§
Luxuse
Patent Intelligence
Sign In
← Back to Patent Explorer
US7589821B2 Active / In Force US ⏱️ 0.7 years remaining

Exposure apparatus and device manufacturing method

Assignee: Nikon Corp
•
Filing: 2007-07-20
•
Granted: 2009-09-15
•
Expires: 2027-07-20
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.

Inventors

  • 👤 Shigeru Hirukawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 22:00
CPC Classifications
H; H10; H10P; H10P76/00; G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70858; G03F7/709; G03F7/70058; G03F7/7015; G03F7/70216; G03F7/70341; G03F7/70691; G03F7/70716

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 105 words
A lithographic projection apparatus that projects a pattern onto a substrate through a liquid confined to a space adjacent the substrate, the apparatus comprising: a projection system that projects the pattern onto the substrate, the space in which the liquid is confined being located between the projection system and the substrate; and a plurality of elongated walls that are disposed in the space between the projection system and the substrate, at least a portion of the walls extending parallel to each other and to a movement direction of the substrate, the walls having a height in a direction orthogonal to a surface of the substrate.
Claim 2
Dependent Claim 105 words
A lithographic projection apparatus that projects a pattern onto a substrate through a liquid confined to a space adjacent the substrate, the apparatus comprising: a projection system that projects the pattern onto the substrate, the space in which the liquid is confined being located between the projection system and the substrate; and a plurality of elongated walls that are disposed in the space between the projection system and the substrate, at least a portion of the walls extending parallel to each other and to a movement direction of the substrate, the walls having a height in a direction orthogonal to a surface of the substrate.
Claim 3
Dependent Claim 26 words
The apparatus of claim 1 , wherein the plurality of elongated walls direct the liquid in a direction substantially parallel to the surface of the substrate.
Claim 4
Dependent Claim 23 words
The apparatus of claim 1 , wherein the plurality of elongated walls extend in a direction parallel to the surface of the substrate.
Claim 5
Dependent Claim 33 words
The apparatus of claim 1 , wherein the projected pattern is projected through an image field and at least one of the elongated walls is positioned on each side of the image field.
Claim 6
Dependent Claim 24 words
The apparatus of claim 1 , wherein the elongated walls promote the liquid flow across the space from one side to an opposite side.
Claim 7
Dependent Claim 34 words
The apparatus of claim 1 , further comprising a liquid confinement structure that at least partly confines the liquid to the space and wherein the elongated walls are attached to the liquid confinement structure.
Claim 8
Dependent Claim 12 words
The apparatus of claim 1 , wherein the elongated walls are solid.
Claim 9
Dependent Claim 20 words
The apparatus of claim 1 , wherein the elongated walls divide the space in a horizontal plane into separate channels.
Claim 10
Independent Claim 96 words
A device manufacturing method, comprising: projecting a patterned beam of radiation onto a substrate through a projection system and a liquid provided in a space between the projection system and the substrate; and controlling a flow of the liquid across the space with a plurality of elongated walls that are disposed in the space between the projection system and the substrate, at least a portion of the walls extending parallel to each other and to a movement direction of the substrate, the walls having a height in a direction orthogonal to a surface of the substrate.
Claim 11
Independent Claim 96 words
A device manufacturing method, comprising: projecting a patterned beam of radiation onto a substrate through a projection system and a liquid provided in a space between the projection system and the substrate; and controlling a flow of the liquid across the space with a plurality of elongated walls that are disposed in the space between the projection system and the substrate, at least a portion of the walls extending parallel to each other and to a movement direction of the substrate, the walls having a height in a direction orthogonal to a surface of the substrate.
Claim 12
Dependent Claim 31 words
The method of claim 9 , further comprising at least partly confining the liquid to the space using a liquid confinement structure, the elongated walls attached to the liquid confinement structure.
Claim 13
Dependent Claim 20 words
The method of claim 9 , wherein the elongated walls divide the space in a horizontal plane into separate channels.

References Cited (Backward Citations)

US4346164A Cited
JPS57153433A Cited
US4480910A Cited
JPS58202448A Cited
JPS5919912A Cited
DD221563A1 Cited
DD224448A1 Cited
JPS6265326A Cited
JPS63157419A Cited
JPH04305917A Cited
JPH04305915A Cited
JPH0562877A Cited
JPH05304072A Cited
JPH06124873A Cited
US5610683A Cited
EP0605103A1 Cited
JPH06168866A Cited
JPH07220990A Cited
JPH08316125A Cited
US5715039A Cited
EP0834773A2 Cited
US5825043A Cited
JPH10255319A Cited
JPH10303114A Cited
JPH10340846A Cited
JPH11176727A Cited
WO1999049504A1 Cited
JP2000058436A Cited
US20050117224A1 Cited
US20050190455A1 Cited
US20020020821A1 Cited
US20030030916A1 Cited
US20020163629A1 Cited
WO2002091078A1 Cited
US20030174408A1 Cited
WO2003077037A1 Cited
US20050030506A1 Cited
US20050141098A1 Cited
WO2003085708A1 Cited
US7098991B2 Cited
US20040000627A1 Cited
WO2004019128A2 Cited
US20050217703A1 Cited
US20050217137A1 Cited
US20050217135A1 Cited
US20040075895A1 Cited
US20040160582A1 Cited
US20040136494A1 Cited
US20040211920A1 Cited
US20040165159A1 Cited
US20050036121A1 Cited
US20040207824A1 Cited
US7075616B2 Cited
US20040169834A1 Cited
US20040114117A1 Cited
US20040109237A1 Cited
WO2004055803A1 Cited
US20060209414A1 Cited
US20040118184A1 Cited
WO2004057589A1 Cited
WO2004057590A1 Cited
US20040125351A1 Cited
US20040180294A1 Cited
WO2004077154A2 Cited
US20040227923A1 Cited
US20040169924A1 Cited
US20040180299A1 Cited
WO2004081666A1 Cited
WO2005001432A2 Cited
WO2004093159A2 Cited
WO2004090634A2 Cited
WO2004093160A2 Cited
WO2004090633A2 Cited
WO2004092833A2 Cited
WO2004090577A2 Cited
WO2004092830A2 Cited
WO2004093130A2 Cited
WO2004095135A2 Cited
US20040224525A1 Cited
US20040224265A1 Cited
US20040253547A1 Cited
US20040253548A1 Cited
US20040257544A1 Cited
US20060114445A1 Cited
US20040259008A1 Cited
US20040259040A1 Cited
WO2005003864A2 Cited
US20040263808A1 Cited
US20050018156A1 Cited
US7038760B2 Cited
WO2005006026A2 Cited
WO2005008339A2 Cited
WO2005013008A2 Cited
WO2005017625A2 Cited
US20050036184A1 Cited
US20050037269A1 Cited
US20050036183A1 Cited
US20050036213A1 Cited
WO2005015283A1 Cited
WO2005019935A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2012-09-14 2013-03-16 2013-09-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2016-09-14 2017-03-16 2017-09-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2020-09-14 2021-03-16 2021-09-15 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag