US3607680A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Methof for producing a device for transmitting an electron beam
Assignee: Panasonic Holdings Corp
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Filing: 1968-09-24
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Granted: 1971-09-21
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Expires: 1988-09-24
Abstract
Abstract A device pervious to an electron beam having a partition through which the electron beam is led from one atmosphere to another. The partition is in the form of a thin film of an electron-beam pervious metal oxide such as alumina which has a high mechanical strength that can withstand the pressure difference between the two atmospheres.
Inventors
- 👤 Yoshihiro Uno
- 👤 Hidehiko Kawakami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 03:10
CPC Classifications
H; H01; H01J; H01J31/00; H01J31/02; H01J31/06; H01J31/065; G; G03; G03G; G03G15/00; G03G15/22; G03G15/32; G03G15/321; G03G9/00; H01J5/00; H01J5/02; H01J5/18
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
62 words
A method of making a device pervious to an electron beam as defined in claim 1, comprising the further step of forming a photoresist mask of a desired pattern before said chemical etching step, wherein said chemical etching is performed with an etching solution selected from the group consisting of hydrochloric acid, and a mixture of hydrochloric acid and ferric chloride solution.
Claim 2
Dependent Claim
54 words
A method of making a device pervious to an electron beam as defined in claim 1, comprising the further step of depositing a metal reinforcing member selected from the group consisting of iron, chromium and nickel on the end surface of said support in the direction opposite to said thin film by a electrodeposition.
Claim 3
Dependent Claim
65 words
A method of making a device pervious to an electron beam as defined in claim 1, comprising the further steps of: depositing a conductive film in the pattern of said support on said metal oxide layer; and electrodepositing a metal on said conductive film to form a further support on the surface of said oxide layer opposite to the support formed by said chemical etching.
Claim 4
Independent Claim
97 words
A method of making a device pervious to an electron beam having a unitary structure of an electron pervious thin film and a perforated support defining a plurality of holes therein comprising the steps of: first, oxidizing one side portion of a base metal sheet to form a layer of thin film metal oxide; depositing a conductive film on said metal oxide layer in a desired pattern of said support; electrodepositing a metal on said conductive film to a thickness necessary for forming said support; and removing an unoxidized portion of said metal sheet by chemical etching.
Claim 5
Dependent Claim
58 words
A method of making a device pervious to an electron beam as defined in claim 5, wherein said oxidizing step comprises anodic oxidation; said conductive film-depositing step comprises vacuum evaporation; and said chemical etching step comprises etching with a solution selected from the group consisting of hydrochloric acid, and a mixture of hydrochloric acid a ferric chloride solution.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-09-20 | 1975-03-22 | 1975-09-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-09-20 | 1979-03-22 | 1979-09-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-09-20 | 1983-03-22 | 1983-09-21 | $7700.00 | Window Closed / Lapsed |