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US4530895A
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Aqueous-alkaline solution and process for developing positive-working reproduction layers
Assignee: Hoechst AG
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Filing: 1983-08-03
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Granted: 1985-07-23
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Expires: 2003-08-03
Abstract
Abstract PCT No. PCT/EP83/00205 Sec. 371 Date Apr. 11, 1984 Sec. 102(e) Date Apr. 11, 1984 PCT Filed Aug. 3, 1983 PCT Pub. No. WO84/00826 PCT Pub. Date Mar. 1, 1984.The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may further contain a salt of an organic, optionally substituted, aromatic monocarboxylic acid, for example, a benzoate. This solution is in particular used for developing reproduction layers which contain an o-naphthoquinone diazide as the radiation-sensitive compound and an alkali-soluble resin and which are applied to a support material based on aluminum, which comprises at least one aluminum oxide layer produced by anodic oxidation.
Inventors
- 👤 Ulrich Simon
- 👤 Rainer Beutel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 15:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
62 words
An aqueous-alkaline developer solution for radiation-sensitive, positive-working production layers, comprising (a) from 0.001 to 1.0 percent by weight of a tetraalkyl ammonium hydroxide comprising alkyl substituents which are identical or different and which comprise from 1 to 6 carbon atoms, or of a salt of said tetraalkylammonium hydroxide, and (b) from 5 to 15 percent by weight of an alkali metal silicate.
Claim 2
Dependent Claim
62 words
An aqueous-alkaline developer solution for radiation-sensitive, positive-working production layers, comprising (a) from 0.001 to 1.0 percent by weight of a tetraalkyl ammonium hydroxide comprising alkyl substituents which are identical or different and which comprise from 1 to 6 carbon atoms, or of a salt of said tetraalkylammonium hydroxide, and (b) from 5 to 15 percent by weight of an alkali metal silicate.
Claim 3
Dependent Claim
17 words
A developer solution as claimed in claim 1, further comprising a salt of an aromatic monocarboxylic acid.
Claim 4
Dependent Claim
17 words
A developer solution as claimed in claim 2, wherein said salt of said acid is a benzoate.
Claim 5
Dependent Claim
27 words
A developer solution as claimed in claim 2, wherein said salt of said acid is present in an amount ranging from 0.01 to 10.0 percent by weight.
Claim 6
Dependent Claim
90 words
A process for developing an exposed, radiation-sensitive, positive-working reproduction layer on a support material comprised of aluminum or an aluminum alloy, comprising the step of washing out exposed areas of said layer with an aqueous-alkaline developer solution comprising (a) from 0.001 to 1.0 percent by weight of a tetraalkyl ammonium hydroxide comprising alkyl substituents which are identical or different and which comprise from 1 to 6 carbon atoms, or of a salt of said tetraalkylammonium hydroxide, and (b) from 5 to 15 percent by weight of an alkali metal silicate.
Claim 7
Dependent Claim
90 words
A process for developing an exposed, radiation-sensitive, positive-working reproduction layer on a support material comprised of aluminum or an aluminum alloy, comprising the step of washing out exposed areas of said layer with an aqueous-alkaline developer solution comprising (a) from 0.001 to 1.0 percent by weight of a tetraalkyl ammonium hydroxide comprising alkyl substituents which are identical or different and which comprise from 1 to 6 carbon atoms, or of a salt of said tetraalkylammonium hydroxide, and (b) from 5 to 15 percent by weight of an alkali metal silicate.
Claim 8
Dependent Claim
20 words
A process as claimed in claim 5, wherein said developer solution further comprises a salt of an aromatic monocarboxylic acid.
Claim 9
Dependent Claim
22 words
A process as claimed in claim 6, wherein said reproduction layer comprises an o-naphthoquinone diazide as radiation-sensitive compound and an alkali-soluble resin.
Claim 10
Dependent Claim
22 words
A process as claimed in claim 7, wherein said support material comprises at least one aluminum oxide layer produced by anodic oxidation.
Claim 11
Dependent Claim
22 words
A process as claimed in claim 6, wherein said support material comprises at least one aluminum oxide layer produced by anodic oxidation.
Claim 12
Dependent Claim
16 words
A process as claimed in claim 6, wherein said salt of said acid is a benzoate.
Claim 13
Dependent Claim
26 words
A process as claimed in claim 6, wherein said salt of said acid is present in an amount ranging from 0.01 to 10.0 percent by weight.
Claim 14
Dependent Claim
20 words
A process as claimed in claim 5, wherein said reproduction layer comprises an o-naphthouinone diazide compound and an alkali-soluble resin.
Claim 15
Dependent Claim
22 words
A process as claimed in claim 12, wherein said support material comprises at least one aluminum oxide layer produced by anodic oxidation.
Claim 16
Dependent Claim
22 words
A process as claimed in claim 5, wherein said support material comprises at least one aluminum oxide layer produced by anodic oxidation.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-07-22 | 1989-01-21 | 1989-07-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-22 | 1993-01-21 | 1993-07-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-07-22 | 1997-01-21 | 1997-07-23 | $7700.00 | Window Closed / Lapsed |