Optical proximity correction method utilizing phase-edges as sub-resolution assist features

Claim 2

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate, said mask comprising: a plurality of resolvable features to be printed on said substrate; and at least one non-resolvable optical proximity correction feature, said at least one non-resolvable optical proximity correction feature being a phase-edge, wherein said at least one non-resolvable phase-edge is the sole optical proximity correction feature positioned between a first resolvable feature and a second resolvable feature.

Claim 3

The photolithography mask of claim 1 , wherein said phase-edge has a width dimension substantially equal to zero.

Claim 4

The photolithography mask of claim 1 , wherein said phase-edge effects a phase-shift of 180°.

Claim 5

The photolithography mask of claim 1 , wherein said phase-edge effects a phase-shift of greater than 0°.

Claim 6

The photolithography mask of claim 1 , wherein said mask comprises a quartz substrate, said at least one non-resolvable phase-edge being formed by etching said quartz substrate.

Claim 7

The photolithography mask of claim 1 , wherein said mask forms a chromeless phase-shift mask.

Claim 8

The photolithography mask of claim 1 , wherein said mask is illuminated utilizing off-axis illumination.

Claim 9

The photolithography mask of claim 1 , wherein said non-resolvable feature is spaced apart from said given one of said resolvable features so as to maximize the depth of focus of an imaging system for a given feature size.

Claim 10

The photolithography mask of claim 1 , wherein said first resolvable feature and said second resolvable feature are densely spaced.

Claim 11

A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a photolithography mask for optically transferring a pattern formed in said mask onto a substrate, said mask comprising: a plurality of resolvable features to be printed on said substrate; and at least one non-resolvable optical proximity correction feature, said at least one non-resolvable optical proximity correction feature being a phase-edge, wherein said at least one non-resolvable phase-edge is the sole optical proximity correction feature positioned between a first resolvable feature and a second resolvable feature.

Claim 12

A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a photolithography mask for optically transferring a pattern formed in said mask onto a substrate, said mask comprising: a plurality of resolvable features to be printed on said substrate; and at least one non-resolvable optical proximity correction feature, said at least one non-resolvable optical proximity correction feature being a phase-edge, wherein said at least one non-resolvable phase-edge is the sole optical proximity correction feature positioned between a first resolvable feature and a second resolvable feature.

Claim 13

The computer program product of claim 10 , wherein said phase-edge has a width dimension substantially equal to zero.

Claim 14

The computer program product of claim 10 , wherein said phase-edge effects a phase-shift of 180°.

Claim 15

The computer program product of claim 10 , wherein said phase-edge effects a phase-shift of greater than 0°.

Claim 16

The computer program product of claim 10 , wherein said mask comprises a quartz substrate, said at least one non-resolvable phase-edge being formed by etching said quartz substrate.

Claim 17

The computer program product of claim 10 , wherein said mask forms a chromeless phase-shift mask.

Claim 18

The computer program product of claim 10 , wherein said mask is illuminated utilizing off-axis illumination.

Claim 19

The computer program product of claim 10 , wherein said non-resolvable feature is spaced apart from said given one of said resolvable features so as to maximize the depth of focus of an imaging system for a given feature size.

Claim 20

The computer program product of claim 10 , wherein said first resolvable feature and said second resolvable feature are densely spaced.