US3709741A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Impurity patterns produced by ion implantation
Assignee: AT&T Inc
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Filing: 1970-09-09
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Granted: 1973-01-09
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Expires: 1990-09-09
Abstract
Abstract Stripe or spot patterns of impurities or dopants on a very fine scale are produced in solid surfaces by high energy ion bombardment through at least one thin screening crystal. The ions are channeled through the screening crystal and interact with the next crystal to produce a moire pattern of the bombarding ions at the surface of a substrate. The substrate can be the second crystal or a third solid body intercepting the beam emerging from a thin second crystal.
Inventors
- 👤 W Gibson
- 👤 A Hutson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 07:13
CPC Classifications
H; H10; H10P; H10P95/00; H10P30/00; H10P30/20; Y; Y10; Y10S; Y10S148/00; Y10S148/106
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
207 words
Method for the introduction of elemental ions into a substrate, comprising the high energy implantation of the said ions into the said substrate characterized in that before reaching the said substrate the said ions pass consecutively through two masking crystals the first of which said masking crystals possesses a first set of channeling planes whose interplanar spacing is within 5 percent of the interplanar spacing of a second set of channeling planes possessed by the second of wherein a portion of said ions is randomly scattered forming a random beam and a portion of said ion is channeled forming a channeled beam, channeled beam and the second of which masking crystal is separated from the said substrate and from the first of the said masking crystals by a spacing less than S, where S is determined by the formula S 5d/20cwhere the said theta c is an angle of less than 5* given by the formula theta c (V( Rho )/E) which two said masking crystals are fixed relative to one another such that their respective said channeling directions are within an angle of plus or minus theta c of one another, whereby a moire pattern of the said implanted ions is produced in the said substrate.
References Cited (Backward Citations)
US3326176A
Cited
US3551213A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-01-09 | 1976-07-10 | 1977-01-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-01-09 | 1980-07-10 | 1981-01-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-01-09 | 1984-07-10 | 1985-01-09 | $7700.00 | Window Closed / Lapsed |