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US4499655A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for making alignment-enhancing feed-through conductors for stackable silicon-on-sapphire

Assignee: General Electric Co
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Filing: 1982-11-29
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Granted: 1985-02-19
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Expires: 2002-11-29
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Abstract

Abstract Alignment-enhancing electrically conductive feed-through paths are provided for the high-speed low-loss transfer of electrical signals between integrated circuits of a plurality of silicon-on-sapphire bodies arrayed in a stack. The alignment-enhancing feed-throughs are made by a process of this invention involving the drilling of holes through the body, double-sided sputtering, electroplating, and the filling of the holes with solder by capillary action. The alignment-enhancing feed-throughs are activated by forming a stack of wafers and remelting the solder whereupon the wafers, and the feed-through paths, are pulled into alignment by surface tension forces.

Inventors

  • 👤 Thomas R. Anthony

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 00:24
CPC Classifications
H; H10; H10W; H10W90/00; H05; H05K; H05K3/00; H05K3/30; H05K3/32; H05K3/34; H05K3/341; H05K3/3431; H05K3/3436; H10W70/00; H10W70/60; H10W70/611; H10W90/401; H05K1/00; H05K1/02; H05K1/03; H05K1/0306; H05K2201/00; H05K2201/09; H05K2201/09209; H05K2201/095; H05K2201/096; H05K2201/10; H05K2201/10613; H05K2201/10621; H05K2201/10666; H05K2203/00; H05K2203/04; H05K2203/0455; H05K3/36; H05K3/368; H10W90/20; H10W90/297; H10W90/701; H10W90/721; H10W90/722; Y; Y02; Y02P; Y02P70/00; Y02P70/50; Y10; Y10S; Y10S438/00; Y10S438/94; Y10S438/975

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 130 words
A process for making alignment-enhancing electrically conductive feed-through conductors in a body comprising the steps of: (a) providing a stackable semiconductor body, said body having top and bottom major opposed surfaces substantially parallel to each other and an outer peripheral edge area interconnecting said major surfaces; (b) providing a plurality of holes through said body, each of said holes having apertures lying in said major opposed surfaces and an inner surface interconnecting said apertures; (c) depositing a first thin layer of a first metal onto each of said inner surfaces; (d) applying a second thin layer of a second metal over each of said first thin layers; and (e) filling the remaining hole volume with a third metal forming thereby an alignment-enhancing electrically conductive feedthrough in a stackable semiconductor body.
Claim 2
Dependent Claim 130 words
A process for making alignment-enhancing electrically conductive feed-through conductors in a body comprising the steps of: (a) providing a stackable semiconductor body, said body having top and bottom major opposed surfaces substantially parallel to each other and an outer peripheral edge area interconnecting said major surfaces; (b) providing a plurality of holes through said body, each of said holes having apertures lying in said major opposed surfaces and an inner surface interconnecting said apertures; (c) depositing a first thin layer of a first metal onto each of said inner surfaces; (d) applying a second thin layer of a second metal over each of said first thin layers; and (e) filling the remaining hole volume with a third metal forming thereby an alignment-enhancing electrically conductive feedthrough in a stackable semiconductor body.
Claim 3
Dependent Claim 45 words
The process of claim 1 further including the process steps of: (1) forming a stack of the stackable bodies and (2) remelting said third metal, forming thereby a stacked self-aligned array of the bodies, said bodies having a plurality of electrically conductive paths communicating therebetween.
Claim 4
Dependent Claim 13 words
The process of claim 2 wherein said third metal is a lead-tin alloy.
Claim 5
Dependent Claim 25 words
The process of claim 2 wherein said remelting is accomplished by heating said stack to a temperature sufficient to cause melting of said third metal.
Claim 6
Dependent Claim 38 words
The process of claim 1 wherein said body is composed of a single material, said single material being one selected from the group consisting of silicon, germanium, gallium arsenide, gallium phosphide, indium antimonide, cadmium telluride, and zinc sulfide.
Claim 7
Dependent Claim 69 words
The process of claim 1 wherein said body is a composite, said body having a single crystal sapphire substrate and a contiguous overlaying epitaxially-grown layer of single crystal silicon, said top major surface being the exposed surface of said silicon layer, said bottom major surface being the exposed surface of said sapphire substrate and said outer peripheral edge area encompassing both said sapphire substrate and said layer of silicon.
Claim 8
Dependent Claim 31 words
The process of claim 1 wherein said body is composed of an insulating material, said insulating material being one selected from the group consisting of alumina, quartz, glass and beryllium oxide.
Claim 9
Dependent Claim 15 words
The process of claim 1 wherein said holes are provided by a laser drilling process.
Claim 10
Dependent Claim 11 words
The process of claim 1 wherein said first metal is gold.
Claim 11
Dependent Claim 11 words
The process of claim 1 wherein said first metal is nichrome.
Claim 12
Dependent Claim 14 words
The process of claim 1 wherein said first thin layer is deposited by sputtering.
Claim 13
Dependent Claim 16 words
The process of claim 1 wherein said second thin layer is applied by an electrodeposition process.
Claim 14
Dependent Claim 24 words
The process of claim 12 wherein said electrodeposition process includes agitation of said body substantially perpendicular to said major surfaces during said electrodeposition process.
Claim 15
Dependent Claim 15 words
The process of claim 1 wherein the metal of said second thin layer is copper.
Claim 16
Dependent Claim 35 words
The process of claim 14 further including the process step of arresting said agitation prior to completion of said electrodeposition process for a time sufficient to cause a relief electroplate of predetermined height to form.

References Cited (Backward Citations)

US3259049A Cited
US3301939A Cited
US3654097A Cited
US3798136A Cited
US4312897A Cited
US4285780A Cited
US4278511A Cited
US4368106A Cited
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US4399004A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-02-19 1988-08-20 1989-02-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-02-19 1992-08-20 1993-02-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-02-19 1996-08-20 1997-02-19 $7700.00 Window Closed / Lapsed

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