US4365019A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive-working resist quinone diazide containing composition and imaging method having improved development rates
Assignee: Eastman Kodak Co
•
Filing: 1981-08-06
•
Granted: 1982-12-21
•
Expires: 2001-08-06
Abstract
Abstract There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.
Inventors
- 👤 Robert C Daly
- 👤 John R. Guild
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 14:58
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
79 words
In a positive-working composition sensitive to light or electron beams comprising in admixture a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent; the improvement wherein said sensitivity-enhancing agent is a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms, at least one of the nitrogen atoms being bonded to hydrogen, said compound having at least two halogen substituents bonded to said nuclear carbon atoms.
Claim 2
Dependent Claim
79 words
In a positive-working composition sensitive to light or electron beams comprising in admixture a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent; the improvement wherein said sensitivity-enhancing agent is a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms, at least one of the nitrogen atoms being bonded to hydrogen, said compound having at least two halogen substituents bonded to said nuclear carbon atoms.
Claim 3
Dependent Claim
30 words
A composition as defined in claim 1, wherein said sensitivity-enhancing agent is a polyhalogenated form of a compound selected from the group consisting of benzotriazole; 1,2-naphthotriazole; indazole; 6,7-dihydro-5H-pyrrolotetrazole; and 1,3,4-imidazopyridine.
Claim 4
Dependent Claim
28 words
A composition as defined in claim 1, wherein said sensitivity-enhancing agent has the formula ##STR4## wherein X is halogen and n is a number from 2 to 4.
Claim 5
Dependent Claim
25 words
A composition as defined in claim 3, wherein said sensitivity-enhancing agent is a mixture of compounds having n = 2, 3 and 4 in admixture.
Claim 6
Dependent Claim
42 words
In a positive-working resist composition sensitive to light or electron beams comprising, in admixture, a 1,2-quinone diazide sulfonic acid condensation product and a sensitivity-enhancing agent; the improvement wherein said sensitivity-enhancing agent comprises ##STR5## wherein n is a number from 2 to 4.
Claim 7
Dependent Claim
42 words
In a positive-working resist composition sensitive to light or electron beams comprising, in admixture, a 1,2-quinone diazide sulfonic acid condensation product and a sensitivity-enhancing agent; the improvement wherein said sensitivity-enhancing agent comprises ##STR5## wherein n is a number from 2 to 4.
Claim 8
Dependent Claim
16 words
A support having thereon a composition as defined in claim 1, 2, 3, 4, or 5.
Claim 9
Dependent Claim
106 words
In a method of forming a resist image by imagewise exposing to light or electron beams a resist composition comprising in admixture, a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent, and developing the resist image by completely removing the exposed portions, the improvement wherein the developability of said resist is increased by means of a sensitivity-enhancing agent which comprises a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms at least one of which is bonded to hydrogen, and at least two halogen substituents appended from said nuclear carbon atoms.
Claim 10
Dependent Claim
106 words
In a method of forming a resist image by imagewise exposing to light or electron beams a resist composition comprising in admixture, a 1,2-quinone diazide condensation product and a sensitivity-enhancing agent, and developing the resist image by completely removing the exposed portions, the improvement wherein the developability of said resist is increased by means of a sensitivity-enhancing agent which comprises a heterocyclic compound having one, two or three rings, the nuclear atoms of which consist of carbon atoms and from 2 to 4 nitrogen atoms at least one of which is bonded to hydrogen, and at least two halogen substituents appended from said nuclear carbon atoms.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-12-20 | 1986-06-21 | 1986-12-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-12-20 | 1990-06-21 | 1990-12-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-12-20 | 1994-06-21 | 1994-12-21 | $7700.00 | Window Closed / Lapsed |