Photoetching method

Abstract

Abstract PURPOSE:To avoid unfavorable influence resulting from reflected light emitted from the surface of a body to be etched in exposure and enhance the etching accuracy by adding a light absorbing substance to a photoresist to regulate the light or electromagnetic wave absorptance of the photoresist. CONSTITUTION:A coloring material such as auramine conc. is added to an ultraviolet sensitive photoresist such as a composition prepared by dispersing naphthoquinone azide in novolak type phenol resin. Photoetching is carried out using the resulting photoresist with regulated absorptance such as >= about 0.5 absorbance to ultraviolet rays for exposure. This method is especially effective when applied to the exposure of a resist on a body of Al or the like with high reflectance to be etched using monochromatic light such as light having 435nm wavelength from a mercury lamp.

Inventors

• 👤 Masao Kanazawa

Bibliographic Details