US4021270A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Double master mask process for integrated circuit manufacture
Assignee: Motorola Solutions Inc
•
Filing: 1976-06-28
•
Granted: 1977-05-03
•
Expires: 1996-06-28
Abstract
Abstract A double master mask process for fabricating semiconductor integrated circuits is provided in which selectively etchable dielectric layers and ion implanted resistors are used to form dense integrated circuits with a minimum number of critical alignments. A first silicon dioxide silicon nitride layer used in conjunction with a first master photomask defines a base region and an isolation region which are self-aligned with respect to each other and with respect to resistor contact regions. After isolation and base diffusion, the first oxide/nitride layer is stripped away and a second oxide/nitride layer is grown. Using a photoresist mask, a predeposition layer for the resistor is then formed using ion implantation through the oxide/nitride layers. A second master photomask allows the formation of collector and emitter regions and base and resistor contact which are self-aligned with respect to each other. The diffusion cycle used to form the collector contact and emitter regions simultaneously anneals the ion implanted resistor region to form a high value resistor of closely controlled tolerances. In conjunction with the use of the first master mask, a base region and isolation region which are self-aligned with respect to each other are formed through the use of a " base washout" process which maintains self-alignment without the use of additional process steps.
Inventors
- 👤 Merrill Roe Hunt
- 👤 Christopher Angelos Ladas
- 👤 Sal Thomas Mastroianni
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 22:41
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/202; H10P30/204; H10D; H10D84/00; H10D84/01; H10D84/0112; H10D84/02; H10D84/03; H10D84/038; H10P30/21; H10P30/212; H10P30/28; H10P76/00; H10P76/40; H10W; H10W10/00; H10W10/01; H10W10/031; H10W10/30; Y; Y10; Y10S; Y10S148/00; Y10S148/047; Y10S148/085; Y10S148/106; Y10S148/151
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
167 words
A self-aligned method of manufacturing integrated circuits comprising the steps of: (a) providing a buried layer and an upper layer over a semiconductor substrate, said upper layer and said buried layer being of a first conductivity type, and said substrate being of a second conductivity type opposite to said first conductivity type; (b) forming a first masking means over the upper surface of said upper layer, said first masking means having a predetermined pattern of openings formed therein; (c) forming a first set of semiconductor device regions by selectively applying impurities through said predetermined pattern of openings of said first masking means; (d) removing said first masking means from said upper surface of said upper layer; (e) forming a second masking means over the upper surface of said upper layer, said first masking means having a predetermined pattern of openings formed therein; and (f) forming a second set of semiconductor device regions by selectively applying impurities through said predetermined pattern of openings of said second masking means.
Claim 2
Dependent Claim
167 words
A self-aligned method of manufacturing integrated circuits comprising the steps of: (a) providing a buried layer and an upper layer over a semiconductor substrate, said upper layer and said buried layer being of a first conductivity type, and said substrate being of a second conductivity type opposite to said first conductivity type; (b) forming a first masking means over the upper surface of said upper layer, said first masking means having a predetermined pattern of openings formed therein; (c) forming a first set of semiconductor device regions by selectively applying impurities through said predetermined pattern of openings of said first masking means; (d) removing said first masking means from said upper surface of said upper layer; (e) forming a second masking means over the upper surface of said upper layer, said first masking means having a predetermined pattern of openings formed therein; and (f) forming a second set of semiconductor device regions by selectively applying impurities through said predetermined pattern of openings of said second masking means.
Claim 3
Dependent Claim
43 words
The self-aligned method of manufacturing integrated circuits as recited in claim 1 further comprising the step: (a) forming an additional set of semiconductor device regions by applying impurities through portions of said first masking means not constituted by said predetermined pattern of openings.
Claim 4
Dependent Claim
30 words
The self-aligned method of manufacturing integrated circuits recited in claim 2 wherein said first masking means comprises at least two layers which are selectively etchable with respect to each other.
Claim 5
Dependent Claim
22 words
The self-aligned method of manufacturing integrated circuits as recited in claim 3 wherein at least one of said layers is silicon dioxide.
Claim 6
Dependent Claim
24 words
The self-aligned method of manufacturing integrated circuits as recited in claim 3 wherein at least one of said selectively etchable layers is silicon nitride.
Claim 7
Dependent Claim
31 words
The self-aligned method of manufacturing integrated circuits as recited in claim 2 wherein said second masking means comprises at least two layers which are selectively etchable with respect to each other.
Claim 8
Dependent Claim
22 words
The self-aligned method of manufacturing integrated circuits as recited in claim 6 wherein at least one of said layers is silicon dioxide.
Claim 9
Dependent Claim
24 words
The self-aligned method of manufacturing integrated circuits as recited in claim 6 wherein at least one of said selectively etchable layers is silicon nitride.
Claim 10
Dependent Claim
22 words
The self-aligned method of manufacturing integrated circuits as recited in claim 2 wherein said upper layer is an epitaxially deposited silicon layer.
Claim 11
Dependent Claim
18 words
The self-aligned method of manufacturing integrated circuits as recited in claim 2 wherein said semiconductor substrate is silicon.
Claim 12
Dependent Claim
30 words
The self-aligned method of manufacturing integrated circuits recited in claim 1 wherein said first set of device regions comprise the base region and the isolation region of a semiconductor device.
Claim 13
Dependent Claim
23 words
The self-aligned method of manufacturing integrated circuits recited in claim 11 wherein said first set of semiconductor device regions comprise resistor contact regions.
Claim 14
Dependent Claim
32 words
The self-aligned method of manufacturing integrated circuits recited in claim 1 wherein said second set of semiconductor device openings comprise the collector contact base contact and emitter regions of a semiconductor device.
Claim 15
Dependent Claim
35 words
The self-aligned method of manufacturing integrated circuits recited in claim 2 wherein said step of applying impurities through portions of said first masking means not constituted by said predetermined pattern of openings comprises ion implantation.
Claim 16
Dependent Claim
315 words
A self-aligned method of manufacturing integrated circuits comprising the steps of: (a) providing a buried layer and an upper layer over a semiconductor substrate, said upper layer and said buried layer being of a first conductivity type, and said substrate being of a second conductivity type opposite to said first conductivity type; (b) depositing a first masking layer over the upper surface of said upper layer; (c) depositing a second masking layer of the upper surface of said first masking layer; (d) forming a predetermined pattern of openings in said second layer, said predetermined pattern comprising a first and a second group of openings; (e) forming a first group of semiconductor device regions by applying impurities through openings etched through said first masking layer using said first group of openings as an etching mask; (f) forming a second group of semiconductor device regions by applying impurities through openings etched through said first masking layer using said second group of openings as an etching mask; (g) forming shallow device regions, said shallow device regions overlaying the upper surfaces of said first and said second group of device regions and said shallow device regions being formed irrespective of said predetermined pattern of openings; (h) removing said first and said second masking layers; (i) depositing a third masking layer over the upper surface of said upper layer; (j) depositing a fourth masking layer over the upper surface of said third masking layer; (k) forming a predetermined pattern of openings in said fourth layer, said predetermined pattern comprising a third and a fourth group of openings; (l) forming a third group of semiconductor device regions by applying impurities through openings etched through said third masking layer using said third group of openings as an etching mask; and (m) forming a group of contact openings through said third masking layer using said fourth group of openings as an etching mask.
Claim 17
Dependent Claim
315 words
A self-aligned method of manufacturing integrated circuits comprising the steps of: (a) providing a buried layer and an upper layer over a semiconductor substrate, said upper layer and said buried layer being of a first conductivity type, and said substrate being of a second conductivity type opposite to said first conductivity type; (b) depositing a first masking layer over the upper surface of said upper layer; (c) depositing a second masking layer of the upper surface of said first masking layer; (d) forming a predetermined pattern of openings in said second layer, said predetermined pattern comprising a first and a second group of openings; (e) forming a first group of semiconductor device regions by applying impurities through openings etched through said first masking layer using said first group of openings as an etching mask; (f) forming a second group of semiconductor device regions by applying impurities through openings etched through said first masking layer using said second group of openings as an etching mask; (g) forming shallow device regions, said shallow device regions overlaying the upper surfaces of said first and said second group of device regions and said shallow device regions being formed irrespective of said predetermined pattern of openings; (h) removing said first and said second masking layers; (i) depositing a third masking layer over the upper surface of said upper layer; (j) depositing a fourth masking layer over the upper surface of said third masking layer; (k) forming a predetermined pattern of openings in said fourth layer, said predetermined pattern comprising a third and a fourth group of openings; (l) forming a third group of semiconductor device regions by applying impurities through openings etched through said third masking layer using said third group of openings as an etching mask; and (m) forming a group of contact openings through said third masking layer using said fourth group of openings as an etching mask.
Claim 18
Dependent Claim
49 words
A self-aligned method of manufacturing integrated circuits as recited in claim 15 wherein said step of forming a second group of semiconductor device regions includes the reopening of said first group of openings simultaneous with the etching of openings using said second group of openings as an etching mask.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-05-02 | 1980-11-01 | 1981-05-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-05-02 | 1984-11-01 | 1985-05-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-05-02 | 1988-11-01 | 1989-05-03 | $7700.00 | Window Closed / Lapsed |