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US4428783A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for the manufacture of vertical P-N junctions in the pulling of silicon from a silicon melt

Assignee: Heliotronic Forschungs- U Entwicklungsgesell Solarzellen-Grundst
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Filing: 1981-12-14
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Granted: 1984-01-31
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Expires: 2001-12-14
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Abstract

Abstract The invention makes it possible to manufacture silicon wafers having vertical p-n junctions as the basic material for solar cells. As a result of simultaneously adding certain dopants that act in the silicon crystal as donors and certain dopants that develop acceptor properties and also as a result of measures that result in a periodic change in the crystal growth from a low rate vn to a high rate vn, p- and n-conductive zones are produced in the silicon, each having a total length of from 5 to 2000 mu m.

Inventors

  • 👤 Cord Gessert

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 20:04
CPC Classifications
C; C30; C30B; C30B15/00; C30B15/20

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 184 words
In a process for the manufacture of p-n junctions in the pulling of silicon ribbons, polygons or tubes from a silicon melt, the improvement comprising: adding to the silicon melt both dopants that act as acceptors and dopants that act as donors, of which the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a high crystal growht rate v h and the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a low crystal growth rate v n satisfy the condition ##EQU9## wherein, generally, v h is a crystal growth rate higher than the mean pulling speed and v n is a crystal growth rate lower than the mean pulling speed; pulling silicon from the melt at a mean pulling speed of from 6 to 120 mm/min.; and periodically varying the crystal growth rate during the pulling operation between a low rate v n and a high rate v h so that the total length of each p- and n-conductive zone in the crystallized silicon is from 5 to 2000 μm.
Claim 2
Dependent Claim 184 words
In a process for the manufacture of p-n junctions in the pulling of silicon ribbons, polygons or tubes from a silicon melt, the improvement comprising: adding to the silicon melt both dopants that act as acceptors and dopants that act as donors, of which the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a high crystal growht rate v h and the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a low crystal growth rate v n satisfy the condition ##EQU9## wherein, generally, v h is a crystal growth rate higher than the mean pulling speed and v n is a crystal growth rate lower than the mean pulling speed; pulling silicon from the melt at a mean pulling speed of from 6 to 120 mm/min.; and periodically varying the crystal growth rate during the pulling operation between a low rate v n and a high rate v h so that the total length of each p- and n-conductive zone in the crystallized silicon is from 5 to 2000 μm.
Claim 3
Dependent Claim 33 words
The process according to claim 1, wherein said dopants comprise dopant pairs so selected as to allow a high average pulling speed with a small difference between v n and v h .
Claim 4
Dependent Claim 22 words
The process according to claim 1, wherein said dopant pairs are selected from the group consisting of boron/bismuth, indium/phosphorus, gallium/phosphorus and aluminum/arsenic.
Claim 5
Dependent Claim 39 words
The process according to claim 1, wherein said step of varying the crystal growth rate to effect a periodic change from a low growth rate v n to a high rate v h comprises periodically varying the pulling speed.
Claim 6
Dependent Claim 48 words
The process according to claim 1, wherein said step of varying the crystal growth rate to effect a periodic change from a low growth rate v n to a high rate v h comprises periodically varying the temperature of the melt in the region of the growth front.
Claim 7
Dependent Claim 54 words
The process according to claim 1, additionally including the step of arranging the total length l of each p- and n-conductive zone in the crystallized silicon so that it is so related to the diffusion length L d of the minority carriers in silicon for solar cells as to satisfy the condition 0.05L.sub.d <l<2L.sub.d.
Claim 8
Dependent Claim 43 words
The process according to claim 1, wherein the low crystal growth rate v n is at least 6 mm/min. below the said mean pulling speed and the high crystal growth rate v h is at least 6 mm/min. above said mean pulling speed.

References Cited (Backward Citations)

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US2822308A Cited
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US2879189A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-01-30 1987-08-01 1988-01-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-01-30 1991-08-01 1992-01-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-01-30 1995-08-01 1996-01-31 $7700.00 Window Closed / Lapsed

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