Patent US1880290A successfully refreshed from Google Patents.
US6541167B2
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US
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Optical proximity correction
Assignee: ASML Netherlands BV
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Filing: 2001-04-24
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Granted: 2003-04-01
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Expires: 2021-04-24
Abstract
Abstract Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strongly shifted, no-0th-diffraction-order, equal-line-and-space chromeless phase edges to weak phase-shifters that have some 0th order. Halftoning creates an imbalance in the electric field between the shifted regions, and therefore results in the introduction of the 0th diffraction order.
Inventors
- 👤 John S. Petersen
- 👤 Jang Fung Chen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:37
CPC Classifications
H; H10; H10P; H10P76/00; G; G03; G03F; G03F1/00; G03F1/26; G03F1/32; G03F7/00; G03F7/70; G03F7/70058; G03F7/70125; G03F7/70216; G03F7/70283; G03F7/70425; G03F7/70433; G03F7/70441; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
98 words
A device manufacturing method comprising the steps of: (a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using a radiation system; (c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c): use is made of a phase-shifting mask comprising at least one unattentuated, halftoned, phase-shift feature; the mask is off-axis illuminated by the radiation system.
Claim 2
Independent Claim
98 words
A device manufacturing method comprising the steps of: (a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using a radiation system; (c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c): use is made of a phase-shifting mask comprising at least one unattentuated, halftoned, phase-shift feature; the mask is off-axis illuminated by the radiation system.
Claim 3
Dependent Claim
11 words
A device manufactured using a method according to claim 1 .
Claim 4
Independent Claim
107 words
A device manufacturing method comprising the steps of: (a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using a radiation system; (c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c): use is made of a phase-shifting mask comprising at least one feature, wherein said at least one feature includes halftoned, phase-shifted, transparent features; and the mask is off-axis illuminated by the radiation system.
Claim 5
Independent Claim
107 words
A device manufacturing method comprising the steps of: (a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using a radiation system; (c) using a pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c): use is made of a phase-shifting mask comprising at least one feature, wherein said at least one feature includes halftoned, phase-shifted, transparent features; and the mask is off-axis illuminated by the radiation system.
Claim 6
Dependent Claim
11 words
A device manufactured using a method according to claim 3 .
Claim 7
Dependent Claim
98 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a phase shifting mask capable of transferring an image including 0 th diffraction order and ±1 st diffraction orders, onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least one unattenuated, halftoned, phase-shift feature; said phase-shifting mask being utilized in conjunction with off-axis illumination such that radiation traverses said mask and impinges on said material.
Claim 8
Dependent Claim
98 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a phase shifting mask capable of transferring an image including 0 th diffraction order and ±1 st diffraction orders, onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least one unattenuated, halftoned, phase-shift feature; said phase-shifting mask being utilized in conjunction with off-axis illumination such that radiation traverses said mask and impinges on said material.
Claim 9
Dependent Claim
104 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a phase shifting mask capable of transferring an image, including 0 th diffraction order and ±1 st diffraction orders, onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least one feature, wherein said at least one feature includes halftoned, phase-shifted, transparent features; and said phase-shifting mask being utilized with off-axis illumination such that radiation passes through said mask onto said material.
Claim 10
Dependent Claim
104 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a phase shifting mask capable of transferring an image, including 0 th diffraction order and ±1 st diffraction orders, onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least one feature, wherein said at least one feature includes halftoned, phase-shifted, transparent features; and said phase-shifting mask being utilized with off-axis illumination such that radiation passes through said mask onto said material.
Claim 11
Dependent Claim
18 words
The computer program product of claim 6 , wherein said at least one feature further includes semi-transparent features.
Claim 12
Dependent Claim
18 words
The computer program product of claim 6 , wherein said at least one feature further includes opaque features.
Claim 13
Dependent Claim
97 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask capable of transferring an image onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least two unattenuated, halftoned, phase-shift features having a width w, said features separated by a width substantially equal to w, wherein said mask provides an image including 0 th diffraction order and ±1 st diffraction orders, when illuminated.
Claim 14
Dependent Claim
97 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask capable of transferring an image onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least two unattenuated, halftoned, phase-shift features having a width w, said features separated by a width substantially equal to w, wherein said mask provides an image including 0 th diffraction order and ±1 st diffraction orders, when illuminated.
Claim 15
Dependent Claim
34 words
The computer program of claim 9 , wherein a focus-exposure process window for maintaining a predetermined resist line-width sizing of said mask is substantially common to an attenuated, phase-shift mask of a similar pitch.
Claim 16
Dependent Claim
97 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask capable of transferring an image onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least two halftoned, phase-shifted, transparent features having a width w, said features separated by a width substantially equal to w, wherein said mask provides an image including 0 th diffraction order and ±1 st diffraction orders, when illuminated.
Claim 17
Dependent Claim
97 words
A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate at least one file corresponding to a mask capable of transferring an image onto a material, said generation of said file comprising the step of: generating a phase-shifting mask comprising at least two halftoned, phase-shifted, transparent features having a width w, said features separated by a width substantially equal to w, wherein said mask provides an image including 0 th diffraction order and ±1 st diffraction orders, when illuminated.
Claim 18
Dependent Claim
17 words
The computer program of claim 11 , wherein said at least two features further include semi-transparent features.
Claim 19
Dependent Claim
17 words
The computer program of claim 11 , wherein said at least two features further include opaque features.
Claim 20
Dependent Claim
34 words
The computer program of claim 11 , wherein a focus-exposure process window for maintaining a predetermined resist line-width sizing of said mask is substantially common to an attenuated, phase-shift mask of a similar pitch.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-03-31 | 2006-09-30 | 2007-04-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-03-31 | 2010-09-30 | 2011-04-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-03-31 | 2014-09-30 | 2015-04-01 | $7700.00 | Window Closed / Lapsed |