US6994612B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Methods for conditioning surfaces of polishing pads after chemical-mechanical polishing
Assignee: Micron Technology Inc
•
Filing: 2002-02-13
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Granted: 2006-02-07
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Expires: 2022-02-13
Abstract
Abstract The invention includes a method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The method includes exposing the pad surface to steam, and the steam can comprise ammonium citrate. The invention also includes an apparatus for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface. The apparatus includes a conditioning stone, and a steam outlet port proximate the conditioning stone. The steam outlet port is configured to jet steam onto the pad surface during the conditioning of the pad surface.
Inventors
- 👤 Brian E. Cron
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 12:21
CPC Classifications
B; B24; B24B; B24B53/00; B24B53/017
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
50 words
A method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface, the pad not being a semiconductor substrate, the method comprising exposing the pad surface to cleaning material that is entirely in the vapor phase, the cleaning material comprising steam.
Claim 2
Independent Claim
50 words
A method for conditioning a surface of a polishing pad after chemical-mechanical polishing of a semiconductor substrate with the pad surface, the pad not being a semiconductor substrate, the method comprising exposing the pad surface to cleaning material that is entirely in the vapor phase, the cleaning material comprising steam.
Claim 3
Dependent Claim
31 words
The method of claim 1 wherein the cleaning material is jetted onto the pad surface to impact the surface with a pressure of from about 10 psig to about 20 psig.
Claim 4
Dependent Claim
23 words
The method of claim 1 wherein the cleaning material has a temperature of at least about 200° F. as it impacts the surface.
Claim 5
Dependent Claim
37 words
The method of claim 1 wherein the cleaning material is jetted onto the pad surface from a head which is displaced relative to the pad surface during the exposure of the pad surface to the cleaning material.
Claim 6
Dependent Claim
44 words
The method of claim 1 wherein the pad has a contaminant associated therewith prior to the conditioning, and wherein a chemical agent suitable for reacting with the contaminant is within the cleaning material during the exposure of the pad surface to the cleaning material.
Claim 7
Dependent Claim
11 words
The method of claim 5 wherein the chemical agent includes ammonium.
Claim 8
Dependent Claim
12 words
The method of claim 6 wherein the chemical agent is ammonium citrate.
Claim 9
Dependent Claim
17 words
The method of claim 6 wherein the chemical-mechanical polishing utilizes the pad to polish a copper-containing material.
Claim 10
Dependent Claim
21 words
The method of claim 1 wherein the pad is rubbed against a conditioning stone during the exposure to the cleaning material.
Claim 11
Dependent Claim
22 words
The method of claim 1 wherein the pad is rubbed against a conditioning stone prior to the exposure to the cleaning material.
Claim 12
Dependent Claim
21 words
The method of claim 1 wherein the pad is rubbed against a conditioning stone after the exposure to the cleaning material.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2009-02-06 | 2009-08-08 | 2010-02-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2013-02-06 | 2013-08-08 | 2014-02-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2017-02-06 | 2017-08-08 | 2018-02-07 | $7700.00 | Window Closed / Lapsed |