Pattern generator for integrated circuits and process of generating patterns by means of said generator

Claim 2

A pattern generator for integrated circuits consisting of a stack of various layers comprising: a source (SLI) transmitting a beam of light; for each one of the layers at least one associated reticle (RETMI) bearing patterns to be reproduced thereon and which is transparent, at least one portion of its surface, to the beam of light from said source; optical means (MPI) for projecting the image of the patterns onto a layer coated with photosensitive resin, a light polarizer (POLI) connected to the source, the reticle (RETMI) comprising a thin layer of magnetooptical material with a magnetization which is at right angles to its surface, where the patterns are made up of magnetic domains (D1, D2, D3) with a given shape and a given magnetization which is opposite to the magnetic environment surrounding them, the image of said pattern being restituted by a light meter (ANALI).

Claim 3

The generator according to claim 1, wherein the magnetic material is a garnet (GRI) made from iron, yttrium and rare earth.

Claim 4

A process of generating patterns on a layer of integrated circuits comprising the steps of susccessively: formation of a reticle (RETMI) by depositing a thin layer on a medium which is transparent to light and writing of patterns (MOT1, MOT2, MOT3) on the reticle; verification of the patterns thus obtained; coating the layer of integrated circuits (CMCI) with a photosensitive resin (CORESI); projecting and focusing of the image of the reticle on the layer; developing the image of the patterns projected onto the layer in a bath which dissolves the parts of the layer exposed to light during the projection and focusing of the image of the reticle, characterized in that: (a) the thin layer of a magnetooptical material (GRI) is deposited having a magnetization which is at right angles to its surface on the medium which is transparent to light (STLI); (b) writing of the patterns on the thin layer of material is by means of a magnetic or thermomagnetic transducer, thus obtaining the reticle (RETMI); (c) verification of the patterns is by a magnetic or magnetooptical transducer; and (d) projection is by means of an assembly made up of a polarizer (POLI) of the reticle (RETMI) and the light meter (ANALI).

Claim 5

A process of generating patterns on a layer of integrated circuits comprising the steps of susccessively: formation of a reticle (RETMI) by depositing a thin layer on a medium which is transparent to light and writing of patterns (MOT1, MOT2, MOT3) on the reticle; verification of the patterns thus obtained; coating the layer of integrated circuits (CMCI) with a photosensitive resin (CORESI); projecting and focusing of the image of the reticle on the layer; developing the image of the patterns projected onto the layer in a bath which dissolves the parts of the layer exposed to light during the projection and focusing of the image of the reticle, characterized in that: (a) the thin layer of a magnetooptical material (GRI) is deposited having a magnetization which is at right angles to its surface on the medium which is transparent to light (STLI); (b) writing of the patterns on the thin layer of material is by means of a magnetic or thermomagnetic transducer, thus obtaining the reticle (RETMI); (c) verification of the patterns is by a magnetic or magnetooptical transducer; and (d) projection is by means of an assembly made up of a polarizer (POLI) of the reticle (RETMI) and the light meter (ANALI).

Claim 6

A pattern-generating reticle for integrated circuits bearing patterns (MOT1, MOT2, MOT3) to be reproduced on at least one layer (CMCII) of the circuit which is transparent to light on at least one portion of its surface, comprising a thin layer of magnetooptical material with a magnetization which is at right angles to its surface where the patterns consist of magnetic domains (D1, D2, D3) with a given shape and a given magnetization which is opposite to that of the magnetic environment surrounding them.

Claim 7

A pattern-generating reticle for integrated circuits bearing patterns (MOT1, MOT2, MOT3) to be reproduced on at least one layer (CMCII) of the circuit which is transparent to light on at least one portion of its surface, comprising a thin layer of magnetooptical material with a magnetization which is at right angles to its surface where the patterns consist of magnetic domains (D1, D2, D3) with a given shape and a given magnetization which is opposite to that of the magnetic environment surrounding them.

Claim 8

The reticle according to claim 4, wherein the magnetic material is a magnetooptical garnet made from iron, yttrium and rare earth.

Claim 9

A process for producing a pattern-generating reticle for integrated circuits obtained by depositing a thin layer on a medium (STLI) which is transparent to light, comprising: (a) depositing on the medium (STLI) a thin layer of magnetooptical material (GRI) having a magnetization which is at right angles to its surface on the medium which is transparent to light (STLI); (b) writing patterns (MOT1, MOT2, MOT3) on the thin layer of magnetooptical material by means of a magnetic or thermomagnetic transducer (TMEVI); and (c) verifying the patterns (MOT1, MOT2, MOT3) so written by means of a magnetic or magnetooptical transducer.

Claim 10

A process for producing a pattern-generating reticle for integrated circuits obtained by depositing a thin layer on a medium (STLI) which is transparent to light, comprising: (a) depositing on the medium (STLI) a thin layer of magnetooptical material (GRI) having a magnetization which is at right angles to its surface on the medium which is transparent to light (STLI); (b) writing patterns (MOT1, MOT2, MOT3) on the thin layer of magnetooptical material by means of a magnetic or thermomagnetic transducer (TMEVI); and (c) verifying the patterns (MOT1, MOT2, MOT3) so written by means of a magnetic or magnetooptical transducer.