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US4559289A
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Electrophotographic light-sensitive material
Assignee: Fujifilm Holdings Corp
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Filing: 1984-07-03
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Granted: 1985-12-17
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Expires: 2004-07-03
Abstract
Abstract An electrophotographic light-sensitive material is described, comprising an electrically conductive support, an amorphous silicon photoconductive layer on the support, and a layer of amorphous material containing at least carbon and halogen atoms is provided on the photoconductive layer. This material is free from a serious reduction in resolving power as is encountered in conventional electrophotographic light-sensitive materials when they are exposed to corona discharge, particularly negative corona discharge under high temperature/humidity conditions.
Inventors
- 👤 Hiroshi Sunagawa
- 👤 Kazuhiro Kawajiri
- 👤 Keishiro Kido
- 👤 Toshio Iijima
- 👤 Nobuharu Nozaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 18:09
CPC Classifications
G; G03; G03G; G03G5/00; G03G5/02; G03G5/04; G03G5/08; G03G5/082; G03G5/08285; G03G5/08214; G03G5/08221; G03G5/08278
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
70 words
An electrophotographic light-sensitive material comprising an electrically conductive support, an amorphous silicon photoconductive layer further comprising hydrogen and/or halogen on the support, and a layer of amorphous material consisting essentially of carbon and halogen atoms provided on the photoconductive layer, wherein a low-photoconductivity amorphous silicon overcoat layer containing carbon atoms is provided between the amorphous silicon photoconductive layer and the layer of amorphous material comprising substantially carbon and halogen atoms.
Claim 2
Dependent Claim
70 words
An electrophotographic light-sensitive material comprising an electrically conductive support, an amorphous silicon photoconductive layer further comprising hydrogen and/or halogen on the support, and a layer of amorphous material consisting essentially of carbon and halogen atoms provided on the photoconductive layer, wherein a low-photoconductivity amorphous silicon overcoat layer containing carbon atoms is provided between the amorphous silicon photoconductive layer and the layer of amorphous material comprising substantially carbon and halogen atoms.
Claim 3
Dependent Claim
20 words
An electrophotographic light-sensitive material as in claim 1, wherein said overcoat layer contains from 5 to 90 atomic % carbon.
Claim 4
Dependent Claim
20 words
An electrophotographic light-sensitive material as in claim 1, wherein the thickness of the overcoat layer is from 0.005 to 0.3μ.
Claim 5
Dependent Claim
20 words
An electrophotographic light-sensitive material as in claim 2, wherein the thickness of the overcoat layer is from 0.005 to 0.3μ.
Claim 6
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 1, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 2/8 to 8.2.
Claim 7
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 2, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 2/8 to 8.2.
Claim 8
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 3, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 2/8 to 8/2.
Claim 9
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 1, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 3/7 to 7/3.
Claim 10
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 2, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 3/7 to 7/3.
Claim 11
Dependent Claim
51 words
An electrophotographic light-sensitive material as in claim 3, wherein the layer of amorphous material containing at least carbon and halogen atoms is provided by a glow discharge deposition wherein the ratio of the flow rate of hydrogen gas to halogen atom and carbon atom-containing compound gas is from 3/7 to 7/3.
Claim 12
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 1, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 30 microns.
Claim 13
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 2, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 30 microns.
Claim 14
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 3, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 30 microns.
Claim 15
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 1, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 3 microns.
Claim 16
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 2, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 3 microns.
Claim 17
Dependent Claim
32 words
An electrophotographic light-sensitive material as in claim 3, wherein the thickness of the layer of amorphous material containing at least carbon and halogen atoms is from a monoatomic layer to 3 microns.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-12-16 | 1989-06-17 | 1989-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-12-16 | 1993-06-17 | 1993-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-12-16 | 1997-06-17 | 1997-12-17 | $7700.00 | Window Closed / Lapsed |