Patent US4570173A successfully refreshed from Google Patents.
Patent US4278493A successfully refreshed from Google Patents.
US4278493A
Expired / Lapsed
US
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Method for cleaning surfaces by ion milling
Assignee: International Business Machines Corp
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Filing: 1980-04-28
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Granted: 1981-07-14
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Expires: 2000-04-28
Abstract
Abstract A method for cleaning uneven substrate surfaces having channels, via holes or stepped surface topography. In accordance with the method, an electron beam device which generates a solid angle source of ions is provided. A substrate having an uneven surface topography is oriented in the path of the solid angle source of ion at a particular angle with reference to the center line of the ion beam source. While in the particular orientation with respect to the center line, the substrate is rotated about an axis normal to the plane of the substrate surface.
Inventors
- 👤 Steve I. Petvai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 12:42
CPC Classifications
C; C23; C23G; C23G5/00; B; B08; B08B; B08B7/00; B08B7/0035
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
79 words
A method for cleaning a substrate having an uneven topographical surface comprising providing an electron beam having a solid angle source of ions with a center line, exposing a planar substrate having an uneven top surface to said solid angle ion beam path, said substrate being located at a predetermined angle with respect to said center line of said ion beam, and continuously revolving said substrate about an axis normal to the plane of said substrate during said exposure.
Claim 2
Independent Claim
79 words
A method for cleaning a substrate having an uneven topographical surface comprising providing an electron beam having a solid angle source of ions with a center line, exposing a planar substrate having an uneven top surface to said solid angle ion beam path, said substrate being located at a predetermined angle with respect to said center line of said ion beam, and continuously revolving said substrate about an axis normal to the plane of said substrate during said exposure.
Claim 3
Dependent Claim
49 words
A method in accordance with claim 1 wherein said predetermined location of said substrate being such that a line normal to the surface of said substrate is at an angle of from about 30 to about 60 degrees to said center line of said solid angle source of ions.
Claim 4
Dependent Claim
23 words
A method in accordance with claim 1 wherein said substrate is revolved at a speed of from about 5 to about 15 RPM.
Claim 5
Independent Claim
93 words
A method in accordance with claims 1, 2, or 3 wherein said predetermined location is attained by moving said substrate from a first position where the plane of said substrate is parallel to said center line and displaced from said center line to a second position where the plane of said substrate is again parallel and displaced from said center line, said movement being effected in a manner so that said substrate surface is exposed to said ion beam at said predetermined angle with respect to said center line of said ion beam.
Claim 6
Dependent Claim
24 words
A method in accordance with claim 4 wherein said movement takes place during a period of from about 30 seconds to about 5 minutes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-07-13 | 1985-01-12 | 1985-07-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-07-13 | 1989-01-12 | 1989-07-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-07-13 | 1993-01-12 | 1993-07-14 | $7700.00 | Window Closed / Lapsed |