Patent USH1525H successfully refreshed from Google Patents.
USH1525H
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and system for high speed photolithography
Assignee: United States Department of the Army
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Filing: 1993-04-08
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Granted: 1996-04-02
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Expires: 2013-04-08
Abstract
Abstract A method and system for modification of a pattern on a semiconductor subste, comprising the application of an electrical current through a liquid medium having a series of individual pixels controlled by a computer, thereby causing the clear liquid to change to opaque in selected areas.
Inventors
- 👤 Bruce Geil
- 👤 Tim Mermagen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 12:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70283; G03F7/70291
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
47 words
A system for the production of an intergrated circuit comprising: a computer, a programmable mask, a computer controller designed to feed a mask design into the programmable mask, a work piece aligned with the programmable mask, and means for exposing the work piece through the programmable mask.
Claim 2
Independent Claim
47 words
A system for the production of an intergrated circuit comprising: a computer, a programmable mask, a computer controller designed to feed a mask design into the programmable mask, a work piece aligned with the programmable mask, and means for exposing the work piece through the programmable mask.
Claim 3
Dependent Claim
62 words
A system in accordance with claim 1, wherein the programmable mask comprises a top and bottom component composed of a clear plastic, a clear liquid encompassed within the programmable mask at the midsection thereof, a series of pixels positioned in the interior of the bottom component of the programmable mask so as to react with the liquid on command from the computer.
Claim 4
Independent Claim
53 words
A method for the production of intergrated circuits for the production of intergrated circuits comprising the steps of: entering a mask design into a computer controller, feeding mask from the computer controller into a programmable mask, aligning the programmable mask with a work piece, and exposing the work piece through the programmable mask.
Claim 5
Independent Claim
53 words
A method for the production of intergrated circuits for the production of intergrated circuits comprising the steps of: entering a mask design into a computer controller, feeding mask from the computer controller into a programmable mask, aligning the programmable mask with a work piece, and exposing the work piece through the programmable mask.
References Cited (Backward Citations)
US4653860A
Cited
US5045419A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-04-02 | 1999-10-02 | 2000-04-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-04-02 | 2003-10-02 | 2004-04-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-04-02 | 2007-10-02 | 2008-04-02 | $7700.00 | Window Closed / Lapsed |