Patent US4551414A successfully refreshed from Google Patents.
US4551414A
Expired / Lapsed
US
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Positive resist material
Assignee: Max-Planck-Gesellschaft zur Förderung der Wissenschaften eV
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Filing: 1983-02-03
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Granted: 1985-11-05
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Expires: 2003-02-03
Abstract
Abstract The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.
Inventors
- 👤 Frithjof Asmussen
- 👤 Hideto Sotobayashi
- 👤 Jiang-Tsun Chen
- 👤 Wolfram Schnabel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 15:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/143; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
86 words
A positive resist material of a thermally crosslinkable methacrylic polymer soluble in an organic solvent wherein the methacrylic polymer is a copolymer of the formula ##STR4## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU1## being between 0.02 and 0.20.
Claim 2
Dependent Claim
86 words
A positive resist material of a thermally crosslinkable methacrylic polymer soluble in an organic solvent wherein the methacrylic polymer is a copolymer of the formula ##STR4## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU1## being between 0.02 and 0.20.
Claim 3
Dependent Claim
13 words
The resist material of claim 1 wherein the chlorinated alkyl group is 2,2,2-trichloroethyl.
Claim 4
Dependent Claim
15 words
The resist material of claim 1 wherein the fluorinated alkyl group is a hexafluoroalkyl group.
Claim 5
Dependent Claim
16 words
The resist material of claim 3 wherein the fluorinated alkyl group is the 2,2,3,4,4,4-hexafluoro butyl group.
Claim 6
Independent Claim
131 words
A method of forming a positive resist which comprises applying onto a support a thin coating of a thermally crosslinkable methacrylic polymer which is a copolymer of the formula ##STR5## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU2## being between 0.02 and 0.20; heating the coating for a period of 30 to 90 minutes at a temperature of 180° to 250° C.; exposing a part of the coating to high energy radiation; and developing the resist by dissolving the exposed part with a developer.
Claim 7
Independent Claim
131 words
A method of forming a positive resist which comprises applying onto a support a thin coating of a thermally crosslinkable methacrylic polymer which is a copolymer of the formula ##STR5## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU2## being between 0.02 and 0.20; heating the coating for a period of 30 to 90 minutes at a temperature of 180° to 250° C.; exposing a part of the coating to high energy radiation; and developing the resist by dissolving the exposed part with a developer.
Claim 8
Dependent Claim
17 words
The method of claim 5, wherein the irradiation is performed with X-rays, electron beams or ion beams.
Claim 9
Dependent Claim
29 words
The method of claim 5, wherein the developing is Performed with propanol-(2), a mixture of 2-propanol and methyl isobutyl keton or a mixture of 2-propanol and methyl ethyl ketone.
References Cited (Backward Citations)
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US4096290A
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US4273856A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-11-04 | 1989-05-06 | 1989-11-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-11-04 | 1993-05-06 | 1993-11-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-11-04 | 1997-05-06 | 1997-11-05 | $7700.00 | Window Closed / Lapsed |