US4259433A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for producing disk-recording plates
Assignee: Fujifilm Holdings Corp
•
Filing: 1979-04-24
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Granted: 1981-03-31
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Expires: 1999-04-24
Abstract
Abstract A disk-recording plate is produced by successively forming an etching layer and a laser-sensitive layer on a substrate. The assembly is exposed to the irradiation of laser beams to selectively remove the laser-sensitive layer and is then subjected to a sputter-etching treatment in an atmosphere of a reactive gas to remove the etching layer at portions corresponding to the removed portions of the laser-sensitive layer. The method permits monitoring of recording, and thus ensures accurate recording with good resolution.
Inventors
- 👤 Yuzo Mizobuchi
- 👤 Masamichi Sato
- 👤 Tsunehiko Takahashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 02:04
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/18; G02B5/1876; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; G11; G11B; G11B23/00; G11B23/0057; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
173 words
A method for producing a disc-recording plate from a composite layer consisting of a substrate, an etching layer having a thickness of 1000 to 1500 A overlying said substrate and a laser-sensitive layer having a thickness of 200 to 500 A overlying said etching layer, wherein the said laser-sensitive layer is composed of a material selected from the group consisting of Au, Cu, Cr, Ni, Co, Pt, Pd, Ir, Rh and stainless steel, and wherein the etching layer is easily etched by a reactive sputter-etching treatment in an inert atmosphere of a halogenated hydrocarbon and the laser-sensitive layer has a resistance to the reactive sputter etching in said atmosphere of halogenated hydrocarbon, said method comprising: exposing the assembly to the irradiation of laser beams to selectively remove the laser-sensitive layer, and then subjecting the assembly to the reactive sputter-etching treatment in the atmosphere of the halogenated hydrocarbon under a pressure of 10 -3 to 10 -1 Torr to remove the etching layer at portions corresponding to the removed portions of the laser-sensitive layer.
Claim 2
Independent Claim
173 words
A method for producing a disc-recording plate from a composite layer consisting of a substrate, an etching layer having a thickness of 1000 to 1500 A overlying said substrate and a laser-sensitive layer having a thickness of 200 to 500 A overlying said etching layer, wherein the said laser-sensitive layer is composed of a material selected from the group consisting of Au, Cu, Cr, Ni, Co, Pt, Pd, Ir, Rh and stainless steel, and wherein the etching layer is easily etched by a reactive sputter-etching treatment in an inert atmosphere of a halogenated hydrocarbon and the laser-sensitive layer has a resistance to the reactive sputter etching in said atmosphere of halogenated hydrocarbon, said method comprising: exposing the assembly to the irradiation of laser beams to selectively remove the laser-sensitive layer, and then subjecting the assembly to the reactive sputter-etching treatment in the atmosphere of the halogenated hydrocarbon under a pressure of 10 -3 to 10 -1 Torr to remove the etching layer at portions corresponding to the removed portions of the laser-sensitive layer.
Claim 3
Dependent Claim
16 words
The method of claim 1 wherein the halogenated hydrocarbon is a Freon gas or carbon tetrachloride.
Claim 4
Dependent Claim
19 words
The method of claim 1 wherein the pressure of the gaseous atmosphere is 5×10 -3 to 5×10 -2 Torr.
Claim 5
Dependent Claim
21 words
The method of claim 1 wherein the step of forming the etching layer and the laser-sensitive layer is performed by vacuum-deposition.
Claim 6
Dependent Claim
23 words
The method of claim 1 wherein the step of forming the etching layer and the laser-sensitive layer is performed by electron beam deposition.
Claim 7
Dependent Claim
19 words
The method of claim 1 wherein the substrate is selected from the group consisting of glass, metal and plastics.
Claim 8
Dependent Claim
12 words
The method of claim 1 wherein the substrate is optically polished glass.
Claim 9
Dependent Claim
33 words
The method of claim 1 wherein the etching layer is composed of a material selected from the group consisting of Si, SiO 2 , Si 3 N 4 , Al, Mo and GaAs.
Claim 10
Dependent Claim
24 words
The method of claim 1 wherein the laser-sensitive layer is composed of an element selected from the group consisting of Au, Cu and Cr.
Claim 11
Dependent Claim
26 words
The method of claim 1 wherein the total thickness of the etching layer and the laser-sensitive layer after the sputter-etching treatment is 1200 to 1600 A.
Claim 12
Dependent Claim
21 words
The method of claim 10 wherein the total thickness is attained by physically etching the laser-sensitive layer after the sputter-etching treatment.
Claim 13
Dependent Claim
23 words
The method of claim 11 wherein the physical etching is performed by sputtering in an atmosphere of Ar 2 or N 2 .
Claim 14
Dependent Claim
22 words
The method of claim 10 wherein the total thickness is attained by chemically etching the laser sensitive layer after the sputter-etching treatment.
Claim 15
Dependent Claim
32 words
The method of claim 13 wherein the chemical etching is performed by using a 20-60% solution of ferric chloride, or a mixed solution of ammonium persulfate and mercuric chloride as an etchant.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-03-30 | 1984-09-29 | 1985-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-03-30 | 1988-09-29 | 1989-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-03-30 | 1992-09-29 | 1993-03-31 | $7700.00 | Window Closed / Lapsed |