Patent US4468282A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4468282A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making an electron beam window

Assignee: KEVEX Inc
•
Filing: 1982-11-22
•
Granted: 1984-08-28
•
Expires: 2002-11-22
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A method of making an electron permeable window is provided which entails depositing a thin film of an inert, high strength material or compound having a low atomic number onto a substrate by chemical vapor deposition (CVD). Following that deposition, a window pattern and window support perimeter are photolithographically defined and the substrate is etched to leave the desired window structure. For a particular class of materials including SiC, BN, B 4 C, Si 3 N 4 , and Al 4 C 3 , films are provided which are exceedingly tough and pinhole free, and which exhibit nearly zero internal stress. Furthermore, due to their extreme strength, these materials allow fabrication of extremely thin windows. In addition, because of their low atomic number and density, they have excellent electron penetration characteristics at low beam voltages (15 to 30 kV), so that most conventional CRT deflection schemes can be used to direct the beam. Also, such films are remarkably resilient and chemically inert even when very thin and can easily withstand large pressure differences.

Inventors

  • 👤 Armand P. Neukermans

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 20:04
CPC Classifications
H; H01; H01J; H01J5/00; H01J5/02; H01J5/18; H01J33/00; H01J33/02; H01J33/04; H01J9/00; H01J9/24; H01J9/244

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 129 words
A method of making a vacuum window which is permeable to electrons generated by an electron beam in a CRT assembly comprising the steps of: selecting a first material as a substrate; depositing onto said substrate by chemical vapor deposition a film of a second material which is permeable to electrons at the electron beam energic of interest, said film having an internal stress of less than 2×10 9 dynes/cm 2 ; removing a portion of said substrate to leave a continuous window of said film; attaching said substrate to the faceplate of said CRT assembly, said faceplate having a hole therein which is aligned with said continuous window; and evacuating said CRT assembly to provide a pressure differential of substantially one atmosphere or higher across said continuous window.
Claim 2
Independent Claim 129 words
A method of making a vacuum window which is permeable to electrons generated by an electron beam in a CRT assembly comprising the steps of: selecting a first material as a substrate; depositing onto said substrate by chemical vapor deposition a film of a second material which is permeable to electrons at the electron beam energic of interest, said film having an internal stress of less than 2×10 9 dynes/cm 2 ; removing a portion of said substrate to leave a continuous window of said film; attaching said substrate to the faceplate of said CRT assembly, said faceplate having a hole therein which is aligned with said continuous window; and evacuating said CRT assembly to provide a pressure differential of substantially one atmosphere or higher across said continuous window.
Claim 3
Dependent Claim 26 words
A method as in claim 1 wherein said portion of said substrate which is etched away has a length which is much greater than its width.
Claim 4
Dependent Claim 33 words
A method as in claim 1 wherein said second material is selected from the group consisting of SiC, BN, B 4 C, Si 3 N 4 , and Al 4 C 3 .
Claim 5
Dependent Claim 11 words
A method as in claim 3 wherein said material is SiC.
Claim 6
Dependent Claim 18 words
A method as in claim 3 wherein said film has a thickness between 0.5 microns and 5 microns.
Claim 7
Dependent Claim 17 words
A method as in claim 3 wherein said film has a thickness of greater than 1 micron.
Claim 8
Independent Claim 129 words
A method of making a vacuum window which is permeable to electrons generated by an electron beam in a CRT assembly comprising the steps of: selecting a first material as a substrate; depositing onto said substrate by chemical vapor deposition a film of a second material which is permeable to electrons at the electron beam energy of interest; attaching said substrate with said film thereon to the faceplate of said CRT assembly, said faceplate having a hole therein with said film located between said substrate and said faceplate and covering said hole; removing said substrate leaving said film attached to said faceplate to provide an electron window over said hole; evacuating said CRT assembly to provide a pressure differential of substantially one atmosphere or higher across said electron window.
Claim 9
Independent Claim 129 words
A method of making a vacuum window which is permeable to electrons generated by an electron beam in a CRT assembly comprising the steps of: selecting a first material as a substrate; depositing onto said substrate by chemical vapor deposition a film of a second material which is permeable to electrons at the electron beam energy of interest; attaching said substrate with said film thereon to the faceplate of said CRT assembly, said faceplate having a hole therein with said film located between said substrate and said faceplate and covering said hole; removing said substrate leaving said film attached to said faceplate to provide an electron window over said hole; evacuating said CRT assembly to provide a pressure differential of substantially one atmosphere or higher across said electron window.
Claim 10
Dependent Claim 23 words
A method as in claim 7 wherein said film is deposited with an internal stress of less than 2×10 9 dynes/cm 2 .

References Cited (Backward Citations)

US3607680A Cited
US3742230A Cited
US3971860A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-08-28 1988-02-27 1988-08-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-08-28 1992-02-27 1992-08-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-08-28 1996-02-27 1996-08-28 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag