Patent US3869368A successfully refreshed from Google Patents.
US3869368A
Expired / Lapsed
US
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Methods of sputter deposition of materials
Assignee: Smiths Group PLC
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Filing: 1971-07-08
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Granted: 1975-03-04
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Expires: 1991-07-08
Abstract
Abstract Spirally-grooved and plain thrust-plates of an aerodynamic gaslubricated bearing are both manufactured by sputter-deposition of a layer of wear-resistant target-material on to flat-disc substrates. Initial sputtering removes material from the substrates and replaces it partially with an alloy of target- and substrate-materials, the sputtering from the substrates being reduced progressively to zero as sputtering from the target is increased progressively to a full value. The content of targetmaterial increases progressively through the alloy-layer up to the final upper layer of target-material alone.
Inventors
- 👤 Geoffrey Beardmore
- 👤 Hugh N Evans
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 18:45
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; C; C23; C23C; C23C14/00; C23C14/02; C23C14/021; C23C14/022; C23C14/22; C23C14/34; C23C14/3471; C23C14/3478; C23C14/35; C23C14/354; C23C14/355; F; F16; F16C; F16C17/00; F16C17/04; F16C17/045; F16C33/00; F16C33/02; F16C33/04; F16C33/06; F16C33/10; F16C33/1005; F16C33/101; F16C33/1015
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
155 words
IN A METHOD OF SPUTTER DEPOSITION OF A PARTICULAR MATERIAL FROM A TARGET ONTO A SURFACE OF A SUBSTRATE TO FORM THEREON A PROJECTION FROM SAID SURFACE COMPRISING THE STEPS OF: A. APPLYING A NEGATIVE POTENTIAL TO SAID SUBSTRATE SO AS TO SPUTTER SUBSTRATE MATERIAL FROM THE SURFACE THEREOF, B. THEREAFTER APPLYING A NEGATIVE VOLTAGE TO A TARGET FORMED OF SAID PARTICULAR MATERIAL WHICH VOLTAGE INCREASES IN AMPLITUDE WHILE CONCURRENTLY THE VOLTAGE APPLIED TO THE SUBSTRATE IS DECREASED TO THEREBY INCREASE THE RATE OF SPUTTERING FROM THE TARGET PROGRESSIVELY FROM ZERO WHILE CONCURRENTLY THE RATE OF SPUTTERING FROM THE SUBSTRATE DECREASED PROGRESSIVELY TO ZERO, C. AND THEREAFTER CONTINUING TO APPLY SAID NEGATIVE VOLTAGE TO THE TARGET TO SPUTTER THEREFOM ONTO THE SUBSTRATE WHILE THE VOLTAGE ON THE SUBSTRATE IS MAINTAINED AT SUBSTANTIALLY ZERO VOLTAGE UNTIL THE DESIRED AMOUNT OF TARGET MATERIAL IS DEPOSITED ON THE SUBSTRATE IN ACCORDANCE WITH THE DESIRED THICKNESS OF THE PROJECTION.
Claim 2
Dependent Claim
155 words
IN A METHOD OF SPUTTER DEPOSITION OF A PARTICULAR MATERIAL FROM A TARGET ONTO A SURFACE OF A SUBSTRATE TO FORM THEREON A PROJECTION FROM SAID SURFACE COMPRISING THE STEPS OF: A. APPLYING A NEGATIVE POTENTIAL TO SAID SUBSTRATE SO AS TO SPUTTER SUBSTRATE MATERIAL FROM THE SURFACE THEREOF, B. THEREAFTER APPLYING A NEGATIVE VOLTAGE TO A TARGET FORMED OF SAID PARTICULAR MATERIAL WHICH VOLTAGE INCREASES IN AMPLITUDE WHILE CONCURRENTLY THE VOLTAGE APPLIED TO THE SUBSTRATE IS DECREASED TO THEREBY INCREASE THE RATE OF SPUTTERING FROM THE TARGET PROGRESSIVELY FROM ZERO WHILE CONCURRENTLY THE RATE OF SPUTTERING FROM THE SUBSTRATE DECREASED PROGRESSIVELY TO ZERO, C. AND THEREAFTER CONTINUING TO APPLY SAID NEGATIVE VOLTAGE TO THE TARGET TO SPUTTER THEREFOM ONTO THE SUBSTRATE WHILE THE VOLTAGE ON THE SUBSTRATE IS MAINTAINED AT SUBSTANTIALLY ZERO VOLTAGE UNTIL THE DESIRED AMOUNT OF TARGET MATERIAL IS DEPOSITED ON THE SUBSTRATE IN ACCORDANCE WITH THE DESIRED THICKNESS OF THE PROJECTION.
Claim 3
Dependent Claim
69 words
The method of claim 1 wherein the sputtering of the substrate material from the surface of the substrate occurs selectively only over a predetermined portion of such surface to produce a cavity therein, and the sputtering of substrate and target material from the target onto the substrate is effective to fill such cavity and eventually to deposit material thereon to a level above that of the original substrate surface.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-03-03 | 1978-09-02 | 1979-03-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-03-03 | 1982-09-02 | 1983-03-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-03-03 | 1986-09-02 | 1987-03-04 | $7700.00 | Window Closed / Lapsed |