Simultaneous doped layers for semiconductor devices

Claim 2

A semiconductor device comprising: a solid having a plurality of semiconductor layers and a substrate, said semiconductor layers being formed upon said substrate, said layers being composed of indium phosphide; at least one ohmic capping layer formed on an outer surface of said solid, said capping layer comprised of indium phosphide, and both a group II element, and a group VI element, said capping layer being formed of material comprising indium phosphide, zinc, and selenium having been formed from a growth solution in amounts of about 99.6199% indium, 0.1762% phosphorous, 0.1801% selenium and 0.0238% zinc by weight; a first electrical contact on said capping layer for connecting said semiconductor device into a circuit; and a second electrical contact formed on said substrate for connecting said device into a circuit.

Claim 3

An electroluminescent semiconductor device comprising: a first electrical contact; an indium phosphide substrate having said first electrical contact on a first contact surface thereof; at least one N-type indium phosphide layer, said N-type layer formed on said substrate opposite to said first contact surface; an active laser region composed of indium phosphide and doped P-type formed on said N-type layer, said active laser region having a bandgap less than said N-type layer upon which formed; at least one P-type indium phosphide layer, one surface of said P-type layer operably formed on said active laser region; an ohmic capping layer of indium phosphide operably formed on said P-type layer, said capping layer being P-type; and a second electrical contact formed on said ohmic capping layer so that electrical current can flow through said device, wherein said active laser region and said ohmic capping layer are doped simultaneously with a group II element and a group IV element; said laser region and said capping layer comprising indium phosphide, zinc, and selenium, said laser region and said capping layer having been formed from a growth solution having amounts of about 99.6199% indium, 0.1762% phosphorous, 0.1801% selenium, and 0.0238% zinc by percent weight.

Claim 4

An electroluminescent semiconductor device comprising: a first electrical contact; an indium phosphide substrate having said first electrical contact on a first contact surface thereof; at least one N-type indium phosphide layer, said N-type layer formed on said substrate opposite to said first contact surface; an active laser region composed of indium phosphide and doped P-type formed on said N-type layer, said active laser region having a bandgap less than said N-type layer upon which formed; at least one P-type indium phosphide layer, one surface of said P-type layer operably formed on said active laser region; an ohmic capping layer of indium phosphide operably formed on said P-type layer, said capping layer being P-type; and a second electrical contact formed on said ohmic capping layer so that electrical current can flow through said device, wherein said active laser region and said ohmic capping layer are doped simultaneously with a group II element and a group IV element; said laser region and said capping layer comprising indium phosphide, zinc, and selenium, said laser region and said capping layer having been formed from a growth solution having amounts of about 99.6199% indium, 0.1762% phosphorous, 0.1801% selenium, and 0.0238% zinc by percent weight.