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US4551414A Expired / Lapsed US ⏱️ 0.0 years remaining

Positive resist material

Assignee: Max-Planck-Gesellschaft zur Förderung der Wissenschaften eV
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Filing: 1983-02-03
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Granted: 1985-11-05
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Expires: 2003-02-03
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Abstract

Abstract The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.

Inventors

  • 👤 Frithjof Asmussen
  • 👤 Hideto Sotobayashi
  • 👤 Jiang-Tsun Chen
  • 👤 Wolfram Schnabel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 11:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/143; Y10S430/167; Y10S430/168

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 86 words
A positive resist material of a thermally crosslinkable methacrylic polymer soluble in an organic solvent wherein the methacrylic polymer is a copolymer of the formula ##STR4## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU1## being between 0.02 and 0.20.
Claim 2
Dependent Claim 86 words
A positive resist material of a thermally crosslinkable methacrylic polymer soluble in an organic solvent wherein the methacrylic polymer is a copolymer of the formula ##STR4## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU1## being between 0.02 and 0.20.
Claim 3
Dependent Claim 13 words
The resist material of claim 1 wherein the chlorinated alkyl group is 2,2,2-trichloroethyl.
Claim 4
Dependent Claim 15 words
The resist material of claim 1 wherein the fluorinated alkyl group is a hexafluoroalkyl group.
Claim 5
Dependent Claim 16 words
The resist material of claim 3 wherein the fluorinated alkyl group is the 2,2,3,4,4,4-hexafluoro butyl group.
Claim 6
Independent Claim 131 words
A method of forming a positive resist which comprises applying onto a support a thin coating of a thermally crosslinkable methacrylic polymer which is a copolymer of the formula ##STR5## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU2## being between 0.02 and 0.20; heating the coating for a period of 30 to 90 minutes at a temperature of 180° to 250° C.; exposing a part of the coating to high energy radiation; and developing the resist by dissolving the exposed part with a developer.
Claim 7
Independent Claim 131 words
A method of forming a positive resist which comprises applying onto a support a thin coating of a thermally crosslinkable methacrylic polymer which is a copolymer of the formula ##STR5## wherein R 1 represents a wholly or partly fluorinated alkyl group with 2 to 6 carbon atoms, R 2 represents a partially chlorinated alkyl group with 2 to 6 carbon atoms and having a terminal ω-trichloromethyl group, the degree of polymerization n 1 +n 2 being between 300 and 3000 and the mole fraction ##EQU2## being between 0.02 and 0.20; heating the coating for a period of 30 to 90 minutes at a temperature of 180° to 250° C.; exposing a part of the coating to high energy radiation; and developing the resist by dissolving the exposed part with a developer.
Claim 8
Dependent Claim 17 words
The method of claim 5, wherein the irradiation is performed with X-rays, electron beams or ion beams.
Claim 9
Dependent Claim 29 words
The method of claim 5, wherein the developing is Performed with propanol-(2), a mixture of 2-propanol and methyl isobutyl keton or a mixture of 2-propanol and methyl ethyl ketone.

References Cited (Backward Citations)

US4061832A Cited
US4125672A Cited
US4096290A Cited
US4273856A Cited
US4268590A Cited
US4276365A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-11-04 1989-05-06 1989-11-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-11-04 1993-05-06 1993-11-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-11-04 1997-05-06 1997-11-05 $7700.00 Window Closed / Lapsed

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