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US4057661A
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Method of manufacturing a thin-film electrode
Assignee: Rheinmetall Air Defence AG
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Filing: 1976-06-28
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Granted: 1977-11-08
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Expires: 1996-06-28
Abstract
Abstract A method of manufacturing a thin-film electrode constituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising: a first step of depositing a thin-film layer on said surface and, in succession a second step of depositing an additional thin-film layer on top of the previously deposited thin-film layer, said second depositing step being carried out at least once, and the last one of the depositing steps being carried out in a vacuum chamber under reduced pressure of a residual gas.
Inventors
- 👤 Harry Zust
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 20:17
CPC Classifications
H; H01; H01M; H01M4/00; H01M4/02; H01M4/04; H01M4/0402; C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/16; G; G01; G01C; G01C9/00; G01C9/18; G01C9/24; H01M4/0421; H01M4/0423; H01M4/0426; H01M4/0438; H01M4/045; H01M6/00
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
106 words
A method of manufacturing a thin-film electrode consituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising the steps of: a. depositing a thin-film layer on said surface and, in succession, b. depositing an additional thin-film layer on top of the previously deposited thin-film layer, c. said second depositing step being carried out at least once, d. the last one of the depositing steps comprising vapor depositing an electrochemically active black layer of gold, said vapor deposition being carried out in a vacuum chamber under reduced pressure of a residual gas in a pressure range of 0.1 to 2 Torr.
Claim 2
Independent Claim
106 words
A method of manufacturing a thin-film electrode consituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising the steps of: a. depositing a thin-film layer on said surface and, in succession, b. depositing an additional thin-film layer on top of the previously deposited thin-film layer, c. said second depositing step being carried out at least once, d. the last one of the depositing steps comprising vapor depositing an electrochemically active black layer of gold, said vapor deposition being carried out in a vacuum chamber under reduced pressure of a residual gas in a pressure range of 0.1 to 2 Torr.
Claim 3
Dependent Claim
13 words
The method as defined in claim 1, wherein the residual gas is nitrogen.
Claim 4
Dependent Claim
13 words
The method as defined in claim 1, wherein the residual gas is helium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-11-07 | 1981-05-09 | 1981-11-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-11-07 | 1985-05-09 | 1985-11-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-11-07 | 1989-05-09 | 1989-11-08 | $7700.00 | Window Closed / Lapsed |