US4199649A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Amorphous monomolecular surface coatings
Assignee: Saint Gobain Performance Plastics Corp
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Filing: 1978-04-12
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Granted: 1980-04-22
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Expires: 1998-04-12
Abstract
Abstract The self-aligning characteristics of surface-active molecules are used to provide a multiply-coupled thin film surface coating on a substrate, comprising an outermost layer of normally fluid, flexible backbone chain polymer units of at least about 30 atoms in length, the ends of which are attached by chemical bonds to a relatively highly polar second layer of atoms serving to anchor the relatively fluid outer surface layer polymer chains to the surface of the substrate.
Inventors
- 👤 Albert P. Yundt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 14:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/11; G03C; G03C11/00; G03C11/06; G03F1/00; G03F1/38; G03F1/48; G03F7/075; G03F7/0757; Y; Y10; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31551; Y10T428/31609; Y10T428/31612; Y10T428/31645; Y10T428/31652; Y10T428/31663; Y10T428/31667
Claims Analysis
Total Claims: 28
Claim 1
Independent Claim
150 words
In a method for providing a photoresist pattern on a semiconductor wafer substrate in which a mask surface is passed into intimate contact with the outer surface of a photoresist layer covering a semiconductor wafer substrate, the mask is exposed to actinic radiation for the selective irradiation of the photoresist layer covering the semiconductor substrate and the mask is removed from contact with the photoresist covered semiconductor substrate surface to provide a selectively soluble photoresist pattern on the wafer substrate, the improvement comprising providing for improved separation of the mask surface by coating at least one of said surfaces, with an abhesive, monomolecularly thin, substantially amorphous loop-bonded film, said loop-bonded abhesive film being formed of polymer chains each attached at the same one of said surfaces by bonding groups at the respective ends of said chains to form surface-bound, non-crystalline loops having a length of at least about 60 Angstroms.
Claim 2
Dependent Claim
150 words
In a method for providing a photoresist pattern on a semiconductor wafer substrate in which a mask surface is passed into intimate contact with the outer surface of a photoresist layer covering a semiconductor wafer substrate, the mask is exposed to actinic radiation for the selective irradiation of the photoresist layer covering the semiconductor substrate and the mask is removed from contact with the photoresist covered semiconductor substrate surface to provide a selectively soluble photoresist pattern on the wafer substrate, the improvement comprising providing for improved separation of the mask surface by coating at least one of said surfaces, with an abhesive, monomolecularly thin, substantially amorphous loop-bonded film, said loop-bonded abhesive film being formed of polymer chains each attached at the same one of said surfaces by bonding groups at the respective ends of said chains to form surface-bound, non-crystalline loops having a length of at least about 60 Angstroms.
Claim 3
Dependent Claim
40 words
A method in accordance with claim 1 wherein said loop-bonded amorphous film is provided on said mask surface and wherein said polymer chains forming said film are loop-bonded siloxane polymer chains having a length of at least about 100 A.
Claim 4
Independent Claim
141 words
A method for providing a substantially amorphous, non-crystalline, momomolecularly thin film coating on a suitable substrate, comprising the steps of providing a solution comprising flexible backbone polymer chain units having a length of at least about 60 Angstroms, said chain units having polar chemical bonding groups chemically bonded to the ends of said chain units said polar bonding groups being adapted for bonding attachment of said polymer chain ends to said substrate, and a solvent for said polymer chain units, and contacting said substrate with said solution to orient said polar bonding groups at the ends of said polymer chain units to the surface of said substrate in contact with said solution, and to bond the ends of said chains to said substrate to produce a randomly oriented, substantially momomolecularly thin loop structure of said chains in attachment at said surface.
Claim 5
Independent Claim
141 words
A method for providing a substantially amorphous, non-crystalline, momomolecularly thin film coating on a suitable substrate, comprising the steps of providing a solution comprising flexible backbone polymer chain units having a length of at least about 60 Angstroms, said chain units having polar chemical bonding groups chemically bonded to the ends of said chain units said polar bonding groups being adapted for bonding attachment of said polymer chain ends to said substrate, and a solvent for said polymer chain units, and contacting said substrate with said solution to orient said polar bonding groups at the ends of said polymer chain units to the surface of said substrate in contact with said solution, and to bond the ends of said chains to said substrate to produce a randomly oriented, substantially momomolecularly thin loop structure of said chains in attachment at said surface.
Claim 6
Dependent Claim
34 words
A method in accordance with claim 3 wherein said solution has a weight ratio of said solvent to said end bonding polymer chain units in the range of from about 200 to about 2000.
Claim 7
Dependent Claim
93 words
A photomask for use in integrated circuit manufacture comprising a photoplate substrate having a mask pattern thereon, and a substantially amorphous, monomolecularly thin abhesive loop-bonded film on at least the surface of said mask substrate adapted to be placed in contact with a photoresist coated semiconductor wafer during integrated circuit manufacture, said loop-bonded film being formed of normally fluid, flexible polymer chains bonded at their chain ends to said surface to form surface bound noncrystalline loops of said chains projecting from said surface and having a length of at least about 60 A.
Claim 8
Dependent Claim
93 words
A photomask for use in integrated circuit manufacture comprising a photoplate substrate having a mask pattern thereon, and a substantially amorphous, monomolecularly thin abhesive loop-bonded film on at least the surface of said mask substrate adapted to be placed in contact with a photoresist coated semiconductor wafer during integrated circuit manufacture, said loop-bonded film being formed of normally fluid, flexible polymer chains bonded at their chain ends to said surface to form surface bound noncrystalline loops of said chains projecting from said surface and having a length of at least about 60 A.
Claim 9
Dependent Claim
40 words
A photomask in accordance with claim 5 wherein said polymer chains which form said surface-bound loops of the loop-bonded coating are normally fluid poly siloxane chains having a length in the range of from about 100 to about 800 A.
Claim 10
Dependent Claim
79 words
A coated substrate having modified surface properties comprising a substrate, and an amorphous, substantially monomolecularly thin, non-crystalline loop-bonded layer on said substrate, said amorphous, monomolecularly thin loop-bonded layer being formed of normally fluid flexible polymer chains each having a plurality of chain ends bonded to the substrate surface by means of bonding groups chemically bonded to said chain ends to provide surface-bonded polymer chain loops projecting from said surface and having a length of at least about 60 A.
Claim 11
Dependent Claim
79 words
A coated substrate having modified surface properties comprising a substrate, and an amorphous, substantially monomolecularly thin, non-crystalline loop-bonded layer on said substrate, said amorphous, monomolecularly thin loop-bonded layer being formed of normally fluid flexible polymer chains each having a plurality of chain ends bonded to the substrate surface by means of bonding groups chemically bonded to said chain ends to provide surface-bonded polymer chain loops projecting from said surface and having a length of at least about 60 A.
Claim 12
Dependent Claim
60 words
A coated substrate in accordance with claim 7 wherein said ends of said normally fluid flexible polymer chains are chemically bonded to said substrate by means of siloxane linkages to polar bonding groups chemically bonded to the ends of said chains, and wherein said chain loops have a length in the range of from about 100 to about 800 A.
Claim 13
Dependent Claim
33 words
A coated substrate in accordance with claim 8 wherein said normally fluid flexible polymer chains are selected from the group consisting of polypropylene chains, poly(ethylene oxide) chains, poly(siloxane) chains, and poly(propylene oxide) chains.
Claim 14
Dependent Claim
57 words
A coated substrate in accordance with claim 8 wherein said ends of said chains are bonded to said substrate by means of polar bonding groups chemically bonded to said chain ends, said polar bonding groups being selected from the group consisting of epoxy bonding groups, isocyanate bonding groups, polar silanol bonding groups and silanol precursor bonding groups.
Claim 15
Dependent Claim
36 words
A coated substrate in accordance with claim 8 wherein said layer is provided in a predetermined pattern on said substrate whereby the surface properties of said substrate are substantially modified at the location of said pattern.
Claim 16
Dependent Claim
15 words
A coated substrate in accordance with claim 8 having a low coefficient of static friction.
Claim 17
Dependent Claim
75 words
The coated substrate of claim 7 wherein each normally fluid polymer chain is terminated at each end by a relatively highly polar bonding group having five or more atoms, chemically bonded to said polymer chain end, said groups in the aggregate forming an intemediary layer of atoms chemically bonded to said substrate and to said chain ends, and serving to anchor said ends of said looped normally fluid polymer chains to the supporting substrate surface.
Claim 18
Dependent Claim
19 words
The coated substrate of claim 13 wherein said relatively highly polar groups are also chemically bonded to one another.
Claim 19
Dependent Claim
62 words
The coated substrate of claim 13 wherein said loop-bonded amorphous layer is a film provided by the self-aligning characteristics of said flexible backbone chain polymer units averaging thirty or more atoms in length and bearing said relatively more polar groups of five or more atoms chemically affixed to each end of said normally fluid polymer chains, at the surface of said substrate.
Claim 20
Dependent Claim
55 words
The coated substrate of claim 15 wherein said relatively polar end groups are bonded to said substrate surface, leaving said normally fluid chain polymer chains otherwise unbonded to said substrate surface and outwardly disposed in the form of randomly oriented loops having a length in the range of from about 200 to about 800 A.
Claim 21
Dependent Claim
21 words
The coated substrate of claim 13 further including a catalyst for chemically bonding said highly polar end groups to said substrate.
Claim 22
Dependent Claim
49 words
The coated substrate of claim 13 wherein said normally fluid polymer chains are silicone polymer chains and said relatively highly polar groups chemically attached to each end of said silicone polymer chain are monomeric to oligomeric derivatives of siloxane reactive at, and chemically bondable to the supporting substrate surface.
Claim 23
Dependent Claim
25 words
The layer coated substrate of claim 15 wherein said layer is selectively confined to desired patterned portions of the total surface area of the substrate.
Claim 24
Dependent Claim
87 words
A semiconductor substrate for use in integrated circuit manufacture comprising a semiconductor wafer, a photoresist coating on said wafer, and a substantially amorphous, monomolecularly thin film of loop-bonded polymer chains having a length of at least about 60 Angstroms on the surface of said photoresist coating to be placed in contact with a photomask for selective irradiation of said photoresist coating during integrated circuit manufacture said loop bonded chains forming non-crystalline loops projecting from said surface having a length of from about 60 to about 800 A.
Claim 25
Dependent Claim
87 words
A semiconductor substrate for use in integrated circuit manufacture comprising a semiconductor wafer, a photoresist coating on said wafer, and a substantially amorphous, monomolecularly thin film of loop-bonded polymer chains having a length of at least about 60 Angstroms on the surface of said photoresist coating to be placed in contact with a photomask for selective irradiation of said photoresist coating during integrated circuit manufacture said loop bonded chains forming non-crystalline loops projecting from said surface having a length of from about 60 to about 800 A.
Claim 26
Dependent Claim
116 words
A coated substrate having surface properties substantially modified by an amorphous, monomolecularly thin surface coating comprising a supporting substrate and a surface coating on said substrate in the form of a substantially monomolecularly thin amorphous loop-bonded film comprising a first outermost layer of normally fluid flexible backbone chain polymer units averaging at least thirty atoms in length and arranged in the form of loops with their respective ends chemically bonded to relatively polar groupings of five or more atoms at each free end of each of said chain polymer units and forming a second layer of said surface coating immediately adjacent the surface of said supporting substrate and intermediate said substrate and said first outermost layer.
Claim 27
Dependent Claim
116 words
A coated substrate having surface properties substantially modified by an amorphous, monomolecularly thin surface coating comprising a supporting substrate and a surface coating on said substrate in the form of a substantially monomolecularly thin amorphous loop-bonded film comprising a first outermost layer of normally fluid flexible backbone chain polymer units averaging at least thirty atoms in length and arranged in the form of loops with their respective ends chemically bonded to relatively polar groupings of five or more atoms at each free end of each of said chain polymer units and forming a second layer of said surface coating immediately adjacent the surface of said supporting substrate and intermediate said substrate and said first outermost layer.
Claim 28
Dependent Claim
20 words
The coated substrate of claim 21 wherein said second layer is chemically bonded to the surface of the supporting substrate.
References Cited (Backward Citations)
US3115424A
Cited
US3455736A
Cited
US3628996A
Cited
US3896254A
Cited
US4001870A
Cited
US3942982A
Cited
US3916035A
Cited
US3873499A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-04-22 | 1983-10-22 | 1984-04-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-04-22 | 1987-10-22 | 1988-04-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-04-22 | 1991-10-22 | 1992-04-22 | $7700.00 | Window Closed / Lapsed |