US4288528A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making an embossed pattern on an information bearing substrate
Assignee: Thales SA
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Filing: 1979-06-11
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Granted: 1981-09-08
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Expires: 1999-06-11
Abstract
Abstract An improved process for forming an embossed pattern through the use of a writing concentrated beam opening holes in a film capable of undergoing residue free evaporation. A layer of photoresist is overlayed with the film and upon being exposed and processed the layer supplies the prospective embossed pattern.
Inventors
- 👤 Jean E. Picquendar
- 👤 Michel Marchal
- 👤 Jean C. Dubois
- 👤 Eugene Duda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 17:09
CPC Classifications
G; G11; G11B; G11B7/00; G11B7/24; G11B7/241; G11B7/242; G11B7/244; G11B7/245; G03; G03F; G03F7/00; G03F7/20; G03F7/2002; G03F7/2014; G03F7/2016; G03F7/202; G11B7/004; G11B7/0045; G11B7/00451; G11B7/243; G11B7/26; G11B7/252; G11B7/253; G11B7/2532; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
165 words
A process for optically recording video frequency signals as an embossed pattern on the flat surface of a disc forming a substrate comprising: (a) coating upon said flat surface a layer of photoresist material having a thickness at least equal to the depth of the resulting embossed pattern, the coated photoresist layer adhering to said flat surface; (b) depositing upon said layer a film of residue-free, evaporable material having a thickness sufficient for masking said layer against actinic radiation, said film adhering to said layer of photoresist material; (c) irradiating said film in situ along the prospective embossed areas of said pattern with a focussed writing beam from a coherent light source, said irradiation selectively evaporating said film from said area thereby opening holes in said film; (d) irradiating said layer of photoresist material in situ through the thus opened holes in said film with actinic radiation; (e) selectively dissolving said photoresist layer to remove the irradiated portions of said photoresist material facing said holes.
Claim 2
Dependent Claim
165 words
A process for optically recording video frequency signals as an embossed pattern on the flat surface of a disc forming a substrate comprising: (a) coating upon said flat surface a layer of photoresist material having a thickness at least equal to the depth of the resulting embossed pattern, the coated photoresist layer adhering to said flat surface; (b) depositing upon said layer a film of residue-free, evaporable material having a thickness sufficient for masking said layer against actinic radiation, said film adhering to said layer of photoresist material; (c) irradiating said film in situ along the prospective embossed areas of said pattern with a focussed writing beam from a coherent light source, said irradiation selectively evaporating said film from said area thereby opening holes in said film; (d) irradiating said layer of photoresist material in situ through the thus opened holes in said film with actinic radiation; (e) selectively dissolving said photoresist layer to remove the irradiated portions of said photoresist material facing said holes.
Claim 3
Dependent Claim
25 words
A process as claimed in claim 1, wherein the thickness of said film of step (b) is less than the depth of the embossed pattern.
Claim 4
Dependent Claim
17 words
A process as claimed in claim 1, wherein the film of step (b) is a metal film.
Claim 5
Dependent Claim
22 words
A process as claimed in claim 3, wherein the metal film is selected from the group consisting of bismuth, cadmium and zinc.
Claim 6
Dependent Claim
13 words
A process as claimed in claim 3, wherein said film is vacuum evaporated.
Claim 7
Dependent Claim
19 words
A process as claimed in claim 3, wherein the film of step (b) is a residue-free, depolymerizable polymer film.
Claim 8
Dependent Claim
25 words
A process as claimed in claim 4, wherein said polymer film includes a dye material capable of absorbing the energy of said concentrated writing beam.
Claim 9
Dependent Claim
22 words
A process as claimed in claim 1, wherein the thickness of said layer of photoresist material is substantially equal to said depth.
Claim 10
Dependent Claim
45 words
A process as claimed in claim 1, wherein said focussed writing beam is intensity modulated with an electrical modulating signal, the embossed pattern being a track followed by said focussed writing beam for successively opening said holes in the film layer deposited in step (b).
Claim 11
Dependent Claim
41 words
A process as claimed in claim 1, wherein said focussed writing beam is supplied from a source of radiant energy and focussing means are provided for projecting said focussed writing beam onto said film of evaporable material deposited in step (b).
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-09-07 | 1985-03-09 | 1985-09-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-09-07 | 1989-03-09 | 1989-09-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-09-07 | 1993-03-09 | 1993-09-08 | $7700.00 | Window Closed / Lapsed |