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US4394437A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for increasing resolution of photolithographic images

Assignee: International Business Machines Corp
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Filing: 1981-09-24
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Granted: 1983-07-19
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Expires: 2001-09-24
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Abstract

Abstract The present invention describes conformable masking techniques which can be successfully made and used in a practical manufacturing environment while providing increased resolution of photolithographic images while eliminating all manner of defects that might presently be encountered in the masks currently used in the semiconductor industry. In the present invention a body is first coated with a positive photoresist overcoated with a conformable mask which is exposed through a fixed mask and developed to define a replica of the fixed mask, together with all its defects. The underlying photoresist is then exposed to light through developed openings in the conformable mask. The conformable mask is then stripped and a new conformable mask laid down. This new conformable mask is now exposed through a second fixed mask having the same image as the first fixed mask, but presumably with different defects and developed to define a replica of the second mask. The underlying photoresist is again exposed through the second conformable mask and developed. As a result of using two independently defined conformable masks clear image defects in the fixed masks are prevented from being reproduced in the underlying photoresist and are not doubly exposed. Only desired regions in the underlying photoresist are doubly exposed.

Inventors

  • 👤 Albert S. Bergendahl
  • 👤 Mark C. Hakey
  • 👤 John P. Wilson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 14:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 276 words
A method of developing relief images in a first layer of photoresist comprising the steps of: applying a first layer of photoresist, sensitive to a selected wavelength of light, a selected solvent and a selected developer, to the surface of a substrate; applying a second layer of photoresist over said first layer; said second layer of photoresist being sensitive to a wavelength of light, a solvent and a developer different from said selected wavelength, solvent and developer to which said first layer of photoresist is sensitive, forming a first relief image in said second layer of photoresist by exposure through a fixed mask having an image thereon, partially exposing said first layer of photoresist using said second layer as a mask, removing said second layer of photoresist, applying a third layer of photoresist over said first layer, said third layer of photoresist being sensitive to a wavelength of light, a solvent and a developer different from said selected wavelength, solvent and developer to which said first layer of photoresist is sensitive, forming a second relief image in said third layer substantially identical to the first relief image formed in said second layer by exposure through a second mask having the same image as the said first mask but having different defects thereon, re-exposing said first layer of photoresist using said third layer as a mask to fully expose only those partially exposed portions of said first layer thereof corresponding to areas being exposed by said third layer; and developing a relief image in said first layer of photoresist, said relief image having openings extending to the surface of said substrate only in said fully exposed areas.
Claim 2
Independent Claim 276 words
A method of developing relief images in a first layer of photoresist comprising the steps of: applying a first layer of photoresist, sensitive to a selected wavelength of light, a selected solvent and a selected developer, to the surface of a substrate; applying a second layer of photoresist over said first layer; said second layer of photoresist being sensitive to a wavelength of light, a solvent and a developer different from said selected wavelength, solvent and developer to which said first layer of photoresist is sensitive, forming a first relief image in said second layer of photoresist by exposure through a fixed mask having an image thereon, partially exposing said first layer of photoresist using said second layer as a mask, removing said second layer of photoresist, applying a third layer of photoresist over said first layer, said third layer of photoresist being sensitive to a wavelength of light, a solvent and a developer different from said selected wavelength, solvent and developer to which said first layer of photoresist is sensitive, forming a second relief image in said third layer substantially identical to the first relief image formed in said second layer by exposure through a second mask having the same image as the said first mask but having different defects thereon, re-exposing said first layer of photoresist using said third layer as a mask to fully expose only those partially exposed portions of said first layer thereof corresponding to areas being exposed by said third layer; and developing a relief image in said first layer of photoresist, said relief image having openings extending to the surface of said substrate only in said fully exposed areas.
Claim 3
Dependent Claim 65 words
The method of claim 1 wherein; said first relief image has selected openings extending through said second layer of photoresist; said second relief image has selected openings extending through said third layer photoresist, and said second exposure of said first layer of photoresist using said third layer as a mask fully exposes only those partially exposed portions thereof corresponding to openings in said third mask.
Claim 4
Dependent Claim 31 words
The method of claim 2 wherein there is further provided the step of: removing said third layer of photoresist prior to the developing of said relief image in said first layer.
Claim 5
Independent Claim 379 words
A method of developing relief images in a first layer of photoresist comprising the steps of: applying a first layer of photoresist sensitive to a selected wavelength of light, a selected solvent and a selected developer to a substrate, applying a second layer of photoresist over said first layer; said second layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive, forming a relief image in said second layer having openings extending through said second layer of photoresist by exposure through a first fixed mask having a predetermined pattern thereon, partially exposing said first layer of photoresist through said second layer; removing said second layer of photoresist, applying a third layer of photoresist over said first layer said second layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive; forming a relief image in said third layer substantially identical to the first relief image formed in said second layer and having openings extending through said third layer of photoresist substantially overlying said partially exposed regions of said first layer of photoresist by exposure through a second fixed mask having the same pattern as said first fixed mask but having different defects thereon, re-exposing said first layer of photoresist to further expose only those partially exposed portions thereof corresponding to the openings in the second relief image; removing said third layer of photoresist; applying a fourth layer of photoresist over said first layer said fourth layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive; forming a third relief image in said fourth layer having openings extending through said fourth layer of photoresist through exposure to a third mask having the same pattern as said first and second fixed masks, but having different defects thereon, re-exposing said first layer of photoresist to further expose those exposed portions thereof corresponding to the openings in the third relief image; removing the fourth layer of photoresist, developing a relief image having openings extending through said first layer of photoresist, said openings being defined by said multiply exposed areas.
Claim 6
Independent Claim 379 words
A method of developing relief images in a first layer of photoresist comprising the steps of: applying a first layer of photoresist sensitive to a selected wavelength of light, a selected solvent and a selected developer to a substrate, applying a second layer of photoresist over said first layer; said second layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive, forming a relief image in said second layer having openings extending through said second layer of photoresist by exposure through a first fixed mask having a predetermined pattern thereon, partially exposing said first layer of photoresist through said second layer; removing said second layer of photoresist, applying a third layer of photoresist over said first layer said second layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive; forming a relief image in said third layer substantially identical to the first relief image formed in said second layer and having openings extending through said third layer of photoresist substantially overlying said partially exposed regions of said first layer of photoresist by exposure through a second fixed mask having the same pattern as said first fixed mask but having different defects thereon, re-exposing said first layer of photoresist to further expose only those partially exposed portions thereof corresponding to the openings in the second relief image; removing said third layer of photoresist; applying a fourth layer of photoresist over said first layer said fourth layer of photoresist being sensitive to a wavelength of light, solvent and developer different from that to which said first layer of photoresist is sensitive; forming a third relief image in said fourth layer having openings extending through said fourth layer of photoresist through exposure to a third mask having the same pattern as said first and second fixed masks, but having different defects thereon, re-exposing said first layer of photoresist to further expose those exposed portions thereof corresponding to the openings in the third relief image; removing the fourth layer of photoresist, developing a relief image having openings extending through said first layer of photoresist, said openings being defined by said multiply exposed areas.
Claim 7
Dependent Claim 18 words
The method of claim 3 wherein said second and third layers are substantially thinner than said first layer.
Claim 8
Dependent Claim 19 words
The method of claim 3 wherein said second relief image is substantially the same as said first relief image.
Claim 9
Dependent Claim 19 words
The method of claim 4 wherein said second, third and fourth layers are substantially thinner than said first layer.
Claim 10
Dependent Claim 53 words
The method of claim 5 wherein said first relief image is formed by exposing said second layer of photoresist through a first fixed mask and developing said second layer, and said second relief image is formed by exposing said third layer of photoresist through a second fixed mask and developing said third layer.
Claim 11
Dependent Claim 76 words
The method of claim 7 wherein said first relief image is formed by exposing said second layer of photoresist through a first fixed mask and developing said second layer, said second relief image is formed by exposing said third layer of photoresist through a second fixed mask and developing said third layer, and said third relief image is formed by exposing said fourth layer of photoresist through a third fixed mask and developing said fourth layer.

References Cited (Backward Citations)

US3317320A Cited
US3518084A Cited
US3506441A Cited
US3615466A Cited
US3615464A Cited
US3647445A Cited
GB1334377A Cited
US3823015A Cited
US3955981A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-07-18 1987-01-17 1987-07-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-07-18 1991-01-17 1991-07-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-07-18 1995-01-17 1995-07-19 $7700.00 Window Closed / Lapsed

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