Method of defining a detailed pattern on a surface of a body
Abstract
Abstract A DETAILED PATTERN ON A PHOTOMASK IS DEFINED, IN REDUCED SIZE, ON A SURFACE OF A BODY BY A NOVEL PHOTOLITHOGRAPHIC PROCESS EMPLOYING TWO SUCCESSIVE FRESNEL DIFFRACTION PRINTINGS. THE SURFACE OF THE BODY IS PROVIDED WITH THREE LAYERS, A LOWER PHOTORESIST, A METAL, AND AN UPPER PHOTORESIST, RESPECTIVELY. THE UPPER PHOTORESIST IS EXPOSED WITH A FRESNEL DIFFRACTION PATTERN OF THE DETAILED PATTERN FOR A TIME TO ACTIVATE IT WITH ONLY THE GREATER INTENSITIES OF LIGHT OF THE FRESNEL DIFFRACTION PATTERN. THE DEVELOPED UPPER PHOTORESIST DEFINES THE DETAILED PATTERN, IN REDUCED SIZE, ON THE LAYER OF METAL. THE LOWER PHOTORESIST IS SIMILARLY EXPOSED ND ACTIVATED THROUGH AN ETCHED MASK OF THE LAYER OF METAL, AS DEFINED BY THE UPPER PHOTORESIST. WHEN DEVELOPED, THE LOWER PHOTORESIST DEFINES THE DETAILED PATTERN, STILL FURTHER REDUCED IN SIZE, ON THE SURFACE OF THE BODY.
Inventors
- 👤 F Sterzer
Bibliographic Details
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