Heater assembly for molecular beam epitaxy furnace

Claim 2

In a molecular beam epitaxy furnace, a heater for heating the interior of an effusion cell comprising: an outer cylindrical sleeve having one end connected to receive a vacuum and an opposite end; an inner sleeve coaxial with said outer cylindrical sleeve, having one end sealed with said outer cylindrical sleeve opposite end, and extending along a portion of said cylindrical sleeve to a closed opposite end, said inner sleeve, and outer cylindrical sleeve providing an interior vacuum chamber; and, a heating element disposed between said cylindrical sleeve and inner sleeve for heating said interior vacuum chamber and a crucible located in said inner sleeve, whereby semiconductor constituent materials in said crucible are evaporated in an environment free from contaminants produced by said heating element.

Claim 3

A molecular beam epitaxy furnace apparatus for heating a crucible containing semiconductor material comprising: a vacuum housing; at least one effusion cell open at one end in said vacuum housing and extending through said vacuum housing; a heater assembly disposed in said effusion cell, including: an outer cylindrical housing; an inner cylindrical crucible housing coaxial with said outer cylindrical housing, and having one end thereof coplanar with one end of said cylindrical housing, the remaining end of said inner crucible housing being sealed with a wall member, and said coplanar ends being sealed with each other, said outer cylindrical housing and inner cylindrical housing forming a heater element chamber sealed from the interior of said inner cylindrical crucible housing; a flange terminating the remaining end of said outer cylindrical housing, said flange having means for coupling with an end of said effusion cell exterior to said vacuum housing and an opening to receive a vacuum; and a heating element disposed between said inner cylindrical crucible housing and said outer cylindrical housing, isolated from a crucible received in said inner cylindrical crucible housing to avoid contaminating said crucible and subject to a vacuum applied to said flange opening.

Claim 4

A molecular beam epitaxy furnace apparatus for heating a crucible containing semiconductor material comprising: a vacuum housing; at least one effusion cell open at one end in said vacuum housing and extending through said vacuum housing; a heater assembly disposed in said effusion cell, including: an outer cylindrical housing; an inner cylindrical crucible housing coaxial with said outer cylindrical housing, and having one end thereof coplanar with one end of said cylindrical housing, the remaining end of said inner crucible housing being sealed with a wall member, and said coplanar ends being sealed with each other, said outer cylindrical housing and inner cylindrical housing forming a heater element chamber sealed from the interior of said inner cylindrical crucible housing; a flange terminating the remaining end of said outer cylindrical housing, said flange having means for coupling with an end of said effusion cell exterior to said vacuum housing and an opening to receive a vacuum; and a heating element disposed between said inner cylindrical crucible housing and said outer cylindrical housing, isolated from a crucible received in said inner cylindrical crucible housing to avoid contaminating said crucible and subject to a vacuum applied to said flange opening.

Claim 5

The molecular beam epitaxy furnace of claim 2 comprising: a first vacuum pump connected to said effusion cell for applying a vacuum to the interior of said effusion cell; and a second vacuum pump connected to said outer cylindrical housing through said opening in said flange whereby a separate vacuum for said heater is provided.

Claim 6

The molecular beam epitaxy furnace of claim 2 further comprising: a vacuum isolation valve connected to said effusion cell external to said housing; a bellows connected to said vacuum isolation valve; and a T assembly having one side connected to said bellows, a second end opposite said one end for connection with said flange, and a third end connected to recieve said vacuum.