Patent US7515246B2 successfully refreshed from Google Patents.
US7515246B2
Expired / Lapsed
US
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Exposure apparatus, exposure method, and method for producing device
Assignee: Nikon Corp
•
Filing: 2006-01-24
•
Granted: 2009-04-07
•
Expires: 2026-01-24
Abstract
Abstract An exposure apparatus exposes a substrate by illuminating a pattern with an exposure beam and transferring an image of the pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate. In addition, a liquid immersion unit fills, with the liquid, at least a part of a space between the projection optical system and the substrate. A conditional expression (v·d·ρ)/μ≦2,000 is satisfied, in which d represents a thickness of the liquid, v represents a velocity of a flow of the liquid between the projection optical system and the substrate, ρ represents a density of the liquid, and μ represents a coefficient of viscosity of the liquid.
Inventors
- 👤 Hiroyuki Nagasaka
- 👤 Nobutaka Magome
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 09:36
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2041; G03F7/708; G03F7/70858; G03F7/709
Claims Analysis
Total Claims: 53
Claim 1
Independent Claim
133 words
An exposure apparatus comprising: an optical member through which a substrate is exposed to an exposure beam; a liquid supply system having a supply outlet, which supplies a liquid from the supply outlet to a space through which the exposure beam passes, the supply outlet being disposed adjacent to the space, wherein: the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled; and a conditional expression (v•d•ρ)/μ≦2,000 is satisfied provided that d represents a thickness of the liquid in the space, v represents a velocity of a flow of the liquid in the space, ρ represents a density of the liquid, and μ represents a coefficient of viscosity of the liquid.
Claim 2
Dependent Claim
133 words
An exposure apparatus comprising: an optical member through which a substrate is exposed to an exposure beam; a liquid supply system having a supply outlet, which supplies a liquid from the supply outlet to a space through which the exposure beam passes, the supply outlet being disposed adjacent to the space, wherein: the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled; and a conditional expression (v•d•ρ)/μ≦2,000 is satisfied provided that d represents a thickness of the liquid in the space, v represents a velocity of a flow of the liquid in the space, ρ represents a density of the liquid, and μ represents a coefficient of viscosity of the liquid.
Claim 3
Dependent Claim
23 words
The exposure apparatus according to claim 1 , wherein the conditional expression is satisfied when the substrate is exposed to the exposure beam.
Claim 4
Dependent Claim
32 words
The exposure apparatus according to claim 2 , wherein a surface of the substrate is opposite to the optical member via the space when the substrate is exposed to the exposure beam.
Claim 5
Dependent Claim
20 words
The exposure apparatus according to claim 3 , wherein the substrate is moved so that the conditional expression is satisfied.
Claim 6
Dependent Claim
29 words
The exposure apparatus according to claim 4 , wherein the substrate is exposed while the substrate is moved in a scanning direction so that the conditional expression is satisfied.
Claim 7
Dependent Claim
24 words
The exposure apparatus according to claim 4 , wherein the moving speed of the substrate is controlled so that the conditional expression is satisfied.
Claim 8
Dependent Claim
22 words
The exposure apparatus according to claim 4 , wherein the liquid supply system is controlled so that the conditional expression is satisfied.
Claim 9
Dependent Claim
29 words
The exposure apparatus according to claim 3 , wherein a surface of the substrate is partially covered by the liquid when the substrate is exposed to the exposure beam.
Claim 10
Dependent Claim
19 words
The exposure apparatus according to claim 8 , wherein the liquid flows as a laminar flow in the space.
Claim 11
Dependent Claim
22 words
The exposure apparatus according to claim 1 , wherein the liquid supply system is controlled so that the conditional expression is satisfied.
Claim 12
Dependent Claim
31 words
The exposure apparatus according to claim 10 , wherein an amount of the liquid to be supplied by the liquid supply system is controlled so that the conditional expression is satisfied.
Claim 13
Dependent Claim
36 words
The exposure apparatus according to claim 10 , further comprising a liquid recovery system having a suction inlet, which recovers the liquid, wherein the liquid recovery system is controlled so that the conditional expression is satisfied.
Claim 14
Dependent Claim
31 words
The exposure apparatus according to claim 12 , wherein an amount of the liquid to be recovered by the liquid recovery system is controlled so that the conditional expression is satisfied.
Claim 15
Dependent Claim
18 words
The exposure apparatus according to claim 1 , wherein the liquid flow control member includes a porous member.
Claim 16
Dependent Claim
19 words
The exposure apparatus according to claim 1 , wherein the liquid flow control member forms a plurality of slits.
Claim 17
Dependent Claim
20 words
The exposure apparatus according to claim 1 , wherein the liquid flow control member rectifies the flow of the liquid.
Claim 18
Dependent Claim
18 words
The exposure apparatus according to claim 16 , wherein the liquid flow control member includes a porous member.
Claim 19
Dependent Claim
19 words
The exposure apparatus according to claim 16 , wherein the liquid flow control member forms a plurality of slits.
Claim 20
Dependent Claim
25 words
A method for producing a device, comprising exposing a substrate by using the optical member of the exposure apparatus as defined in claim 1 .
Claim 21
Dependent Claim
95 words
An exposure apparatus comprising: an optical member through which a substrate is exposed to an exposure beam; a liquid supply system having a supply outlet, which supplies a liquid from the supply outlet to a space through which the exposure beam passes, the supply outlet being disposed adjacent to the space, wherein: the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled; and the liquid flows as a laminar flow in the space.
Claim 22
Dependent Claim
95 words
An exposure apparatus comprising: an optical member through which a substrate is exposed to an exposure beam; a liquid supply system having a supply outlet, which supplies a liquid from the supply outlet to a space through which the exposure beam passes, the supply outlet being disposed adjacent to the space, wherein: the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled; and the liquid flows as a laminar flow in the space.
Claim 23
Dependent Claim
28 words
The exposure apparatus according to claim 20 , wherein the liquid flows as a laminar flow in the space when the substrate is exposed to the exposure beam.
Claim 24
Dependent Claim
32 words
The exposure apparatus according to claim 21 , wherein a surface of the substrate is opposite to the optical member via the space when the substrate is exposed to the exposure beam.
Claim 25
Dependent Claim
25 words
The exposure apparatus according to claim 22 , wherein the substrate is moved so that the liquid flows as a laminar flow in the space.
Claim 26
Dependent Claim
34 words
The exposure apparatus according to claim 23 , wherein the substrate is exposed while the substrate is moved in a scanning direction so that the liquid flows as a laminar flow in the space.
Claim 27
Dependent Claim
29 words
The exposure apparatus according to claim 24 , wherein the moving speed of the substrate is controlled so that the liquid flows as a laminar flow in the space.
Claim 28
Dependent Claim
27 words
The exposure apparatus according to claim 23 , wherein the liquid supply system is controlled so that the liquid flows as a laminar flow in the space.
Claim 29
Dependent Claim
29 words
The exposure apparatus according to claim 22 , wherein a surface of the substrate is partially covered by the liquid when the substrate is exposed to the exposure beam.
Claim 30
Dependent Claim
27 words
The exposure apparatus according to claim 20 , wherein the liquid supply system is controlled so that the liquid flows as a laminar flow in the space.
Claim 31
Dependent Claim
36 words
The exposure apparatus according to claim 28 , wherein an amount of the liquid to be supplied by the liquid supply system is controlled so that the liquid flows as a laminar flow in the space.
Claim 32
Dependent Claim
41 words
The exposure apparatus according to claim 28 , further comprising a liquid recovery system having a suction inlet, which recovers the liquid, wherein the liquid recovery system is controlled so that the liquid flows as a laminar flow in the space.
Claim 33
Dependent Claim
31 words
The exposure apparatus according to claim 30 , wherein an amount of the liquid to be recovered by the liquid recovery system is controlled so that the conditional expression is satisfied.
Claim 34
Dependent Claim
18 words
The exposure apparatus according to claim 20 , wherein the liquid flow control member includes a porous member.
Claim 35
Dependent Claim
25 words
The exposure apparatus according to claim 20 , wherein the liquid flow control member forms a plurality of slits through which the liquid is supplied.
Claim 36
Dependent Claim
25 words
A method for producing a device, comprising exposing a substrate by using the optical member of the exposure apparatus as defined in claim 20 .
Claim 37
Dependent Claim
20 words
The exposure apparatus according to claim 20 , wherein the liquid flow control member rectifies the flow of the liquid.
Claim 38
Dependent Claim
18 words
The exposure apparatus according to claim 35 , wherein the liquid flow control member includes a porous member.
Claim 39
Dependent Claim
19 words
The exposure apparatus according to claim 35 , wherein the liquid flow control member forms a plurality of slits.
Claim 40
Dependent Claim
90 words
An exposure apparatus comprising: an optical member via which a substrate is exposed to an exposure beam through a liquid; and a liquid supply system which includes a supply outlet for supplying the liquid from the supply outlet to a space between the optical member and the substrate, the supply outlet being disposed adjacent to th space; wherein the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled.
Claim 41
Dependent Claim
90 words
An exposure apparatus comprising: an optical member via which a substrate is exposed to an exposure beam through a liquid; and a liquid supply system which includes a supply outlet for supplying the liquid from the supply outlet to a space between the optical member and the substrate, the supply outlet being disposed adjacent to th space; wherein the liquid supply system includes a liquid flow control member which is located at the supply outlet and by which a flow of the liquid supplied from the supply outlet is controlled.
Claim 42
Dependent Claim
20 words
The exposure apparatus according to claim 38 , wherein the liquid flow control member rectifies the flow of the liquid.
Claim 43
Dependent Claim
18 words
The exposure apparatus according to claim 39 , wherein the liquid flow control member includes a porous member.
Claim 44
Dependent Claim
19 words
The exposure apparatus according to claim 39 , wherein the liquid flow control member forms a plurality of slits.
Claim 45
Dependent Claim
18 words
The exposure apparatus according to claim 38 , wherein the liquid flow control member includes a porous member.
Claim 46
Dependent Claim
19 words
The exposure apparatus according to claim 38 , wherein the liquid flow control member forms a plurality of slits.
Claim 47
Dependent Claim
37 words
The exposure apparatus according to claim 38 , wherein the substrate is moved under the supply outlet during the exposure, and the substrate is partially covered by the liquid supplied from the supply outlet during the exposure.
Claim 48
Independent Claim
74 words
A device manufacturing method comprising: supplying a liquid to a space between a substrate and an optical member from a supply outlet, the supply outlet being disposed adjacent to the space; controlling a flow of the liquid to be supplied from the supply outlet by a liquid flow control member located at the supply outlet; and exposing the substrate through the optical member and the liquid supplied from the supply outlet to the space.
Claim 49
Independent Claim
74 words
A device manufacturing method comprising: supplying a liquid to a space between a substrate and an optical member from a supply outlet, the supply outlet being disposed adjacent to the space; controlling a flow of the liquid to be supplied from the supply outlet by a liquid flow control member located at the supply outlet; and exposing the substrate through the optical member and the liquid supplied from the supply outlet to the space.
Claim 50
Dependent Claim
21 words
The method according to claim 45 , further comprising partially covering the substrate with the liquid supplied from the supply outlet.
Claim 51
Dependent Claim
19 words
The method according to claim 45 , wherein the liquid flow control member rectifies the flow of the liquid.
Claim 52
Dependent Claim
17 words
The method according to claim 45 , wherein the liquid flow control member includes a porous member.
Claim 53
Dependent Claim
18 words
The method according to claim 45 , wherein the liquid flow control member forms a plurality of slits.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2012-04-06 | 2012-10-06 | 2013-04-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2016-04-06 | 2016-10-06 | 2017-04-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2020-04-06 | 2020-10-06 | 2021-04-07 | $7700.00 | Window Closed / Lapsed |