Patent US4133702A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4133702A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of producing structured layers on a substrate being irradiated with two coherent particle beams

Assignee: Siemens AG
•
Filing: 1977-08-11
•
Granted: 1979-01-09
•
Expires: 1997-08-11
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A monocrystalline layer having select structures therein is deposited on a substrate surface from a gas phase or via a molecular beam while the substrate surface is being irradiated with two coherent particle beams superimposed in relation to one another. The coherent particle beams are comprised of particles having an energy of about 10 keV and the substrate is positioned relative to the particle beams so that a maxima of an interference pattern formed by such particle beams is located on the substrate surface.

Inventors

  • 👤 Eberhard Krimmel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 18:48
CPC Classifications
C; C30; C30B; C30B23/00; C30B23/02; C30B23/04; C30B23/08; Y; Y10; Y10S; Y10S438/00; Y10S438/914; Y10S438/925

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 84 words
A method of producing a structured monocrystalline layer on a substrate comprising: vapor-depositing a material onto a substrate surface from a source of said material; substantially simultaneously irradiating said substrate surface with at least two coherent particle beams superposed in relation to one another, each beam having particles with an energy of more than about 10 keV; and arranging said substrate surface in such a manner that the maxima of an interference pattern formed by said particle beams are located on said substrate surface.
Claim 2
Independent Claim 84 words
A method of producing a structured monocrystalline layer on a substrate comprising: vapor-depositing a material onto a substrate surface from a source of said material; substantially simultaneously irradiating said substrate surface with at least two coherent particle beams superposed in relation to one another, each beam having particles with an energy of more than about 10 keV; and arranging said substrate surface in such a manner that the maxima of an interference pattern formed by said particle beams are located on said substrate surface.
Claim 3
Dependent Claim 15 words
A method as defined in claim 1 wherein said coherent particle beams are ion beams.
Claim 4
Dependent Claim 25 words
A method as defined in claim 1 wherein said coherent particle beams are composed of particles of the material being vapor-deposited on the substrate surface.
Claim 5
Dependent Claim 43 words
A method as defined in claim 1 wherein an electrical field is maintained during the vapor-deposition of said material onto the substrate surface, said field having at least one component located in a plane containing the substrate surface on which deposition takes place.
Claim 6
Dependent Claim 16 words
A method as defined in claim 1 wherein said substrate is composed of an amorphous material.
Claim 7
Dependent Claim 16 words
A method as defined in claim 1 wherein said substrate is composed of a monocrystalline material.
Claim 8
Dependent Claim 23 words
A method as defined in claim 1 wherein an electron beam vaporization source is utilized as the source of the material being vapor-deposited.
Claim 9
Dependent Claim 27 words
A method as defined in claim 1 wherein said coherent particle beams contain particles which have a dopant effect in the material of the layer being vapor-deposited.
Claim 10
Dependent Claim 19 words
A method as defined in claim 2 wherein said coherent ion beams are produced via an electrostatic filament biprism.
Claim 11
Dependent Claim 23 words
A method as defined in claim 7 wherein said electron beam vapor source is utilized as the source of said coherent particle beams.

References Cited (Backward Citations)

US3520741A Cited
US3582958A Cited
US3619608A Cited
US3709741A Cited
US3833814A Cited
US3999072A Cited
US4035655A Cited
US3924136A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-01-08 1982-07-10 1983-01-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-01-08 1986-07-10 1987-01-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-01-08 1990-07-10 1991-01-09 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag