Periodic reverse current pulsing to form uniformly sized feed through conductors

Claim 2

A process for implanting a plurality of solid, dense, metallic feed-through conductors comprising the steps of: (a) providing a body, said body having top and bottom major opposed surfaces substantially parallel to each other, an outer peripheral edge area interconnecting said major surfaces, and a plurality of holes therethrough, one of said major surfaces being overlaid by at least a thin film of a conducting metal, said metal being one selected from the group consisting of gold, copper, nickel, chromium, and mixtures and alloys thereof; (b) positioning said body in a tank parallel to an anode such that said thin film on said major surface faces away from said anode and a space is formed between said body and said anode, the metal of said anode being the same as the metal of said solid, dense, metallic feed-through conductors to be implanted; (c) surrounding said body and said anode with an electroforming solution, said electroforming solution having therein at least the metal of said solid, dense, metallic feed-through conductors to be implanted; (d) initiating a flow of bubbles of an inert gas in said space between said body and said anode; (e) establishing a flow of direct current through said solution, between said anode and said thin film; (f) forming a solid film bridge of metal across the bottoms of said holes; (g) reversing periodically said flow of said direct current, the periodically reversed current flow being substantially in the form of a periodic train of rectangular pulses, said pulses varying from a current level of I p in the forward direction for a time period of T p to a current level of I R in the reverse direction for a time period of T R ; and (h) growing, at a substantially uniform rate, a plurality of solid, dense, metallic implants from said solid film bridges at said bottoms of said holes to the tops of said holes.

Claim 3

The process of claim 1 wherein said plurality of holes comprises a plurality of greater than about 1000 holes.

Claim 4

The process of claim 1 wherein the value of I p is about -100 ma, the value of I R is about +1000 ma, the value of T p is about 5 seconds, and the value of T R is about 0.2 second.

Claim 5

The process of claim 1 wherein the density of said implants is greater than about 95% of theoretical.

Claim 6

The process of claim 1 wherein said body is composed of a single material, said single material being one selected from the group consisting of silicon, germanium, gallium arsenide, gallium phosphide, indium antimonide, cadmium telluride, and zinc sulfide.

Claim 7

The process of claim 1 wherein said body is a composite, said body having a single crystal sapphire substrate and a contiguous overlying epitaxially-grown layer of single crystal silicon, said top major surface being the exposed surface of said silicon layer, said bottom major surface being the exposed surface of said sapphire substrate and said outer peripheral edge area encompassing both said sapphire substrate and said layer of silicon.

Claim 8

The process of claim 1 wherein said tank is capable of sustaining a vacuum.

Claim 9

The process of claim 7 further including the steps of establishing a vacuum in said tank prior to said surrounding step and, after conducting said surrounding step, maintaining said vacuum in said tank for a period of time sufficient for said solution to completely fill said plurality of holes and, thereafter, returning said tank to atmospheric pressure.

Claim 10

The process of claim 8 wherein said step of establishing a vacuum comprises establishing a vacuum of at least about 1 Torr.

Claim 11

The process of claim 1 further including the steps of continuing the periodically reversed flow of direct current until said feed-through conductors have emerged from said holes and simultaneously growing the emerged feed-through conductors away from said top and bottom surfaces and parallel to said top and bottom surfaces forming thereby a first plurality of rivet-like terminations adjacent to said top surface and a second plurality of rivet-like terminations adjacent to said bottom surface, the diameters of said rivet-like terminations being substantially equal.

Claim 12

The process of claim 10 wherein said first and second pluralities of rivet-like terminations each comprise about 10 n terminations and no more than three terminations of said first plurality or said second plurality deviates from the average diameter of the terminations in the plurality by more than about the quantity (±1.5%×n), where n is a number from 3 to 6 inclusive.

Claim 13

The process of claim 10 wherein said first and second pluralities of rivet-like terminations each comprise about 1000 terminations, the average diameter of the terminations in said first plurality and said second plurality is about 200 microns, and the diameter of each termination in each plurality is equal to or less than about ±3 microns of said average diameter.

Claim 14

A process for implanting solid, dense, copper feed-through conductors comprising the steps of: (a) providing a body, said body having top and bottom major opposed surfaces substantially parallel to each other, an outer peripheral edge area interconnecting said major surfaces, and a plurality of holes therethrough, one of said major surfaces being overlaid by at least a thin film of a conducting metal, said metal being one selected from the group consisting of gold, copper, nickel, chromium, and mixtures and alloys thereof; (b) positioning said body in a tank parallel to an anode such that said thin film on said major surface faces away from said anode and a space is formed between said body and said anode, the metal of said anode being copper; (c) surrounding said body and said anode with an electroforming solution, said solution being an aqueous solution consisting essentially, in grams per liter, of from about 220 to about 270 grams of hydrated copper sulfate, from about 5 to about 28 grams of sulphuric acid, from about 0.007 to about 0.013 gram of thiourea, and from about 0.03 to about 1.0 gram of molasses; (d) initiating a flow of bubbles of an inert gas in said space between said body and said anode; (e) establishing a flow of direct current through said solution, between said anode and said thin film; (f) forming a solid film bridge of copper across the bottoms of said holes; (g) reversing periodically said flow of said direct current, the periodically reversed current flow being substantially in the form of a periodic train of rectangular pulses, said pulses varying from a current level of I p in the forward direction for a time period of T p to a current level of I R in the reverse direction for a time period of T R ; and (h) growing solid, dense, copper implants in said holes from said solid film bridge at the bottoms of said holes to the tops of said holes.

Claim 15

A process for implanting solid, dense, copper feed-through conductors comprising the steps of: (a) providing a body, said body having top and bottom major opposed surfaces substantially parallel to each other, an outer peripheral edge area interconnecting said major surfaces, and a plurality of holes therethrough, one of said major surfaces being overlaid by at least a thin film of a conducting metal, said metal being one selected from the group consisting of gold, copper, nickel, chromium, and mixtures and alloys thereof; (b) positioning said body in a tank parallel to an anode such that said thin film on said major surface faces away from said anode and a space is formed between said body and said anode, the metal of said anode being copper; (c) surrounding said body and said anode with an electroforming solution, said solution being an aqueous solution consisting essentially, in grams per liter, of from about 220 to about 270 grams of hydrated copper sulfate, from about 5 to about 28 grams of sulphuric acid, from about 0.007 to about 0.013 gram of thiourea, and from about 0.03 to about 1.0 gram of molasses; (d) initiating a flow of bubbles of an inert gas in said space between said body and said anode; (e) establishing a flow of direct current through said solution, between said anode and said thin film; (f) forming a solid film bridge of copper across the bottoms of said holes; (g) reversing periodically said flow of said direct current, the periodically reversed current flow being substantially in the form of a periodic train of rectangular pulses, said pulses varying from a current level of I p in the forward direction for a time period of T p to a current level of I R in the reverse direction for a time period of T R ; and (h) growing solid, dense, copper implants in said holes from said solid film bridge at the bottoms of said holes to the tops of said holes.

Claim 16

The process of claim 13 wherein the electroforming solution is an aqueous solution consisting essentially, in grams per liter, of about 250 grams of hydrated copper sulfate, about 10 grams of sulphuric acid, about 0.008 gram of thiourea, and about 0.75 gram of molasses.

Claim 17

The process of claim 13 wherein said plurality of holes comprises a plurality of greater than about 1000 holes.

Claim 18

The process of claim 13 wherein the value of I p is about -100 ma, the value of I R is about +1000 ma, the value of T p is about 5 seconds, and the value of T p is about 0.2 second.

Claim 19

The process of claim 13 wherein the density of copper implants is greater than about 95% of theoretical.

Claim 20

The process of claim 13 wherein the resistivity of each said copper implant is less than about 4×10 -6 ohm-cm.

Claim 21

The process of claim 13 wherein said body is composed of a single material, said single material being one selected from the group consisting of silicon, germanium, gallium arsenide, gallium phosphide, indium antimonide, cadmium telluride, and zinc sulfide.

Claim 22

The process of claim 13 wherein said body is a composite, said body having a single crystal sapphire substrate and a contiguous overlying epitaxially-grown layer of single crystal silicon, said top major surface being the exposed surface of said silicon layer, said bottom major surface being the exposed surface of said sapphire substrate and said outer peripheral edge area encompassing both said sapphire substrate and said layer of silicon.

Claim 23

The process of claim 13 wherein said tank is capable of sustaining a vacuum.

Claim 24

The process of claim 21 further including the steps of establishing a vacuum in said tank prior to said surrounding step and, after conducting said surrounding step, maintaining said vacuum in said tank for a period of time sufficient for said solution to completely fill said plurality of holes and, thereafter, returning said tank to atmospheric pressure.

Claim 25

The process of claim 22 wherein said step of establishing a vacuum comprises establishing a vacuum of at least about 1 Torr.

Claim 26

The process of claim 13 further including the steps of continuing the periodically reversed flow of direct current until said copper feed-through conductors have emerged from said holes and simultaneously growing the emerged feed-through conductors away from said top and bottom surfaces and parallel to said top and bottom surfaces forming thereby a first plurality of copper rivet-like terminations adjacent to said top surface and a second plurality of copper rivet-like terminations adjacent to said bottom surface, the diameters of said rivet-like terminations being substantially equal.

Claim 27

The process of claim 24 wherein said first and second pluralities of rivet-like terminations each comprise about 10 n terminations and no more than three terminations of said first plurality or said second plurality deviates from the average diameter of the terminations in the plurality by more than about the quantity (±1.5%×n), where n is a number 3 to 6 inclusive.

Claim 28

The process of claim 24 wherein said first and second pluralities of rivet-like terminations each comprise about 1000 terminations, the average diameter of the terminations in said first plurality and said second plurality is about 200 microns, and the diameter of each termination in each plurality is equal to or less than about ±3 microns of said average diameter.