04:59
CPC Classifications
C; C30; C30B; C30B29/00; C30B29/10; C30B29/40; C30B19/00; C30B19/02; C30B19/04; C30B19/12

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 43 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, and (b) growing an epitaxial layer of an aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said substrate, wherein x=0.48.
Claim 2
Dependent Claim 43 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, and (b) growing an epitaxial layer of an aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said substrate, wherein x=0.48.
Claim 3
Dependent Claim 46 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, and (b) growing an epitaxial layer of an aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said substrate, wherein 0<x<0.48, 0<y<0.47.
Claim 4
Dependent Claim 46 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, and (b) growing an epitaxial layer of an aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said substrate, wherein 0<x<0.48, 0<y<0.47.
Claim 5
Dependent Claim 70 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer of aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said substrate, wherein 0<x<0.48, 0<y<0.47, and (c) growing a second epitaxial layer of aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said first epitaxial layer, wherein x=0.48.
Claim 6
Dependent Claim 70 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer of aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said substrate, wherein 0<x<0.48, 0<y<0.47, and (c) growing a second epitaxial layer of aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said first epitaxial layer, wherein x=0.48.
Claim 7
Dependent Claim 70 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer comprising aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said substrate, wherein x=0.48, and (c) growing a second epitaxial layer comprising aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said first epitaxial layer, wherein 0<x<0.48, 0<y<0.47.
Claim 8
Dependent Claim 70 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer comprising aluminum-indium-arsenide (Al x In 1-x As) by liquid phase epitaxy on said substrate, wherein x=0.48, and (c) growing a second epitaxial layer comprising aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) by liquid phase epitaxy on said first epitaxial layer, wherein 0<x<0.48, 0<y<0.47.
Claim 9
Dependent Claim 61 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer having crystal plane (111)A by liquid phase epitaxy on said substrate, and (c) growing a second epitaxial layer of aluminum-indium-arsenide (Al x In 1-x As) by liquid epitaxy on said first epitaxial layer, wherein x=0.48.
Claim 10
Dependent Claim 61 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer having crystal plane (111)A by liquid phase epitaxy on said substrate, and (c) growing a second epitaxial layer of aluminum-indium-arsenide (Al x In 1-x As) by liquid epitaxy on said first epitaxial layer, wherein x=0.48.
Claim 11
Dependent Claim 61 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer having crystal plane (111)A by liquid phase epitaxy on said substrate, and (c) growing a second epitaxial layer of aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) on said first epitaxial layer, wherein 0<x<0.48, 0<y<0.47.
Claim 12
Dependent Claim 61 words
A liquid phase epitaxial growth method comprising the steps of: (a) preparing an indium phosphide substrate with crystal plane (111)A, (b) growing a first epitaxial layer having crystal plane (111)A by liquid phase epitaxy on said substrate, and (c) growing a second epitaxial layer of aluminum-gallium-indium-arsenide (Al x Ga y In 1-x-y As) on said first epitaxial layer, wherein 0<x<0.48, 0<y<0.47.

References Cited (Backward Citations)

US4096511A Cited
US3933538A Cited
US4122407A Cited
US4326176A Cited
US4321556A Cited
US4372791A Cited
US4246050A Cited
US4342148A Cited
US4354898A Cited
US4468258A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-06-02 1989-12-02 1990-06-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-06-02 1993-12-02 1994-06-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-06-02 1997-12-02 1998-06-03 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag