Patent US4046660A successfully refreshed from Google Patents.
US4046660A
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Sputter coating with charged particle flux control
Assignee: AT&T Inc
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Filing: 1975-12-29
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Granted: 1977-09-06
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Expires: 1995-12-29
Abstract
Abstract Substrate heating during sputter coating, due to charged particles, is controlled by the use of an auxiliary magnet in the vicinity of the substrate. The magnet is arranged to either increase this charge particle flux, in situations in which additional heating is desired, or reducing this charge particle flux in situations in which heating is detrimental (e.g., the sputter coating of heat sensitive substrates such as polymer films).
Inventors
- 👤 David Bruce Fraser
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 15:30
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/20; C23C14/205; C23C14/22; C23C14/34; C23C14/35; C23C14/54; C23C14/541
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
111 words
Method for the sputter deposition of a layer on a substrate comprising placing the substrate in the particle beam of a magnetic field aided sputtering source, which said substrate is situated in the residual magnetic field of the sputtering source CHARACTERIZED IN THAT the residual magnetic field is reduced by means of a second magnetic field of the same order of intensity or greater than said residual magnetic field, and, corresponding in geometry to said residual magnetic field, whereby the flux of charged particles incident on the substrate is reduced said second magnetic field being produced by an auxiliary magnet means situated below the plane of said substrate, opposite said source.
Claim 2
Dependent Claim
111 words
Method for the sputter deposition of a layer on a substrate comprising placing the substrate in the particle beam of a magnetic field aided sputtering source, which said substrate is situated in the residual magnetic field of the sputtering source CHARACTERIZED IN THAT the residual magnetic field is reduced by means of a second magnetic field of the same order of intensity or greater than said residual magnetic field, and, corresponding in geometry to said residual magnetic field, whereby the flux of charged particles incident on the substrate is reduced said second magnetic field being produced by an auxiliary magnet means situated below the plane of said substrate, opposite said source.
Claim 3
Dependent Claim
14 words
Method of claim 1 in which the auxiliary magnet means includes a permanent magnet.
Claim 4
Dependent Claim
21 words
Method of claim 2 in which the permanent magnet is ring shaped with magnetization perpendicular to the plane of the ring.
Claim 5
Dependent Claim
10 words
Method of claim 1 in which the layer is metallic.
Claim 6
Dependent Claim
10 words
Method of claim 1 in which the layer is semiconductive.
Claim 7
Dependent Claim
10 words
Method of claim 1 in which the layer is insulating.
References Cited (Backward Citations)
US2239642A
Cited
DE1690689A1
Cited
US3616450A
Cited
US3669860A
Cited
US3711398A
Cited
US3884793A
Cited
US3897325A
Cited
GB1358411A
Cited
US3956093A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-09-05 | 1981-03-07 | 1981-09-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-09-05 | 1985-03-07 | 1985-09-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-09-05 | 1989-03-07 | 1989-09-06 | $7700.00 | Window Closed / Lapsed |