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US4279947A Expired / Lapsed US ⏱️ 0.0 years remaining

Deposition of silicon nitride

Assignee: Motorola Solutions Inc
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Filing: 1979-03-26
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Granted: 1981-07-21
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Expires: 1999-03-26
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Abstract

Abstract Silicon nitride is pyrolytically deposited by the reaction of a halosilane with ammonia in an evacuated system. The process is particularly useful in providing uniform layers of silicon nitride on silicon wafers to be used in the fabrication of semiconductor devices.

Inventors

  • 👤 Jon C. Goldman
  • 👤 Larry D. McMillan
  • 👤 James B. Price

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 18:34
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; C23C16/345

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 63 words
A method for the pyrolytic deposition of silicon nitride upon a plurality of substrates which comprises placing said plurality of substrates in a reactor tube with their broad faces perpendicular to the flow of a mixture of dichlorosilane and ammonia at a temperature of from about 650° C. to about 1000° C. in a vacuum of about 300 millitorr to about 10 Torr.
Claim 2
Independent Claim 63 words
A method for the pyrolytic deposition of silicon nitride upon a plurality of substrates which comprises placing said plurality of substrates in a reactor tube with their broad faces perpendicular to the flow of a mixture of dichlorosilane and ammonia at a temperature of from about 650° C. to about 1000° C. in a vacuum of about 300 millitorr to about 10 Torr.
Claim 3
Dependent Claim 17 words
The method of claim 1 where said temperature is from about 770° C. to about 780° C.
Claim 4
Dependent Claim 21 words
The method of claim 1 wherein the temperature is ramped up to about 100° C. along the direction of said flow.
Claim 5
Dependent Claim 23 words
The method of claim 1 wherein the temperature is ramped up from 10° C. to 50° C. along the direction of said flow.

References Cited (Backward Citations)

GB773702A Cited
US3798061A Cited
US3574014A Cited
US3537891A Cited
US3578495A Cited
US3652324A Cited
US3637423A Cited
US3922467A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-07-20 1985-01-19 1985-07-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-07-20 1989-01-19 1989-07-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-07-20 1993-01-19 1993-07-21 $7700.00 Window Closed / Lapsed

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