US6896850B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Silicon nitride window for microsampling device and method of construction
Assignee: Kumetrix Inc
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Filing: 2001-03-26
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Granted: 2005-05-24
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Expires: 2021-03-26
Abstract
Abstract A silicon nitride cuvette window for a microsampling device and method of construction are provided. The sample to be analyzed is drawn into the cuvette of the microsampling device. The silicon nitride window permits optical measurements to be made on analytes contained within the cuvette.
Inventors
- 👤 Kumar Subramanian
- 👤 Wilson Smart
- 👤 Asikeh Kanu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 03:17
CPC Classifications
G; G01; G01N; G01N21/00; G01N21/01; G01N21/03; B; B81; B81B; B81B3/00; B81B3/0035; G01N2021/0346; Y; Y10; Y10T; Y10T436/00; Y10T436/25; Y10T436/25625; Y10T436/25875
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
91 words
Method of constructing a window in a silicon cuvette, comprising the steps of: providing a silicon substrate having a top surface and a bottom surface; etching a depression in the top surface of the silicon substrate defining a microsample chamber; depositing a silicon nitride film on the top surface of the silicon substrate and in the chamber; and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the window.
Claim 2
Dependent Claim
91 words
Method of constructing a window in a silicon cuvette, comprising the steps of: providing a silicon substrate having a top surface and a bottom surface; etching a depression in the top surface of the silicon substrate defining a microsample chamber; depositing a silicon nitride film on the top surface of the silicon substrate and in the chamber; and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the window.
Claim 3
Dependent Claim
13 words
The method of claim 1 wherein the silicon substrate is a silicon wafer.
Claim 4
Dependent Claim
24 words
The method of claim 1 wherein the silicon nitride film has a thickness of from about 0.01 of a micrometer to 5 about micrometers.
Claim 5
Dependent Claim
95 words
Method of constructing a chamber window in a microsample chamber, comprising the steps of: providing a silicon substrate having a sampling side and a viewing side; etching a depression in the sampling side of the silicon substrate defining a microsample chamber, a needle bore, and a vent; depositing a silicon nitride film in at least the microsample chamber; and etching a depression in the viewing side of the silicon substrate in registration with the microsample chamber in the sampling side for exposing the silicon nitride film within the microsample chamber to form the chamber window.
Claim 6
Dependent Claim
95 words
Method of constructing a chamber window in a microsample chamber, comprising the steps of: providing a silicon substrate having a sampling side and a viewing side; etching a depression in the sampling side of the silicon substrate defining a microsample chamber, a needle bore, and a vent; depositing a silicon nitride film in at least the microsample chamber; and etching a depression in the viewing side of the silicon substrate in registration with the microsample chamber in the sampling side for exposing the silicon nitride film within the microsample chamber to form the chamber window.
Claim 7
Dependent Claim
16 words
The method of claim 4 wherein the silicon substrate has a thickness of about 500 micrometers.
Claim 8
Dependent Claim
24 words
The method of claim 4 wherein the silicon nitride film has a thickness of from about 0.01 of a micrometer to about 5 micrometers.
Claim 9
Dependent Claim
20 words
The method of claim 4 further comprising the step of applying an antireflective coating to the exposed silicon nitride film.
Claim 10
Dependent Claim
13 words
The method of claim 7 wherein the applied antireflective coating is magnesium fluoride.
Claim 11
Dependent Claim
20 words
The method of claim 1 further comprising the step of applying an antireflective coating to the exposed silicon nitride film.
Claim 12
Dependent Claim
13 words
The method of claim 9 wherein the applied antireflective coating is magnesium fluoride.
Claim 13
Dependent Claim
85 words
Method of constructing a window in a silicon cuvette, comprising the steps of: providing a silicon substrate having a top surface and a bottom surface; etching a depression in the top surface of the silicon substrate defining a microsample chamber; depositing a silicon nitride film in at least the chamber; and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the chamber window.
Claim 14
Dependent Claim
85 words
Method of constructing a window in a silicon cuvette, comprising the steps of: providing a silicon substrate having a top surface and a bottom surface; etching a depression in the top surface of the silicon substrate defining a microsample chamber; depositing a silicon nitride film in at least the chamber; and etching a depression in the bottom surface of the silicon substrate in registration with the chamber in the top surface for exposing the silicon nitride film within the chamber to form the chamber window.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2008-05-23 | 2008-11-22 | 2009-05-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-05-23 | 2012-11-22 | 2013-05-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-05-23 | 2016-11-22 | 2017-05-24 | $7700.00 | Window Closed / Lapsed |