MNOS Memory transistor
Abstract
Abstract A memory transistor includes a body of semiconductor material having therein a channel region of one conductivity type and source and drain regions of the opposite conductivity type. A channel insulation is on the surface of the semiconductor body and extends over the channel region. The channel insulation includes a first layer of silicon dioxide directly on the surface of the semiconductor body and a layer of silicon nitride on the silicon dioxide layer. A gate of conductive polycrystalline silicon is preferable provided on the channel insulation. The channel of the transistor is sufficiently narrow so that electrons can be avalanched into the interface between the silicon nitride layer and the silicon dioxide layer completely across the full width of the channel where the electrons can be stored.
Inventors
- 👤 Joseph C. Sokoloski
- 👤 Alfred C. Ipri
Bibliographic Details
Claims Analysis
Total Claims: 8References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-04-05 | 1985-10-05 | 1986-04-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-04-05 | 1989-10-05 | 1990-04-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-04-05 | 1993-10-05 | 1994-04-06 | $7700.00 | Window Closed / Lapsed |