Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
170 words
A voltage variable capacitor structure comprising: a body of semiconductive material of one type conductivity having a surface, a layer of dielectric material on said surface, said layer of dielectric material having an opening therein exposing a portion of said surface of said body, and a layer of material on said layer of dielectric material, adapted to make rectifying contact with said semiconductive material and having a portion thereof disposed in said opening to define with said body a rectifying junction at the surface of said body, the area of said layer adapted to make rectifying contact with said semiconductive material being large relative to the area of said portion thereof, wherein said body of semiconductive material comprises an epitaxial layer having said one type conductivity disposed on a substrate of semiconductive material having said one type conductivity, said substrate containing conductivity modifiers in an amount of at least 4 X 1020 atoms per cubic centimeter, and said epitaxial layer having a thickness between about one and about two micrometers.
Claim 2
Dependent Claim
170 words
A voltage variable capacitor structure comprising: a body of semiconductive material of one type conductivity having a surface, a layer of dielectric material on said surface, said layer of dielectric material having an opening therein exposing a portion of said surface of said body, and a layer of material on said layer of dielectric material, adapted to make rectifying contact with said semiconductive material and having a portion thereof disposed in said opening to define with said body a rectifying junction at the surface of said body, the area of said layer adapted to make rectifying contact with said semiconductive material being large relative to the area of said portion thereof, wherein said body of semiconductive material comprises an epitaxial layer having said one type conductivity disposed on a substrate of semiconductive material having said one type conductivity, said substrate containing conductivity modifiers in an amount of at least 4 X 1020 atoms per cubic centimeter, and said epitaxial layer having a thickness between about one and about two micrometers.
Claim 3
Dependent Claim
46 words
A voltage variable capacitor structure as defined in claim 1, wherein there are a plurality of openings through said dielectric layer, each opening being narrow and elongated and the direction of elongation of each opening being parallel to the direction of elongation of each other opening.
Claim 4
Dependent Claim
39 words
A voltage variable capacitor structure as defined in claim 1, wherein said layer of material adapted to make rectifying contact with said semiconductive material is a layer of semiconductive material of conductivity type opposite to that of said body.
Claim 5
Dependent Claim
23 words
A voltage variable capacitor structure as defined in claim 3 wherein said layer of opposite conductivity type semiconductive material is doped to degeneracy.
Claim 6
Dependent Claim
26 words
A voltage variable capacitor structure as defined in claim 4 wherein said capacitor further comprises a layer of conductive material on said layer of semiconductive material.
Claim 7
Dependent Claim
24 words
A voltage variable capacitor structure as defined in claim 5 wherein said layer of conductive material is coextensive with said layer of semiconductive material.
Claim 8
Dependent Claim
35 words
A voltage variable capacitor structure as defined in claim 1 wherein the material of each of said epitaxial layer, said suBstrate, and said layer adapted to make rectifying contact to said semiconductive material is silicon.