Patent US4550069A successfully refreshed from Google Patents.
US4550069A
Expired / Lapsed
US
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Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
Assignee: EMD Performance Materials Corp
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Filing: 1984-06-11
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Granted: 1985-10-29
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Expires: 2004-06-11
Abstract
Abstract The invention provides a positive working photosensitive composition which comprises at least one novolak resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate.
Inventors
- 👤 Thomas R. Pampalone
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 19:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
47 words
A photosensitive positive working composition suitable for use as a photoresist, which consists essentially of, in admixture at least one novolak resin, at least one o-quinone diazide photosensitizer and a sufficient amount of a propylene glycol alkyl ether acetate to increase the effective photospeed of the composition.
Claim 2
Dependent Claim
47 words
A photosensitive positive working composition suitable for use as a photoresist, which consists essentially of, in admixture at least one novolak resin, at least one o-quinone diazide photosensitizer and a sufficient amount of a propylene glycol alkyl ether acetate to increase the effective photospeed of the composition.
Claim 3
Dependent Claim
15 words
The composition of claim 1 wherein said acetate component is propylene glycol methyl ether acetate.
Claim 4
Dependent Claim
28 words
The composition of claim 1 further comprising one or more additives selected from the group consisting of colorants, anti-striation agents, plasticizers, adhesion promoters, speed enhancers, solvents and surfactants.
Claim 5
Dependent Claim
31 words
The composition of claim 1 wherein said acetate is present in an amount of from about 5% to about 100% based on the weight of the solvents portion of the composition.
Claim 6
Dependent Claim
28 words
The composition of claim 1 wherein said novolak resin is present in an amount of from about 5% to about 40% based on the weight of said composition.
Claim 7
Dependent Claim
31 words
The composition of claim 1 wherein said diazide is present in an amount of from about 5% to about 35% based on the weight of the solids portion of the composition.
Claim 8
Dependent Claim
34 words
The composition of claim 1 wherein said diazide component comprises one or more compounds selected from the group consisting of diazo sulfonyl-chloride reaction products with hydroxy or polyhydroxy aryl compounds, aryl amines or polyamines.
Claim 9
Dependent Claim
17 words
The composition of claim 1 wherein said photosensitizer is the condensation product of naphthoquinone-(1,2)-diazide-(2)5-sulfonyl chloride with trihydroxybenzophenone.
Claim 10
Dependent Claim
27 words
The composition of claim 1 wherein said acetate is present in an amount of about 100% based on the weight of the solvents portion of the composition.
Claim 11
Dependent Claim
17 words
A photosensitive element which comprises a substrate and the composition of claim 1 disposed on said substrate.
Claim 12
Dependent Claim
37 words
The element of claim 10 wherein said substrate comprises one or more components selected from the group consisting of silicon, aluminum, polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics and aluminum/copper mixtures.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-10-28 | 1989-04-29 | 1989-10-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-10-28 | 1993-04-29 | 1993-10-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-10-28 | 1997-04-29 | 1997-10-29 | $7700.00 | Window Closed / Lapsed |