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US4478679A
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Self-aligning process for placing a barrier metal over the source and drain regions of MOS semiconductors
Assignee: Storage Technology Partners II
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Filing: 1983-11-30
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Granted: 1984-10-23
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Expires: 2003-11-30
Abstract
Abstract A self-aligning process for adding a barrier metal to the source and drain regions of metal oxide semiconductors is presented. An oxide sidewall spacer is first formed on the sides of upwardly protruding gate regions. A barrier metal is then added to the entire surface, followed by adding a layer of resist material. The resist material is added in layers with each layer spun until the top surface is nearly smooth. An anisotropical etch is done to remove the resist everywhere except over the source and drain regions, which regions are depressed due to the upwardly protruding gate region and a surrounding upwardly protruding insulating material. The exposed barrier metal is etched away and the remaining resist is stripped, leaving a layer of barrier metal only over the source and drain regions.
Inventors
- 👤 Jenq-Sian Chang
- 👤 Yih-Jau Chang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 10:24
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0223; H10D64/00; H10D64/20; H10D64/23; H10D64/251; H10D64/258; H10D64/259; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/062; H10W20/0698
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
267 words
In the fabrication of metal oxide semiconductors, a self-aligning process method for adding a barrier metal layer over source and drain regions of said semiconductors, after said semiconductors have been formed but before any metal contacts used in the interconnection of said semiconductors are added, said formed semiconductors including a substrate, spaced-apart source and drain regions embedded into said substrate, an upwardly protruding gate region overlying the space between respective source and drain regions, and an upwardly protruding insulating region overlying the surface of said substrate everywhere except over said source, drain and gate regions, whereby depressions are formed over said source and drain regions as defined by the upwardly protruding insulating and gate regions, said self-aligning method comprising the steps of: (a) placing a layer of oxide over the entire surface of said semiconductors; (b) removing all of said oxide except that oxide placed on the sides of the upwardly protruding gates of said semiconductors; (c) placing a layer of barrier metal over the entire surface of said semiconductor; (d) placing a layer of organic material over said barrier metal, said layer of organic material being applied until an upper surface of said organic material is substantially smooth and free of depressions; (e) removing said layer of organic material until said barrier metal is exposed everywhere except over said depressed source and drain regions, where said organic material remains in said depressions; (f) removing the exposed barrier metal from the surface of said semiconductors; and (g) removing the remaining organic material, thereby leaving said barrier metal on the surfaces of said source and said drain regions.
Claim 2
Dependent Claim
267 words
In the fabrication of metal oxide semiconductors, a self-aligning process method for adding a barrier metal layer over source and drain regions of said semiconductors, after said semiconductors have been formed but before any metal contacts used in the interconnection of said semiconductors are added, said formed semiconductors including a substrate, spaced-apart source and drain regions embedded into said substrate, an upwardly protruding gate region overlying the space between respective source and drain regions, and an upwardly protruding insulating region overlying the surface of said substrate everywhere except over said source, drain and gate regions, whereby depressions are formed over said source and drain regions as defined by the upwardly protruding insulating and gate regions, said self-aligning method comprising the steps of: (a) placing a layer of oxide over the entire surface of said semiconductors; (b) removing all of said oxide except that oxide placed on the sides of the upwardly protruding gates of said semiconductors; (c) placing a layer of barrier metal over the entire surface of said semiconductor; (d) placing a layer of organic material over said barrier metal, said layer of organic material being applied until an upper surface of said organic material is substantially smooth and free of depressions; (e) removing said layer of organic material until said barrier metal is exposed everywhere except over said depressed source and drain regions, where said organic material remains in said depressions; (f) removing the exposed barrier metal from the surface of said semiconductors; and (g) removing the remaining organic material, thereby leaving said barrier metal on the surfaces of said source and said drain regions.
Claim 3
Dependent Claim
84 words
The self-aligning method of adding a barrier metal layer of claim 1 wherein step (d) comprises: (1) depositing a first layer of said organic material over the surface of said semiconductor; (2) spinning said semiconductor to smooth out the depressions caused by said depressed source and drain regions; (3) depositing a second layer of said organic material over the surface of said first layer; and (4) spinning said semiconductor to further smooth out any depressions caused by the underlying depressed source and drain regions.
Claim 4
Dependent Claim
47 words
The self-aligning method of adding a barrier metal layer of claim 2 wherein said organic material comprises a resist material having a desired viscosity, whereby any sharp depressions in the surface of the semiconductor will be smoothed by said viscous resist material when the semiconductor is spun.
Claim 5
Dependent Claim
39 words
The self-aligning method of adding a barrier metal layer of claim 1 wherein step (b) comprises performing an anisotropical etch in order to remove all of said oxide except that on the sides of the upwardly protruding gate region.
Claim 6
Dependent Claim
44 words
The self-aligning method of adding a barrier metal layer of claim 1 wherein step (e) comprises performing an anisotropical etch of said organic material in order to remove it until said barrier metal is exposed everywhere except over the depressed source and drain regions.
Claim 7
Dependent Claim
32 words
The self-aligning method of adding a barrier metal layer of claim 1 wherein the removing of material or layers performed in steps (b), (e), and (f) is performed through an etching process.
Claim 8
Dependent Claim
32 words
The self-aligning method of adding a barrier metal layer of claim 1 wherein the placing of materials or layers performed in steps (a), (c) and (d) is performed through a deposition process.
Claim 9
Dependent Claim
233 words
In the fabrication of metal oxide semiconductors, a self-aligning process method for adding a barrier metal layer over source and drain regions of said semiconductors, after said semiconductors have been formed but before any metal contacts used in the interconnection of said semiconductors are added, said formed semiconductors including a substrate, spaced-apart source and drain regions embedded into said substrate, an upwardly protruding gate region overlying the space between respective source and drain regions, and an upwardly protruding insulating region overlying the surface of said substrate everywhere except over said source, drain and gate regions, whereby depressions are formed over said source and drain regions as defined by the upwardly protruding insulating and gate regions, said self-aligning method comprising the steps of: (a) placing a layer of barrier metal over the entire surface of said semiconductor; (b) placing a layer of organic material over said barrier metal, said layer of organic material being applied until an upper surface of said organic material is substantially smooth and free of depressions; (c) removing said layer or organic material until said barrier metal is exposed everywhere except over said depressed source and drain regions, where said organic material remains in said depressions; (d) removing the exposed barrier metal from the surface of said semiconductors; and (e) removing the remaining organic material, thereby leaving said barrier metal on the surfaces of said source and said drain regions.
Claim 10
Dependent Claim
233 words
In the fabrication of metal oxide semiconductors, a self-aligning process method for adding a barrier metal layer over source and drain regions of said semiconductors, after said semiconductors have been formed but before any metal contacts used in the interconnection of said semiconductors are added, said formed semiconductors including a substrate, spaced-apart source and drain regions embedded into said substrate, an upwardly protruding gate region overlying the space between respective source and drain regions, and an upwardly protruding insulating region overlying the surface of said substrate everywhere except over said source, drain and gate regions, whereby depressions are formed over said source and drain regions as defined by the upwardly protruding insulating and gate regions, said self-aligning method comprising the steps of: (a) placing a layer of barrier metal over the entire surface of said semiconductor; (b) placing a layer of organic material over said barrier metal, said layer of organic material being applied until an upper surface of said organic material is substantially smooth and free of depressions; (c) removing said layer or organic material until said barrier metal is exposed everywhere except over said depressed source and drain regions, where said organic material remains in said depressions; (d) removing the exposed barrier metal from the surface of said semiconductors; and (e) removing the remaining organic material, thereby leaving said barrier metal on the surfaces of said source and said drain regions.
Claim 11
Dependent Claim
49 words
The self-aligning method of adding a barrier metal layer of claim 8 wherein step (b) comprises: (1) depositing a first layer of said organic material over the surface of said semiconductor; and (2) spinning said semiconductor to smooth out the depressions caused by said depressed source and drain regions.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-10-23 | 1988-04-23 | 1988-10-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-10-23 | 1992-04-23 | 1992-10-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-10-23 | 1996-04-23 | 1996-10-23 | $7700.00 | Window Closed / Lapsed |