Patent US6816302B2 successfully refreshed from Google Patents.
US6816302B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Pattern generator
Assignee: Micronic Laser Systems AB
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Filing: 2001-04-04
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Granted: 2004-11-09
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Expires: 2021-04-04
Abstract
Abstract The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus comprises a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further comprises an electronic data processing and delivery system feeding drive signals to the modulator, a precision mechanical system for moving said workpiece and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. According to the invention the drive signals can set a modulating element to a number of states larger than two.
Inventors
- 👤 Torbjorn Sandstrom
- 👤 Torbjorn Aklint
- 👤 Mats Rosling
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 08:17
CPC Classifications
H; H04; H04N; H04N1/00; H04N1/04; H04N1/19; H04N1/195; G; G02; G02B; G02B26/00; G02B26/08; G02B26/0816; G02B26/0833; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; G03F7/70; G03F7/70008; G03F7/70041; G03F7/70216; G03F7/70283; G03F7/70291; G03F7/70383; G03F7/704; G03F7/70425; G03F7/70475; G03F7/70691; G03F7/70716; G03F7/70725; H04N2201/00; H04N2201/04; H04N2201/0402; H04N2201/0414
Claims Analysis
Total Claims: 44
Claim 1
Independent Claim
160 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to being illuminated by said radiation a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, convening said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, and means for rotating a coordinate system of the pattern to be created.
Claim 2
Independent Claim
160 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to being illuminated by said radiation a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, convening said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, and means for rotating a coordinate system of the pattern to be created.
Claim 3
Dependent Claim
27 words
An apparatus according to claim 1 , wherein the means for rotating the coordinate system of the pattern to be written comprises means for rotating the modulator.
Claim 4
Dependent Claim
36 words
An apparatus according to claim 1 , wherein the means for rotating the coordinate system of the pattern to be written comprises an optical element for rotating the image projected from the modulator to the workpiece.
Claim 5
Dependent Claim
15 words
An apparatus according to claim 3 , wherein said optical element is a Dove prism.
Claim 6
Dependent Claim
18 words
An apparatus according to claim 3 , wherein said optical element is an analog arrangement of reflecting surfaces.
Claim 7
Dependent Claim
40 words
An apparatus according to claim 1 , wherein the means for rotating the coordinate system of the pattern to be written comprises means for imposing a rotation to the digital description supplied to the electronic data processing and delivery system.
Claim 8
Dependent Claim
40 words
An apparatus according to claim 1 , wherein the means for rotating the coordinate system of the pattern to be written comprises means for imposing a rotation to the modulator signals supplied by the electronic data processing and delivery system.
Claim 9
Dependent Claim
53 words
An apparatus according to claim 1 , wherein it further comprises a detection system for detecting a rotational deviation between an already existing pattern on the workpiece and the pattern to be created, said means for rotating the coordinate system of the pattern to be created being operable to diminish said rotational deviation.
Claim 10
Dependent Claim
26 words
An apparatus according to claim 8 , wherein the detection system comprises means for detecting the position of at least one alignment mark on the workpiece.
Claim 11
Dependent Claim
43 words
An apparatus according to claim 9 , wherein the means for detecting the at least one alignment mark comprises a light source for emitting a detection light to be reflected on the workpiece, and at least one detector for analyzing the reflected light.
Claim 12
Dependent Claim
21 words
An apparatus according to claim 10 , wherein the detection light is of wavelength to which the workpiece is not sensitive.
Claim 13
Dependent Claim
33 words
An apparatus according to claim 10 , wherein the detection light at least partly is projected on the workpiece in the same beam path as the writing beam for creation of the pattern.
Claim 14
Dependent Claim
27 words
An apparatus according to claim 12 , wherein it further comprises a field restriction, whereby the detection light only uses a part of the available exposure field.
Claim 15
Dependent Claim
23 words
An apparatus according to claim 13 , whereby the field restriction imposes a reduction of at least 80% of the available exposure field.
Claim 16
Dependent Claim
14 words
An apparatus according to claim 13 , whereby the field restriction comprises a modulator.
Claim 17
Dependent Claim
16 words
An apparatus according to claim 13 , whereby the field restriction comprises a small angle scanner.
Claim 18
Dependent Claim
25 words
An apparatus according to claim 8 , wherein it further comprises means for measuring a positioning offset for the writing beam relative to the workpiece.
Claim 19
Dependent Claim
44 words
An apparatus according to claim 17 , wherein the means for measuring a positioning offset for the writing beam comprises means for detecting the position of at least one measuring mark on the workpiece and comparing it to a pre-stored position for said mark.
Claim 20
Dependent Claim
43 words
An apparatus according to claim 18 , wherein the means for detecting the at least one measuring mark comprises a light source for emitting a detection light to be reflected on the workpiece, and at least one detector for analyzing the reflected light.
Claim 21
Independent Claim
129 words
A method for creating a microlithographic second pattern on a workpiece sensitive to radiation, said workpiece already comprising a first written pattern, comprising the steps of: detecting a rotational deviation between the already existing pattern on the workpiece and the second pattern to be created, illuminating a light modulator, with electromagnetic radiation in the wavelength range from EUV to IR, projecting an image of the modulator on the workpiece, moving said workpiece and/or projection system relative to each other, further reading from an information storage device a digital description of the pattern to be written, converting said digital description to modulator signals, and feeding said signals to the modulator, and imposing a rotation to a ordinate system of the second pattern to be written to diminish said rotational deviation.
Claim 22
Independent Claim
129 words
A method for creating a microlithographic second pattern on a workpiece sensitive to radiation, said workpiece already comprising a first written pattern, comprising the steps of: detecting a rotational deviation between the already existing pattern on the workpiece and the second pattern to be created, illuminating a light modulator, with electromagnetic radiation in the wavelength range from EUV to IR, projecting an image of the modulator on the workpiece, moving said workpiece and/or projection system relative to each other, further reading from an information storage device a digital description of the pattern to be written, converting said digital description to modulator signals, and feeding said signals to the modulator, and imposing a rotation to a ordinate system of the second pattern to be written to diminish said rotational deviation.
Claim 23
Dependent Claim
28 words
The method according to claim 20 , wherein the rotation of the coordinate system of the second pattern to be written is imposed by rotation of the modulator.
Claim 24
Dependent Claim
36 words
The method according to claim 20 , wherein the rotation of the coordinate system of the second pattern to be written is imposed by optical rotation of the image projected from the modulator to the workpiece.
Claim 25
Dependent Claim
40 words
The method according to claim 20 , wherein the rotation of the coordinate system of the second pattern to be written is imposed by a rotation conversion of the digital description supplied to the electronic data processing and delivery system.
Claim 26
Dependent Claim
31 words
The method according to claim 20 , wherein the rotation of the coordinate system of the second pattern to be written is imposed by a rotation conversion of the modulator signals.
Claim 27
Independent Claim
174 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting a light beam in the wavelength range from EUV to IR; a computer-controlled light modulator controlled according to input pattern data, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, a deflector for scanning of the least one beam across a region of the surface of the workpiece, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation and the deflector, so that said pattern is printed on the workpiece, and means for rotating a coordinate system of the pattern to be created.
Claim 28
Independent Claim
174 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting a light beam in the wavelength range from EUV to IR; a computer-controlled light modulator controlled according to input pattern data, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, a deflector for scanning of the least one beam across a region of the surface of the workpiece, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation and the deflector, so that said pattern is printed on the workpiece, and means for rotating a coordinate system of the pattern to be created.
Claim 29
Dependent Claim
14 words
An apparatus according to claim 25 , wherein the deflector is an acousto-optic deflector.
Claim 30
Dependent Claim
27 words
An apparatus according to claim 26 , wherein the means for rotating the coordinate system of the pattern to be written comprises means for rotating the deflector.
Claim 31
Independent Claim
208 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting light in the wavelength range from EUV to IR, a modulator, adapted to being illuminated by said radiation a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, and an alignment system for alignment of said workpiece by detection of alignment marks on the workpiece, said alignment system comprising: a light source for emitting a detection light to be reflected on the workpiece, and at least one detector for analyzing the reflected light, wherein the detection light at least partly is projected on the workpiece in the same beam path as the writing beam for creation of the pattern.
Claim 32
Independent Claim
208 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising a source for emitting light in the wavelength range from EUV to IR, a modulator, adapted to being illuminated by said radiation a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, and an alignment system for alignment of said workpiece by detection of alignment marks on the workpiece, said alignment system comprising: a light source for emitting a detection light to be reflected on the workpiece, and at least one detector for analyzing the reflected light, wherein the detection light at least partly is projected on the workpiece in the same beam path as the writing beam for creation of the pattern.
Claim 33
Dependent Claim
41 words
An apparatus according to claim 28 , wherein the projection system comprises a lens to focus the light beam from the light source before it reaches the substrate, wherein the detection light is projected on the workpiece through the same lens.
Claim 34
Dependent Claim
22 words
An apparatus according to claim 29 , wherein the alignment system further comprises detectors for detecting a rotational position of the workpiece.
Claim 35
Dependent Claim
21 words
An apparatus according to claim 29 , wherein the detection light is of wavelength to which the workpiece is not sensitive.
Claim 36
Dependent Claim
30 words
An apparatus according to claim 29 , wherein it further comprises a field restriction, whereby the detection light only uses a part of the available exposure field in the lens.
Claim 37
Dependent Claim
23 words
An apparatus according to claim 32 , whereby the field restriction imposes a reduction of at least 80% of the available exposure field.
Claim 38
Dependent Claim
15 words
An apparatus according to claim 32 , whereby the field restriction comprises a second modulator.
Claim 39
Dependent Claim
16 words
An apparatus according to claim 32 , whereby the field restriction comprises a small angle scanner.
Claim 40
Dependent Claim
23 words
An apparatus according to claim 28 , wherein the modulator is a spatial light modulator (SLM) having a multitude of modulating elements (pixels).
Claim 41
Dependent Claim
22 words
An apparatus according to claim 28 , wherein the apparatus is a scanning laser writer, and the modulator is an acousto-optic modulator.
Claim 42
Dependent Claim
27 words
An apparatus according to claim 28 , wherein it further comprises a measuring system for measuring a positioning offset of the writing beam relative to the workpiece.
Claim 43
Independent Claim
122 words
A method for creating a microlithographic pattern on a workpiece sensitive to radiation, said workpiece comprising at least one alignment mark, comprising: detecting the orientation of the workpiece for use in controlling the writing process; writing a pattern according to input pattern data on the workpiece, with electromagnetic radiation in the wavelength range from EUV to IR, through an optical path; wherein the detection of the orientation comprises: projection of a detection light on the workpiece, said detection light at least partly being projected on the workpiece in the same optical path as used by the writing radiation for creation of the pattern; detection of the light reflected on the workpiece; and analyzing the detected light for identification of said alignment mark.
Claim 44
Independent Claim
122 words
A method for creating a microlithographic pattern on a workpiece sensitive to radiation, said workpiece comprising at least one alignment mark, comprising: detecting the orientation of the workpiece for use in controlling the writing process; writing a pattern according to input pattern data on the workpiece, with electromagnetic radiation in the wavelength range from EUV to IR, through an optical path; wherein the detection of the orientation comprises: projection of a detection light on the workpiece, said detection light at least partly being projected on the workpiece in the same optical path as used by the writing radiation for creation of the pattern; detection of the light reflected on the workpiece; and analyzing the detected light for identification of said alignment mark.
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