Method of making printing masks with high energy beams
Abstract
Abstract A STENCIL MASK SUITABLE FOR PRINTING ELECTRONIC CIRCUITS AND THE LIKE IS MADE BY APPLYING A BEAM OF HIGH-ENERGY EMMISIONS SUCH AS AN ELECTRON BEAM OR A LASER BEAM TO AN ORIGINAL BLANK COMPRISING TWO LAYERS OF DIFFERENT VOLATILLZABILITY IN RESPONSE TO IMPRINGMENT BY THE BEAM. THE BEAM IS APPLIED TO THE LAYER WHICH IS MORE READILY VOLATILIZED TO FORM A GROOVE THERETHROUGH BOTTOMING AT THE INNER SURFACE OF THE SECOND LAYER. PERFORATIONS EXTENDING ENTIRELY THROUGH THE BLANK ARE PRODUCED WHERE DESIRED BY INCRESING THE BEAM ENERGY APPLIED TO SELECTED POINTS ALONG THE BOTTOM OF THE GROOVE. BECAUSE THE SECOND LAYER IS LESS READILY VOLATILIZED, UNCONTROLLED VARIATIONS IN THE DEPTHS OF THE GROOVES AND THE DANGER OF HAVING A GROOVE BREAK ENTIRELY THROUGH THE BLANK WHERE THIS IS NOT DESIRED ARE MINIMIZED.
Inventors
- 👤 Oliver A Short
Bibliographic Details
Claims Analysis
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