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US4588671A Expired / Lapsed US ⏱️ 0.0 years remaining

Photo and electron resist with donor-acceptor complex and light sensitive compound

Assignee: INSTITUT KHIMII AKADEMII NAUK SSR USSR GORKY
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Filing: 1981-12-21
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Granted: 1986-05-13
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Expires: 2001-12-21
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Abstract

Abstract A photo- and electron resist distributed in an organic solvent, and including an additive which forms a donor-acceptor complex to eliminate luminescence effects and increase the stability of the resist. The photo- and electron resist can be used in microelectronics, optics, printing and precision machine building industry when resists are employed to manufacture structures of semiconductor devices and solid-state circuits.

Inventors

  • 👤 Sergei P. Molodnyakov
  • 👤 Jury I. Fedorov
  • 👤 Vitaly A. Kuznetsov
  • 👤 Alexei N. Egorochkin
  • 👤 Tamara G. Birjukova
  • 👤 Grigory A. Razuvaev

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 15:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 99 words
A film-forming photo-and electron-resist composition, comprising a resist formed from a light-sensitive compound selected from the group consisting of o-benzoquinone diazide, p-benzoquinone diazide, and o-naphthoquinone diazide, and a film-forming compound, said resist being present in an amount sufficient to react with actinic light, iodine as an additive which with said resist forms a donor-acceptor complex, said additive being present in an amount sufficient to react with said resist to form said complex and to thereby eliminate luminescence effect and to increase the resist stability, and an organic solvent in an amount sufficient to dissolve said resist and said additive.
Claim 2
Dependent Claim 99 words
A film-forming photo-and electron-resist composition, comprising a resist formed from a light-sensitive compound selected from the group consisting of o-benzoquinone diazide, p-benzoquinone diazide, and o-naphthoquinone diazide, and a film-forming compound, said resist being present in an amount sufficient to react with actinic light, iodine as an additive which with said resist forms a donor-acceptor complex, said additive being present in an amount sufficient to react with said resist to form said complex and to thereby eliminate luminescence effect and to increase the resist stability, and an organic solvent in an amount sufficient to dissolve said resist and said additive.
Claim 3
Dependent Claim 49 words
The composition of claim 1, comprising from 5-10 weight percent of said light-sensitive compound, from 10-15 weight percent of said film-forming compound selected from the group consisting of phenol-aldehyde resin, and α-naphthol-aldehyde resin, from 78-84.9 weight percent of said organic solvent, and from 0:1-30.0 weight percent of said additive.
Claim 4
Dependent Claim 27 words
The composition of claim 1, comprising said additive in an amount of 15 weight percent or less of the combined weight of dry constituents within said composition.
Claim 5
Dependent Claim 17 words
The composition of claim 1, comprising said light-sensitive and film-forming compounds in weight ratios of about 4:1-1:4.
Claim 6
Dependent Claim 89 words
A film-forming photo- and electron-resist composition, comprising a resist formed from the light-sensitive compound o-naphthoquinone diazide and a film-forming compound, said resist being present in an amount sufficient to react with actinic light, iodine as an additive which with said resist forms a donor-acceptor complex, said additive being present in an amount sufficient to react with said resist to form said complex and to thereby eliminate luminescence effect and to increase the resist stability, and an organic solvent in an amount sufficient to dissolve said resist and said additive.
Claim 7
Dependent Claim 89 words
A film-forming photo- and electron-resist composition, comprising a resist formed from the light-sensitive compound o-naphthoquinone diazide and a film-forming compound, said resist being present in an amount sufficient to react with actinic light, iodine as an additive which with said resist forms a donor-acceptor complex, said additive being present in an amount sufficient to react with said resist to form said complex and to thereby eliminate luminescence effect and to increase the resist stability, and an organic solvent in an amount sufficient to dissolve said resist and said additive.

References Cited (Backward Citations)

SU332413A1 Cited
US3615532A Cited
US3567453A Cited
US3661582A Cited
US3948667A Cited
JPS53108421A Cited
US4296190A Cited
US4356255A Cited
NL8000312A Cited
JPS56147146A Cited
US4365019A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-05-12 1989-11-11 1990-05-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-05-12 1993-11-11 1994-05-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-05-12 1997-11-11 1998-05-13 $7700.00 Window Closed / Lapsed

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