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US4490183A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of reactivating implanted dopants and oxidation semiconductor wafers by microwaves

Assignee: ITT Inc
•
Filing: 1982-08-31
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Granted: 1984-12-25
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Expires: 2002-08-31
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Abstract

Abstract Dopants in semiconductor bodies which have been deactivated during processing are reactivated by pulse heating the body to a temperature within the region in which the semiconductor sheet resistivity decreases with increasing anneal temperature. Typically this comprises raising the body to 1000° C. within 40 seconds or less in an inert atmosphere and allowing it to cool immediately or within approximately 30 seconds. The heating is so rapid that diffusion side effects are minimized. Pulse heating may be achieved by means of a sealable microwave heating chamber (1) which can be pressurized or vented as desired and into which microwave energy is directed for a predetermined time. The microwave heating can also be employed for other processing, particularly high pressure oxidation of silicon.

Inventors

  • 👤 Peter D. Scovell

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 16:31
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0436; H10P95/00; H10P95/90

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 51 words
A method of oxidizing a silicon body including: arranging the body in a sealable chamber comprising a length of microwave waveguide; introducing an oxygen ambient atmosphere at a pressure of approximately 20 atmospheres in the chamber; and pulse heating the body by directing microwaves into said chamber for a predetermined time.
Claim 2
Independent Claim 51 words
A method of oxidizing a silicon body including: arranging the body in a sealable chamber comprising a length of microwave waveguide; introducing an oxygen ambient atmosphere at a pressure of approximately 20 atmospheres in the chamber; and pulse heating the body by directing microwaves into said chamber for a predetermined time.
Claim 3
Dependent Claim 37 words
A method in accordance with claim 1, wherein: during said pulse heating step said body is heated to approximately 1000° C. to grow an oxide layer of the order of 150 Å thick in approximately one minute.
Claim 4
Independent Claim 34 words
A method as claimed in claims 1 or 2, wherein the semiconductor body is provided with a doped layer which is such as to directly absorb the microwaves and enhance the heating effect thereof.
Claim 5
Dependent Claim 15 words
A method in accordance with claim 1, wherein said microwaves are directed through said wafer.
Claim 6
Dependent Claim 20 words
A method in accordance with claim 1, wherein the H 1 ,1, mode of propagation of said microwaves is used.
Claim 7
Dependent Claim 13 words
A method in accordance with claim 5, wherein said microwaves are circularly polarized.
Claim 8
Dependent Claim 12 words
A method in accordance with claim 6, wherein said waveguide is cylindrical.

References Cited (Backward Citations)

US4339648A Cited
US4323745A Cited
US4140887A Cited
US4151058A Cited
US4181538A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-12-25 1988-06-25 1988-12-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-12-25 1992-06-25 1992-12-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-12-25 1996-06-25 1996-12-25 $7700.00 Window Closed / Lapsed

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