US4525390A
Expired / Lapsed
US
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Deposition of copper from electroless plating compositions
Assignee: International Business Machines Corp
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Filing: 1984-03-09
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Granted: 1985-06-25
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Expires: 2004-03-09
Abstract
Abstract Copper is deposited onto a substrate by plating a first layer of copper onto the substrate from an electroless plating bath and plating a second layer of copper onto the first layer of copper from a second and different electroless plating bath. The first and second plating baths differ from each other in at least the cyanide content and oxygen content. The process reduces plating void defects and reduces nodule formation.
Inventors
- 👤 Warren A. Alpaugh
- 👤 William J. Amelio
- 👤 Voya Markovich
- 👤 Carlos J. Sambucetti
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 20:43
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/10; H05K3/18; H05K3/181; C; C23; C23C; C23C18/00; C23C18/16; C23C18/31; C23C18/38; C23C18/40
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
112 words
A process for plating copper onto a substrate which is catalytic for the deposition of copper which comprises plating a first layer of copper onto said substrate from a first alkaline electroless copper plating bath containing about 4 to 7 ppm of cyanide ions and an oxygen content of 1.5 ppm or less; plating a second layer of copper onto said first layer of copper from a second alkaline electroless copper plating bath containing about 8 to 10 ppm of cyanide ion and an oxygen content of about 2.5 to 4 ppm; and wherein values of the oxygen content are for baths at a temperature of about 70° C. to 80° C.
Claim 2
Dependent Claim
112 words
A process for plating copper onto a substrate which is catalytic for the deposition of copper which comprises plating a first layer of copper onto said substrate from a first alkaline electroless copper plating bath containing about 4 to 7 ppm of cyanide ions and an oxygen content of 1.5 ppm or less; plating a second layer of copper onto said first layer of copper from a second alkaline electroless copper plating bath containing about 8 to 10 ppm of cyanide ion and an oxygen content of about 2.5 to 4 ppm; and wherein values of the oxygen content are for baths at a temperature of about 70° C. to 80° C.
Claim 3
Dependent Claim
20 words
The process of claim 1 wherein said substrate is a dielectric substrate rendered catalytic for the deposition of the copper.
Claim 4
Dependent Claim
19 words
The process of claim 2 which includes seeding the dielectric substrate with a seeder composition containing palladium and tin.
Claim 5
Dependent Claim
53 words
The process of claim 3 wherein prior to seeding, the substrate is contacted with a composition containing a multifunctional ionic polymer material containing at least two available ionic moieties, wherein said ionic moieties are of a charge opposite from the charge associated with the seeder particles to be subsequently applied to the substrate.
Claim 6
Dependent Claim
16 words
The process of claim 4 wherein said multifunctional ionic polymer material is a multifunctional cationic material.
Claim 7
Dependent Claim
20 words
The process of claim 4 wherein said multifunctional ionic polymer material is a copolymer of acrylamide and ammonium quaternary compounds.
Claim 8
Dependent Claim
21 words
The process of claim 4 wherein said multifunctional ionic polymer material is a copolymer of acrylamide and betamethacryloxyethyltrimethyl ammonium methyl sulfate.
Claim 9
Dependent Claim
23 words
The process of claim 1 wherein the oxygen content of said first alkaline electroless copper plating bath is 0.5 to about 1.5 ppm.
Claim 10
Dependent Claim
20 words
The process of claim 1 wherein the oxygen content of said first plating bath is 1 to about 1.5 ppm.
Claim 11
Dependent Claim
22 words
The process of claim 1 wherein the oxygen content of said second alkaline electroless copper plating bath is 3 to 3.5 ppm.
Claim 12
Dependent Claim
82 words
The process of claim 1 wherein said first alkaline electroless copper plating bath contains a cupric ion source in amounts of about 8.0 to about 8.8 grams per liter calculated as CuSO 4 ; about 2 to about 4 milliliters per liter of a reducing agent; about 40 to about 45 grams per liter of complexing agent for the cupric ions; has a pH of about 11.6 to about 11.8; and is at a temperature between about 70° C. and 80° C.
Claim 13
Dependent Claim
41 words
The process of claim 11 wherein said cupric ion source is CuSO 4 .5H 2 O, said reducing agent is formaldehyde, and said complexing agent is ethylene diamine tetraacetic acid or salt thereof; and said cyanide is an alkali metal cyanide.
Claim 14
Dependent Claim
81 words
The process of claim 11 wherein the second electroless plating bath contains about 8.8 to about 10 grams per liter of cupric ion source, calculated as CuSO 4 .5H 2 O; a reducing agent in amounts of about 2 to about 4 milliliters per liter; a complexing agent in amounts of about 36 to about 40 grams per liter, has a pH of about 11.6 to about 11.8, and is at a temperature of about 70° C. to about 80° C.
Claim 15
Dependent Claim
32 words
The process of claim 13 wherein said cupric ion source is CuSO 4 .5H 2 O, said reducing agent is formaldehyde, said complexing agent is ethylene diamine tetraacetic acid or salt thereof.
Claim 16
Dependent Claim
28 words
The process of claim 1 wherein the first and second electroless plating baths are maintained at a temperature of about 70° C. to about 75° C. during plating.
Claim 17
Dependent Claim
28 words
The process of claim 1 wherein the first and second electroless plating baths are maintained at a temperature of about 72° C. to about 74° C. during plating.
Claim 18
Dependent Claim
39 words
The process of claim 1 wherein the plating with the first electroless plating bath is for about 15 minutes to about 2 hours and the plating with the second electroless plating bath is about 8 to about 20 hours.
Claim 19
Dependent Claim
31 words
The process of claim 1 wherein the plating with the first electroless plating bath and the second electroless plating bath occurs in the same plating tank by changing the plating bath.
Claim 20
Dependent Claim
40 words
The process of claim 1 wherein the amounts of cupric ion source and complexing agent in the first alkaline electroless copper plating bath differ from the amounts of cupric ion source and complexing agent in the second electroless plating bath.
Claim 21
Dependent Claim
34 words
The process of claim 13 wherein the first alkaline electroless copper plating bath contains a cupric ion source in amounts of about 8.0 to about 8.4 grams per liter calculated as CuSO 4 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-24 | 1988-12-24 | 1989-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-24 | 1992-12-24 | 1993-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-24 | 1996-12-24 | 1997-06-25 | $7700.00 | Window Closed / Lapsed |