US3942982A
Expired / Lapsed
US
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Method for controlling the degree of side-etch in thin oxide films by photo-etching process
Assignee: Hitachi Ltd
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Filing: 1974-05-06
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Granted: 1976-03-09
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Expires: 1994-05-06
Abstract
Abstract In selectively etching a solid oxide thin film which has chemisorbed water (surface hydroxyl groups) in its surface, the thin film is surface-treated with an organic compound which has within its molecule a functional group to react with the surface hydroxyl groups. Thereafter, photo-etching is performed by the conventional method by applying a thin film of a photosensitive organic polymer onto the treated thin film. Through selection of the sort of the organic compound, the degree of side-etch arising in the process of the selective etch can be controlled.
Inventors
- 👤 Hiroshi Yanazawa
- 👤 Norikazu Hashimoto
- 👤 Mikio Ashikawa
- 👤 Kikuo Douta
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 05:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/11; G03F7/085; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
139 words
A photo-etching method comprising effecting reactor between an organic composition consisting essentialy of an organic compound selected from the group consisting of alcohols, phenols and phenol derivatives and the surface of a solid oxide thin film having chemisorbed hydroxy groups on said surface, at a temperature above the boiling point of said organic compound and at a pressure above atmospheric pressure in an autoclave, the temperature and pressure in said autoclave being sufficient so that said organic compound reacts with said chemisorbed hydroxyl groups, applying a film of a photosensitive organic polymer onto the solid oxide thin film, irradiating a predetermined area of the photosensitive organic polymer film by light, removing a portion of the polymer film by dissolution to form a mask having a predetermined pattern, and selectively etching said solid oxide film by means of said mask.
Claim 2
Dependent Claim
139 words
A photo-etching method comprising effecting reactor between an organic composition consisting essentialy of an organic compound selected from the group consisting of alcohols, phenols and phenol derivatives and the surface of a solid oxide thin film having chemisorbed hydroxy groups on said surface, at a temperature above the boiling point of said organic compound and at a pressure above atmospheric pressure in an autoclave, the temperature and pressure in said autoclave being sufficient so that said organic compound reacts with said chemisorbed hydroxyl groups, applying a film of a photosensitive organic polymer onto the solid oxide thin film, irradiating a predetermined area of the photosensitive organic polymer film by light, removing a portion of the polymer film by dissolution to form a mask having a predetermined pattern, and selectively etching said solid oxide film by means of said mask.
Claim 3
Dependent Claim
25 words
The photo-etching method according to claim 1, wherein said organic compound is selected from the group consisting of methanol, ethanol, n-propanol, n-butanol, n-pentanol and n-decanol.
Claim 4
Dependent Claim
15 words
The photo-etching method according to claim 1, wherein said organic compound is a polyfunctional alcohol.
Claim 5
Dependent Claim
27 words
The photo-etching method according to claim 1, wherein said phenol derivative is selected from the group consisting of an aliphatic-derivative, an aromatic-derivative, an amino-derivative and a halogen-derivative.
Claim 6
Dependent Claim
24 words
The photo-ething method of claim 1, wherein the alcohols are selected from the group consisting of unsaturated alcohols, aromatic alcohols, halogenoalcohols, aminoalcohols, and nitroalcohols.
Claim 7
Dependent Claim
25 words
The photo-etching method of claim 1, wherein said organic compound is selected from the group consisting of phenol, cresol, anol, thymol, hydroxydiphenyl, aminophenol and chlorophenol.
Claim 8
Dependent Claim
29 words
The photo-etching method of claim 1, wherein said organic compound is a mixture of at least two members selected from the group consisting of alcohols, phenols, and phenol derivatives.
Claim 9
Dependent Claim
14 words
The photo-etching method of claim 1, wherein said organic compound is a normal alcohol.
Claim 10
Dependent Claim
17 words
The photo-etching method of claim 1, wherein said organic composition contains a solvent for said organic compound.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-03-09 | 1979-09-08 | 1980-03-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-03-09 | 1983-09-08 | 1984-03-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-03-09 | 1987-09-08 | 1988-03-09 | $7700.00 | Window Closed / Lapsed |