US4428783A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for the manufacture of vertical P-N junctions in the pulling of silicon from a silicon melt
Assignee: Heliotronic Forschungs- U Entwicklungsgesell Solarzellen-Grundst
•
Filing: 1981-12-14
•
Granted: 1984-01-31
•
Expires: 2001-12-14
Abstract
Abstract The invention makes it possible to manufacture silicon wafers having vertical p-n junctions as the basic material for solar cells. As a result of simultaneously adding certain dopants that act in the silicon crystal as donors and certain dopants that develop acceptor properties and also as a result of measures that result in a periodic change in the crystal growth from a low rate vn to a high rate vn, p- and n-conductive zones are produced in the silicon, each having a total length of from 5 to 2000 mu m.
Inventors
- 👤 Cord Gessert
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 20:04
CPC Classifications
C; C30; C30B; C30B15/00; C30B15/20
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
184 words
In a process for the manufacture of p-n junctions in the pulling of silicon ribbons, polygons or tubes from a silicon melt, the improvement comprising: adding to the silicon melt both dopants that act as acceptors and dopants that act as donors, of which the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a high crystal growht rate v h and the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a low crystal growth rate v n satisfy the condition ##EQU9## wherein, generally, v h is a crystal growth rate higher than the mean pulling speed and v n is a crystal growth rate lower than the mean pulling speed; pulling silicon from the melt at a mean pulling speed of from 6 to 120 mm/min.; and periodically varying the crystal growth rate during the pulling operation between a low rate v n and a high rate v h so that the total length of each p- and n-conductive zone in the crystallized silicon is from 5 to 2000 μm.
Claim 2
Dependent Claim
184 words
In a process for the manufacture of p-n junctions in the pulling of silicon ribbons, polygons or tubes from a silicon melt, the improvement comprising: adding to the silicon melt both dopants that act as acceptors and dopants that act as donors, of which the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a high crystal growht rate v h and the effective distribution coefficients k Aeff (v h ) and k Deff (v h ) at a low crystal growth rate v n satisfy the condition ##EQU9## wherein, generally, v h is a crystal growth rate higher than the mean pulling speed and v n is a crystal growth rate lower than the mean pulling speed; pulling silicon from the melt at a mean pulling speed of from 6 to 120 mm/min.; and periodically varying the crystal growth rate during the pulling operation between a low rate v n and a high rate v h so that the total length of each p- and n-conductive zone in the crystallized silicon is from 5 to 2000 μm.
Claim 3
Dependent Claim
33 words
The process according to claim 1, wherein said dopants comprise dopant pairs so selected as to allow a high average pulling speed with a small difference between v n and v h .
Claim 4
Dependent Claim
22 words
The process according to claim 1, wherein said dopant pairs are selected from the group consisting of boron/bismuth, indium/phosphorus, gallium/phosphorus and aluminum/arsenic.
Claim 5
Dependent Claim
39 words
The process according to claim 1, wherein said step of varying the crystal growth rate to effect a periodic change from a low growth rate v n to a high rate v h comprises periodically varying the pulling speed.
Claim 6
Dependent Claim
48 words
The process according to claim 1, wherein said step of varying the crystal growth rate to effect a periodic change from a low growth rate v n to a high rate v h comprises periodically varying the temperature of the melt in the region of the growth front.
Claim 7
Dependent Claim
54 words
The process according to claim 1, additionally including the step of arranging the total length l of each p- and n-conductive zone in the crystallized silicon so that it is so related to the diffusion length L d of the minority carriers in silicon for solar cells as to satisfy the condition 0.05L.sub.d <l<2L.sub.d.
Claim 8
Dependent Claim
43 words
The process according to claim 1, wherein the low crystal growth rate v n is at least 6 mm/min. below the said mean pulling speed and the high crystal growth rate v h is at least 6 mm/min. above said mean pulling speed.
References Cited (Backward Citations)
US2999776A
Cited
US2950219A
Cited
US2822308A
Cited
US2852420A
Cited
US2879189A
Cited
US2861905A
Cited
US3082130A
Cited
US3093520A
Cited
US3192082A
Cited
US3969746A
Cited
US4155781A
Cited
US4359487A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-01-30 | 1987-08-01 | 1988-01-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-01-30 | 1991-08-01 | 1992-01-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-01-30 | 1995-08-01 | 1996-01-31 | $7700.00 | Window Closed / Lapsed |