Photosensitive O-quinone diazide containing composition

Claim 1

A resin composition suitable for use as a photoresist, wherein solubility in an organic developing solvent varies with light exposure, an exposed portion remaining after development, consisting of an admixture comprising as an ingredient an organic resin obtained by homopolymerization of vinylically unsaturated monomers containing a basic amino group --NRR' which is no less basic than pyridyl or by copolymerization of said vinylically unsaturated monomers containing a basic amino group --NRR' no less basic than pyridyl with one or more ethylenically unsaturated monomers; wherein R is C 1-12 alkyl, C 6-11 phenyl, C 7-14 aralyl; C 3-6 cycloalkyl or C 6-12 cycloalkylalkyl having a cycloalkyl group of 3 to 6 carbon atoms and R' is independently any group defined by R; or wherein NRR' is pyridyl or a nonaromatic heteromonocycle composed of 3 to 10 nuclear atoms including no more than two heteroatoms selected from N,O and S of which at least one is N; wherein the nitrogen content of said NRR' group in said organic polymer is 0.01% to 10% by weight on the basis of the weight of said polymer; and as an additional ingredient one part by weight of a photosensitive orthoquinone diazide per 5 to 500 parts of said organic polymer.